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19 条记录 (耗时 0.03 秒)

    SMART SELECTION AND/OR WEIGHTING OF PARAMETERS FOR LITHOGRAPHIC PROCESS SIMULATION
    1.
    发明申请
    SMART SELECTION AND/OR WEIGHTING OF PARAMETERS FOR LITHOGRAPHIC PROCESS SIMULATION 有权
    智能选择和/或加权参数用于光刻过程模拟

    公开(公告)号：US20120005637A9

    公开(公告)日：2012-01-05

    申请号：US12615004

    申请日：2009-11-09

    申请人： Yu Cao ,  Wenjin Shao ,  Henying Feng ,  Fel Du ,  Martin Snajdr

    发明人： Yu Cao ,  Wenjin Shao ,  Henying Feng ,  Fel Du ,  Martin Snajdr

    IPC分类号： G06F17/50

    CPC分类号： G03F7/705 ,  G03F7/70666

    摘要： The present invention generally relates to simulating a lithographic process, and more particularly to methods for smart selection and smart weighting when selecting parameters and/or kernels used in aerial image computation. According to one aspect, advantages in simulation throughput and/or accuracy can be achieved by selecting TCC kernels more intelligently, allowing highly accurate aerial images to be simulated using a relatively fewer number of TCC kernels than in the state of the art. In other words, the present invention allows for aerial images to be simulated with the same or better accuracy using much less simulation throughput than required in the prior art, all else being equal.

    摘要翻译： 本发明一般涉及光刻过程的模拟，更具体地说，涉及在选择在空间图像计算中使用的参数和/或内核时智能选择和智能加权的方法。 根据一个方面，可以通过更智能地选择TCC核来实现模拟吞吐量和/或精度的优点，从而能够使用比现有技术中相对较少数量的TCC内核来模拟高精度的空间图像。 换句话说，本发明允许使用比现有技术中所需要的模拟吞吐量低得多的相同或更好的精度来模拟航空图像，其他所有方面都相同。

    SMART SELECTION AND/OR WEIGHTING OF PARAMETERS FOR LITHOGRAPHIC PROCESS SIMULATION
    2.
    发明申请
    SMART SELECTION AND/OR WEIGHTING OF PARAMETERS FOR LITHOGRAPHIC PROCESS SIMULATION 有权
    智能选择和/或加权参数用于光刻过程模拟

    公开(公告)号：US20110113390A1

    公开(公告)日：2011-05-12

    申请号：US12615004

    申请日：2009-11-09

    申请人： Yu CAO ,  Wenjin Shao ,  Henying Feng ,  Fel Du ,  Martin Snajdr

    发明人： Yu CAO ,  Wenjin Shao ,  Henying Feng ,  Fel Du ,  Martin Snajdr

    IPC分类号： G06F17/50

    CPC分类号： G03F7/705 ,  G03F7/70666

    摘要： The present invention generally relates to simulating a lithographic process, and more particularly to methods for smart selection and smart weighting when selecting parameters and/or kernels used in aerial image computation. According to one aspect, advantages in simulation throughput and/or accuracy can be achieved by selecting TCC kernels more intelligently, allowing highly accurate aerial images to be simulated using a relatively fewer number of TCC kernels than in the state of the art. In other words, the present invention allows for aerial images to be simulated with the same or better accuracy using much less simulation throughput than required in the prior art, all else being equal.

    摘要翻译： 本发明一般涉及模拟光刻工艺，更具体地说，涉及在选择在空间图像计算中使用的参数和/或核心时智能选择和智能加权的方法。 根据一个方面，可以通过更智能地选择TCC核来实现模拟吞吐量和/或精度的优点，从而能够使用比现有技术中相对较少数量的TCC内核来模拟高精度的空间图像。 换句话说，本发明允许使用比现有技术中所需要的模拟吞吐量低得多的相同或更好的精度来模拟航空图像，其他所有方面都相同。

    Smart selection and/or weighting of parameters for lithographic process simulation
    3.
    发明授权
    Smart selection and/or weighting of parameters for lithographic process simulation 有权

    公开(公告)号：US10025198B2

    公开(公告)日：2018-07-17

    申请号：US12615004

    申请日：2009-11-09

    申请人： Yu Cao ,  Wenjin Shao ,  Hanying Feng ,  Fei Du ,  Martin Snajdr

    发明人： Yu Cao ,  Wenjin Shao ,  Hanying Feng ,  Fei Du ,  Martin Snajdr

    IPC分类号： G06F17/50 ,  G03F7/20

    摘要： The present invention generally relates to simulating a lithographic process, and more particularly to methods for smart selection and smart weighting when selecting parameters and/or kernels used in aerial image computation. According to one aspect, advantages in simulation throughput and/or accuracy can be achieved by selecting TCC kernels more intelligently, allowing highly accurate aerial images to be simulated using a relatively fewer number of TCC kernels than in the state of the art. In other words, the present invention allows for aerial images to be simulated with the same or better accuracy using much less simulation throughput than required in the prior art, all else being equal.

    MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS
    5.
    发明申请
    MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS 有权
    基于模型的扫描仪调谐系统和方法

    公开(公告)号：US20100010784A1

    公开(公告)日：2010-01-14

    申请号：US12475080

    申请日：2009-05-29

    申请人： Yu Cao ,  Wenjin Shao ,  Ronaldus Johannes,Gljsbertus Goossens ,  Jun Ye ,  James Patrick Koonmen

    发明人： Yu Cao ,  Wenjin Shao ,  Ronaldus Johannes,Gljsbertus Goossens ,  Jun Ye ,  James Patrick Koonmen

    IPC分类号： G06F17/50

    CPC分类号： B29C67/0088 ,  B29C64/386 ,  G03F7/70091 ,  G03F7/70458 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70525 ,  G06F17/50 ,  G06F17/5009 ,  G06F17/5081

    摘要： Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.

    摘要翻译： 描述用于调整光刻工艺的系统和方法。 保持目标扫描仪的型号，参考一组可调谐参数来定义目标扫描仪的灵敏度。 差分模型表示目标扫描器与参考值的偏差。 可以基于参考扫描仪和差分模型的设置来调整目标扫描仪。 可以相对于参考扫描仪的性能来表征相关扫描仪系列的性能。 差分模型可能包括诸如参数偏移和可能用于模拟成像行为差异的其他差异的信息。

    Pattern selection for lithographic model calibration
    9.
    发明授权
    Pattern selection for lithographic model calibration 有权
    光刻模型校准的图案选择

    公开(公告)号：US08694928B2

    公开(公告)日：2014-04-08

    申请号：US12613244

    申请日：2009-11-05

    申请人： Yu Cao ,  Wenjin Shao ,  Jun Ye ,  Ronaldus Johannes Gljsbertus Goossens

    发明人： Yu Cao ,  Wenjin Shao ,  Jun Ye ,  Ronaldus Johannes Gljsbertus Goossens

    IPC分类号： G06F17/50

    CPC分类号： G06F17/50 ,  G03F1/14 ,  G03F1/44 ,  G03F1/68 ,  G03F7/70433 ,  G03F7/705 ,  G06F17/10 ,  G06F17/5009

    摘要： The present invention relates generally to methods and apparatuses for test pattern selection for computational lithography model calibration. According to some aspects, the pattern selection algorithms of the present invention can be applied to any existing pool of candidate test patterns. According to some aspects, the present invention automatically selects those test patterns that are most effective in determining the optimal model parameter values from an existing pool of candidate test patterns, as opposed to designing optimal patterns. According to additional aspects, the selected set of test patterns according to the invention is able to excite all the known physics and chemistry in the model formulation, making sure that the wafer data for the test patterns can drive the model calibration to the optimal parameter values that realize the upper bound of prediction accuracy imposed by the model formulation.

    摘要翻译： 本发明一般涉及用于计算光刻模型校准的测试图案选择的方法和装置。 根据一些方面，本发明的模式选择算法可以应用于任何现有的候选测试模式池。 根据一些方面，与设计最佳图案相反，本发明自动选择从现有的候选测试图案池中确定最佳模型参数值最有效的测试图案。 根据另外的方面，根据本发明的所选择的一组测试图案能够激发模型配方中的所有已知物理和化学，确保用于测试图案的晶片数据可以将模型校准驱动到最佳参数值 实现了模型公式对预测精度的上限。

    Delta TCC for fast sensitivity model computation
    10.
    发明授权
    Delta TCC for fast sensitivity model computation 有权
    Delta TCC用于快速灵敏度模型计算

    公开(公告)号：US08379991B2

    公开(公告)日：2013-02-19

    申请号：US12614180

    申请日：2009-11-06

    申请人： Yu Cao ,  Jun Ye ,  Wenjin Shao ,  Hua Cao

    发明人： Yu Cao ,  Jun Ye ,  Wenjin Shao ,  Hua Cao

    IPC分类号： G06K9/68

    CPC分类号： G06F17/5081 ,  G03F1/144 ,  G03F1/36 ,  G03F1/70 ,  G03F7/70483 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/70991 ,  G06F17/5068

    摘要： A method for determining a difference between a reference image and a further image of a pattern, the method including determining a reference imaging function; determining parameters of a difference function representative of a difference between the reference imaging function and a further imaging function; calculating a difference between the reference image and the further image of the pattern based on the difference function and the determined parameters.

    摘要翻译： 一种用于确定参考图像与图案的另一图像之间的差异的方法，所述方法包括确定参考成像功能; 确定代表参考成像功能和另外的成像功能之间的差异的差分函数的参数; 基于差分函数和确定的参数来计算参考图像和图像的另外图像之间的差。