公开(公告)号：US08103159B2

公开(公告)日：2012-01-24

申请号：US12816212

申请日：2010-06-15

Applicant: Yu-Hong Lin ,  Cheng-Chang Wu

Inventor： Yu-Hong Lin ,  Cheng-Chang Wu

IPC: G03B15/03

CPC classification number: H04N5/2354 ,  G03B7/16 ,  G03B15/05

Abstract: The present invention is directed to a flashing control method for a digital camera. Indices respectively corresponding to sensitivity values are firstly determined. Subsequently, main-flash intensities are respectively obtained with respect to the sensitivity values such that their target brightness values are substantially the same after exposure, thereby constructing an energy table. Further, a predetermined preflash is fired to obtain a corresponding preflash brightness value with respect to each distinct distance. Main-flash indices are then respectively obtained according to maximum main-flash intensity and the energy table with respect to the distinct distances such that the target brightness values are substantially the same after exposure, thereby constructing a preflash table. During picture capturing, the main-flash intensity is obtained according to the preflash brightness value and the preflash table.

Abstract translation: 本发明涉及数字照相机的闪光控制方法。 首先确定分别对应于灵敏度值的指标。 随后，相对于灵敏度值分别获得主闪光强度，使得它们的目标亮度值在曝光之后基本相同，从而构建能量表。 此外，发射预定的预闪动以获得相对于每个不同距离的相应的预闪光亮度值。 然后根据最大主闪光强度和相对于不同距离的能量表分别获得主闪光指数，使得目标亮度值在曝光后基本相同，从而构建预闪光表。 在拍摄照片期间，根据预闪光亮度值和预闪光表获得主闪光强度。

公开(公告)号：US20070155180A1

公开(公告)日：2007-07-05

申请号：US11325323

申请日：2006-01-05

Applicant: Chia-Che Hsu ,  Yea-Chung Shih ,  Mien-Jen Cheng ,  Cheng-Chang Wu ,  Jui-Chung Chang

Inventor： Chia-Che Hsu ,  Yea-Chung Shih ,  Mien-Jen Cheng ,  Cheng-Chang Wu ,  Jui-Chung Chang

IPC: H01L21/311

CPC classification number: H01L21/32139 ,  H01L21/32134 ,  H01L29/4908

Abstract: A thin film etching method is provided, which is used for manufacturing semiconductor device or thin film transistor (TFT) array and through which no undercut may be presented or a good after-etching shape may be achieved with respect to a thin film thus etched. The thin film etching method is performed in a two-stage manner by an etchant and between the two stages a photoresist removing process is inserted where another etchant is used. With execution of the photoresist removing process, the thin film may have an increased contact area with the etchant. As such, any undercut or undesired after-etching shape existed in the thin film etched by the prior art may be eliminated or improved.

Abstract translation: 提供了一种薄膜蚀刻方法，其用于制造半导体器件或薄膜晶体管（TFT）阵列，并且通过该薄膜蚀刻方法可能不会产生底切，或者相对于如此蚀刻的薄膜可以实现良好的蚀刻后形状。 通过蚀刻剂以两级方式进行薄膜蚀刻方法，并且在两个阶段之间插入使用另一蚀刻剂的光致抗蚀剂去除工艺。 通过执行光致抗蚀剂去除工艺，薄膜可以具有与蚀刻剂的增加的接触面积。 因此，可以消除或改进由现有技术蚀刻的薄膜中存在的任何底切或不期望的后蚀刻形状。

公开(公告)号：US08310549B2

公开(公告)日：2012-11-13

申请号：US12768613

申请日：2010-04-27

Applicant: Chih-Yuan Wang ,  Cheng-Chang Wu

Inventor： Chih-Yuan Wang ,  Cheng-Chang Wu

IPC: H04N17/00

CPC classification number: H04N5/2351 ,  H04N5/23212 ,  H04N17/002

Abstract: A method of automatically calibrating a visual parameter, such as luminance or contrast, for an imaging device is disclosed. A ratio of visual parameter difference to lens position difference between two predetermined lens positions is pre-determined for a predetermined focal length. A target visual parameter is then obtained according to the pre-determined ratio, a current visual parameter and lens position difference between a current lens position and a target lens position. Finally, the current visual parameter is updated by the target visual parameter in an automatic mode.

Abstract translation: 公开了一种自动校准成像装置的视觉参数（例如亮度或对比度）的方法。 对于预定焦距，预先确定两个预定透镜位置之间的视觉参数差与透镜位置差的比率。 然后根据预定比例，当前视觉参数和当前透镜位置与目标透镜位置之间的透镜位置差获得目标视觉参数。 最后，当前的视觉参数由自动模式下的目标视觉参数更新。

公开(公告)号：US5232421A

公开(公告)日：1993-08-03

申请号：US921515

申请日：1992-07-29

Applicant: Jin-Liang Chen ,  Cheng-Chang Wu

Inventor： Jin-Liang Chen ,  Cheng-Chang Wu

IPC: A63B21/008 ,  A63B23/04

CPC classification number: A63B22/0056 ,  A63B21/0083 ,  A63B2208/0204 ,  A63B2225/30 ,  Y10S482/908

Abstract: A stepper includes a base frame, two swing arms, two hydraulic cylinders and an adjustment assembly. Each of the swing arms is mounted pivotally on the base frame at one end and carries a pedal on the other end. Each of the hydraulic cylinders is mounted pivotally on one of the pedals at one end and on the base frame at the other end. The adjustment assembly is disposed on the base frame and permits adjustments in the angular displacement of the pedals.

Abstract translation: 步进机包括底架，两个摆臂，两个液压缸和调节组件。 每个摆臂在一端枢转地安装在基架上，并在另一端承载踏板。 每个液压缸在一端枢转地安装在一个踏板上，另一端安装在底架上。 调节组件设置在基座框架上，并允许调节踏板的角位移。

公开(公告)号：US08866035B2

公开(公告)日：2014-10-21

申请号：US13337510

申请日：2011-12-27

Applicant: Shih-Lung Hsu ,  Chin-Juei Tung ,  Hsiung-Sheng Hsu ,  Cheng-Chang Wu

Inventor： Shih-Lung Hsu ,  Chin-Juei Tung ,  Hsiung-Sheng Hsu ,  Cheng-Chang Wu

IPC: B23H1/04

CPC classification number: B23H7/26

Abstract: A triaxial driving device for electrodischarge machine tools having a three-liners-axes mechanism and an electrode tool and has a connecting mount, a first axial rotator, a base, a supporting arm, a second axial rotator, a third axial rotator and an electrode holder. The connecting mount is connected securely to the three-liners-axes mechanism. The first axial rotator is mounted in the connecting mount and has a rotating head. The base is connected securely to the rotating head of the first axial rotator and has a space. The supporting arm is rotatably mounted in the space of the base and has a connecting frame. The second axial rotator is securely connected to the base and the supporting arm and has a rotating head. The third axial rotator is connected to the supporting arm and has a rotating head. The electrode holder is connected to the third axial rotator and the electrode tool.

Abstract translation: 一种具有三轴机构和电极工具的放电机床的三轴驱动装置，具有连接座，第一轴向旋转器，基座，支撑臂，第二轴向旋转器，第三轴向旋转器和电极 持有人 连接支架牢固地连接到三轴机构。 第一轴向旋转器安装在连接座中并具有旋转头。 基座牢固地连接到第一轴向旋转器的旋转头部并且具有空间。 支撑臂可旋转地安装在基座的空间中并具有连接框架。 第二轴向旋转器牢固地连接到基座和支撑臂并且具有旋转头。 第三轴向旋转器连接到支撑臂并具有旋转头。 电极保持器连接到第三轴向旋转器和电极工具。