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    Process for preparing unsaturated carboxylic acids from the corresponding unsaturated aldehydes
    5.
    发明授权
    Process for preparing unsaturated carboxylic acids from the corresponding unsaturated aldehydes 失效
    从相应的不饱和醛制备不饱和羧酸的方法

    公开(公告)号：US3965163A

    公开(公告)日：1976-06-22

    申请号：US451443

    申请日：1974-03-15

    申请人： Yoshio Oda ,  Keiichi Uchida ,  Takeshi Morimoto

    发明人： Yoshio Oda ,  Keiichi Uchida ,  Takeshi Morimoto

    IPC分类号： C07C51/25 ,  C07C57/055 ,  C07C51/26

    CPC分类号： C07C51/252

    摘要： Unsaturated carboxylic acids are prepared by reacting the corresponding unsaturated aldehyde with molecular oxygen in the presence of a catalyst of (a) molybdenum, (b) phosphorus, (c) antimony, (d) at least one element selected from the group consisting of tungsten, barium, chromium, lead, niobium, tantalum, tin, nickel, iron and zirconium, and (e) oxygen, and optionally (f) at least one element selected from the group consisting of strontium, titanium, germanium, cerium, and silver.

    摘要翻译： 在（a）钼，（b）磷，（c）锑，（d）至少一种选自钨的元素的存在下，使相应的不饱和醛与分子氧反应制备不饱和羧酸 ，钡，铬，铅，铌，钽，锡，镍，铁和锆，和（e）氧，和（f）至少一种选自锶，钛，锗，铈和银的元素 。

    Producing sulfur tetrafluoride using amine/hydrogen fluoride complex
    7.
    发明授权
    Producing sulfur tetrafluoride using amine/hydrogen fluoride complex 失效
    使用胺/氟化氢络合物生产四氟化硫

    公开(公告)号：US4372938A

    公开(公告)日：1983-02-08

    申请号：US370670

    申请日：1982-04-22

    申请人： Yoshio Oda ,  Hiroshi Otouma ,  Keiichi Uchida ,  Shinsuke Morikawa ,  Masaaki Ikemura

    发明人： Yoshio Oda ,  Hiroshi Otouma ,  Keiichi Uchida ,  Shinsuke Morikawa ,  Masaaki Ikemura

    IPC分类号： C01B17/45 ,  C10B17/00

    CPC分类号： C01B17/4523

    摘要： A process for producing sulfur tetrafluoride comprises reacting in the absence or presence of a solvent an amine/hydrogen fluoride complex having the formula:Am . (HF).sub.nwherein Am represents an amine selected from the group consisting of nitrogen-containing heterocyclic aromatic amines and derivatives thereof, and n represents 2-4, with sulfur dichloride, sulfur monochloride or a combination of chlorine and sulfur at a temperature of 0.degree. to 60.degree. C., the molar ratio of said amine/hydrogen fluoride complex to said sulfur dichloride, sulfur monochloride or sulfur being represented by the formula: ##EQU1## wherein n is as defined above, A represents moles of sulfur in said sulfur dichloride, sulfur monochloride or sulfur, and B represents moles of said amine/hydrogen complex.

    摘要翻译： 制备四氟化硫的方法包括在不存在或存在溶剂的情况下使具有下式的Am胺/氟化氢络合物反应。 （HF）n其中Am表示选自含氮杂环芳族胺及其衍生物的胺，n表示2-4，二氯化硫，一氯化硫或氯和硫的组合，温度为0 所述胺/氟化氢络合物与所述二氯化硫，一氯化硫或硫的摩尔比由下式表示：其中n如上所定义，A表示所述硫中的硫的摩尔数 二氯化物，一氯化硫或硫，B表示所述胺/氢络合物的摩尔数。

    POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM
    10.
    发明申请
    POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM 审中-公开
    阳性感光树脂组合物，由其形成的固化膜和具有固化膜的装置

    公开(公告)号：US20120237873A1

    公开(公告)日：2012-09-20

    申请号：US13513270

    申请日：2010-12-20

    申请人： Takenori Fujiwara ,  Keiichi Uchida ,  Yugo Tanigaki ,  Mitsuhito Suwa

    发明人： Takenori Fujiwara ,  Keiichi Uchida ,  Yugo Tanigaki ,  Mitsuhito Suwa

    IPC分类号： G03F7/075

    CPC分类号： C08G77/14 ,  C08G77/70 ,  C09D183/06 ,  G03F7/0757

    摘要： Disclosed is a positive photosensitive resin composition which contains a polisiloxane, a naphthoquinone diazide compound, and a solvent. The positive photosensitive resin composition is characterized in that the polysiloxane has: an organosilane-derived structure represented by the general formula (1): at a content ration of 20-80% inclusive of Si relative to the overall number of moles of Si atoms in the polysiloxane; and an organosilane-derived structure represented by general formula (2): The positive photosensitive resin composition exhibits high heat resistance, high transparency, and enables high sensitivity, high resolution patterning. The positive photosensitive resin composition can be used to form cured films such as planarization films used in TFT substrates, interlayer insulating films, core materials and cladding materials, and can be used in elements having cured films such as display elements, semiconductor elements, solid-state imaging elements, and optical waveguide elements.

    摘要翻译： 公开了含有聚硅氧烷，萘醌二叠氮化合物和溶剂的正型感光性树脂组合物。 正型感光性树脂组合物的特征在于，聚硅氧烷具有：由通式（1）表示的有机硅烷衍生结构：相对于Si原子的总摩尔数，含量为20〜80％，包括Si的含量 聚硅氧烷; 和由通式（2）表示的有机硅烷衍生物结构：正型感光性树脂组合物的耐热性高，透明性高，能够实现高灵敏度，高分辨率图案化。 正型感光性树脂组合物可以用于形成用于TFT基板，层间绝缘膜，芯材料和包层材料的平坦化膜等固化膜，并且可以用于具有固化膜的元件，例如显示元件，半导体元件， 状态成像元件和光波导元件。