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公开(公告)号:US07125642B2
公开(公告)日:2006-10-24
申请号:US10773340
申请日:2004-02-09
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Satoru Miyazawa
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Satoru Miyazawa
IPC分类号: G03F7/004 , G03F7/30 , G03F7/38 , C08F28/02 , C08F32/08 , C08F12/08 , C08F20/02 , C08F118/02 , C08F216/16 , C07C303/26
CPC分类号: C07C309/67 , C07C2601/08 , C07C2601/14 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要: A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance
摘要翻译: 具有式(1)的磺酸酯化合物是新的,其中R 1至R 3是H,F或C 1-20烷基或氟代烷基, R 1至R 3中的至少一个含有F.使用包含衍生自磺酸盐化合物的单元的聚合物作为基础树脂以配制抗敏剂组合物,其对 高能量辐射,在高达200nm的波长下保持高透明度,并且具有改善的碱溶性对比度和等离子体耐蚀刻性
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公开(公告)号:US07125641B2
公开(公告)日:2006-10-24
申请号:US10773228
申请日:2004-02-09
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Satoru Miyazawa
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Satoru Miyazawa
IPC分类号: G03F7/004 , C08F114/18 , C08F12/30
CPC分类号: G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397
摘要: A polymer comprising recurring units of (1a) or (1b) wherein R1 is an acid labile group, adhesive group or fluoroalkyl, R2 is H, F, alkyl or fluoroalkyl, R3 and R4 each are a single bond, alkylene or fluoroalkylene, R5 is H or an acid labile group, “a” is 1 or 2, 0
摘要翻译: 包含(1a)或(1b)的重复单元的聚合物,其中R 1是酸不稳定基团,粘合剂基团或氟代烷基,R 2是H,F,烷基或 氟烷基,R 3和R 4各自为单键,亚烷基或氟亚烷基,R 5为H或酸不稳定基团,“a “为1或2,0
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公开(公告)号:US06875556B2
公开(公告)日:2005-04-05
申请号:US10690777
申请日:2003-10-23
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Satoru Miyazawa
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Satoru Miyazawa
IPC分类号: C08F220/26 , C08F228/02 , C08F232/04 , C08F236/20 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号: G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要: A resist composition comprising as the base resin a blend of a fluorinated polymer which is sensitive to high-energy radiation and highly transparent at a wavelength of up to 200 nm and a sulfonate-containing polymer exhibiting a high contrast upon alkali dissolution is improved in transparency and alkali dissolution contrast as well as plasma etching resistance.
摘要翻译: 抗蚀剂组合物包含作为基础树脂的在高达200nm的波长下对高能量辐射敏感且高度透明的含氟聚合物的共混物和在碱溶解时显示出高对比度的含磺酸盐的聚合物的透明度 和碱溶性对比度以及等离子体耐蚀刻性。
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公开(公告)号:US07001707B2
公开(公告)日:2006-02-21
申请号:US10925014
申请日:2004-08-25
申请人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号: G03F7/004 , C08F114/18
CPC分类号: G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108
摘要: A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.
摘要翻译: 包含具有醇基作为可溶性基团的环状聚合物和具有羧酸或六氟醇基团的聚合物的共聚物的抗蚀剂组合物,其氢原子被酸不稳定基团替代为基础树脂形成抗蚀剂膜,其透明度提高,碱溶解对比度 和等离子体耐蚀刻性。
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公开(公告)号:US06855477B2
公开(公告)日:2005-02-15
申请号:US10256141
申请日:2002-09-27
申请人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Haruhiko Komoriya , Kazuhiko Maeda
发明人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Haruhiko Komoriya , Kazuhiko Maeda
CPC分类号: G03F7/0045 , G03F7/0046 , G03F7/0392
摘要: A chemically amplified resist composition comprising (A) a polymer comprising recurring units containing at least one fluorine atom, (B) a compound of formula (1) wherein R1 and R2 are H, F or alkyl or fluorinated alkyl, at least one of R1 and R2 contains at least one fluorine atom, R3 is a single bond or alkylene, R4 is a n-valent aromatic or cyclic diene group, R5 is H or C(═O)R6, R6 is H or methyl, and n is 2, 3 or 4, (C) an organic solvent, and (D) a photoacid generator is sensitive to high-energy radiation and has improved sensitivity and transparency at a wavelength of less than 200 nm.
摘要翻译: 一种化学放大抗蚀剂组合物,其包含(A)包含含有至少一个氟原子的重复单元的聚合物,(B)式(1)的化合物,其中R 1和R 2为H,F或烷基或氟化烷基 ,R 1和R 2中的至少一个含有至少一个氟原子,R 3是单键或亚烷基,R 4是n价的芳族或环状二烯基,R 5 >为H或C(= O)R 6,R 6为H或甲基,n为2,3或4,(C)有机溶剂,(D)光致酸发生剂对高 能量辐射,并且在小于200nm的波长下具有改善的灵敏度和透明度。
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公开(公告)号:US07169869B2
公开(公告)日:2007-01-30
申请号:US11179606
申请日:2005-07-13
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号: C08F12/30
CPC分类号: C08F28/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
摘要翻译: 包含具有氟化亲水基团的乙烯基磺酸酯单元作为基础树脂的聚合物的抗蚀剂组合物具有优异的透明性,底物粘合性和显影剂渗透性以及耐等离子体耐蚀刻性,并且适用于光刻微处理。
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公开(公告)号:US07067231B2
公开(公告)日:2006-06-27
申请号:US10968971
申请日:2004-10-21
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
CPC分类号: G03F7/0046 , C08F220/24 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要: A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance
摘要翻译: 包含具有式(1)的部分结构的重复单元的聚合物,其中R 1是单键或亚烷基或氟代亚烷基,R 2和R 3, SUP>是H或烷基或氟代烷基,R 2和R 3中的至少一个含有至少一个氟原子用作基础树脂以配制抗蚀剂组合物,其中 具有波长高达200nm的辐射的高透明度,底物粘附性,显影剂亲和性和耐干蚀刻性的优点
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公开(公告)号:US20050267275A1
公开(公告)日:2005-12-01
申请号:US11179606
申请日:2005-07-13
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号: C08F28/02 , C08F212/14 , C08F220/12 , C08F232/00 , G03F7/004 , G03F7/039 , H01L21/027 , C08F12/30
CPC分类号: C08F28/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
摘要翻译: 包含具有氟化亲水基团的乙烯基磺酸酯单元作为基础树脂的聚合物的抗蚀剂组合物具有优异的透明性,底物粘合性和显影剂渗透性以及耐等离子体耐蚀刻性,并且适用于光刻微处理。
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公开(公告)号:US20050175935A1
公开(公告)日:2005-08-11
申请号:US11052214
申请日:2005-02-08
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号: C08F220/00 , C08F232/08 , G03C1/76 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号: G03F7/0395 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要: A chemically amplified resist composition comprising an alternating copolymer of an acrylate monomer having a fluoroalkyl group at alpha-position with a norbornene derivative, when processed through ArF excimer laser exposure by lithography, is improved in resolution and dry etching resistance and minimized in line edge roughness.
摘要翻译: 当通过光刻法通过ArF准分子激光曝光进行处理时,包含具有α-位置上的氟代烷基的丙烯酸酯单体与降冰片烯衍生物的交替共聚物的化学增幅抗蚀剂组合物的分辨率和干蚀刻电阻提高并且线边缘粗糙度最小化 。
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公开(公告)号:US20050089797A1
公开(公告)日:2005-04-28
申请号:US10968971
申请日:2004-10-21
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号: C08G61/02 , C08F16/26 , C08F20/28 , C08F32/08 , C08F220/24 , G03C1/10 , G03C1/76 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号: G03F7/0046 , C08F220/24 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要: A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
摘要翻译: 包含具有式(1)的部分结构的重复单元的聚合物,其中R 1是单键或亚烷基或氟代亚烷基,R 2和R 3, SUP>是H或烷基或氟代烷基,R 2和R 3中的至少一个含有至少一个氟原子用作基础树脂以配制抗蚀剂组合物,其中 具有波长高达200nm的辐射的高透明度,底物粘附性,显影剂亲和性和耐干蚀刻性的优点。
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