摘要:
A charged particle beam apparatus is provided with an aperture device which includes a plurality of slit plates. Each of the slit plates includes a plurality of slits having different widths. The slit plates are superimposed in a direction of the axis of a charged particle beam so that the corresponding slits in the slit plates overlap to define an aperture which controls a beam current.
摘要:
A ceramic capacitor includes: a first conductive pattern; a second conductive pattern and a dielectric layer, the first conductive pattern and the second conductive pattern being made of a conductor and provided so as to oppose each other and sandwich the dielectric layer therebetween. The first conductive pattern and the second conductive pattern are different in area from each other, where the second conductive pattern is smaller than the first conductive pattern, and a portion where the first conductive pattern and the second conductive pattern overlap each other forms a capacitance portion. A first extended portion and a second extended portion made of the conductor are formed at both edges of the second conductive pattern so as to extend in mutually opposite directions. With this configuration, the ceramic capacitor with a reduced variation in capacitance value caused by displacement in lamination of green sheets can be provided.
摘要:
An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.
摘要:
A circuit board analyzing method and a circuit board analyzer are provided which can greatly reduce analyzing time. The circuit board analyzer includes a computing unit 110, a memory unit 140 connected to the computing unit 110, and an input unit 160 connected to the computing unit 110. The computing unit 110 includes a wiring data acquiring section 310 acquiring data of wirings formed on a circuit board, a basic circuit diagram forming section 320 dividing the wirings into meshes and setting cells and branches connecting the adjacent cells, and an interference analysis setting section 330 setting an element ignoring range of elements set in the cells and the branches.
摘要:
An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.
摘要:
A circuit board analyzing method and a circuit board analyzer are provided which can greatly reduce analyzing time. The circuit board analyzer includes a computing unit 110, a memory unit 140 connected to the computing unit 110, and an input unit 160 connected to the computing unit 110. The computing unit 110 includes a wiring data acquiring section 310 acquiring data of wirings formed on a circuit board, a basic circuit diagram forming section 320 dividing the wirings into meshes and setting cells and branches connecting the adjacent cells, and an interference analysis setting section 330 setting an element ignoring range of elements set in the cells and the branches.
摘要:
The invention relates to an LC/MS interface provided with structure that the end of a spray capillary is rarely damaged and the object is to provide the LC/MS interface which a general user can easily operate, which inhibits the extension of a separation band and the deterioration of detection sensitivity and which enables high separation and sensitive analysis. A metallic member having a hole for connecting a separation column and a spray capillary and a resin member for fixing the upstream side of the short spray capillary are used. Further, to enhance operability, spray ionization using gas spraying is used.
摘要:
An absolute accuracy in the range from ±2 nm to ±1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement value while a stage is moving, thereby providing a high accuracy.
摘要:
A circuit board analyzer includes a storage unit for storing mesh position information on an analyzed mesh-division model and extracted circuit constants in relation to each other; a division-model configuration unit for dividing the layout of a circuit board into meshes to configure a new mesh-division model; an identical-mesh determination unit for making a comparison between mesh position information on the new mesh-division model and mesh position information on the analyzed mesh-division model to determine identical meshes that have identical mesh position information; and a circuit-constant extraction unit for performing analytical processing based on the new mesh-division model to extract new circuit constants and reusing, as a new circuit constant associated with the identical meshes, an extracted circuit constant that is related to the mesh position information on the identical meshes.
摘要:
An absolute accuracy in the range from ±2 nm to ±1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement value while a stage is moving, thereby providing a high accuracy.