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公开(公告)号：US20050106499A1
公开(公告)日：2005-05-19
申请号：US10969097
申请日：2004-10-21
申请人： Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shirrji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shirrji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： C08G61/02 , C08F216/14 , C08F220/24 , G03C1/10 , G03C1/492 , G03F7/004 , G03F7/039 , G03F7/085
CPC分类号： G03F7/0397 , C08F216/1408 , C08F220/24 , G03F7/0046 , G03F7/085 , Y10S430/108 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) and recurring units of formulae (2a) to (2d) wherein R1 is F or fluoroalkyl, R2 is a single bond or an alkylene or fluoroalkylene, R3 and R4 are H, F, alkyl or fluoroalkyl, at least one of R3 and R4 contains F, R5 is H or an acid labile group, R6 is an acid labile group, adhesive group, alkyl or fluoroalkyl, and “a” is 1 or 2 is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
摘要翻译： 包含式（1）的重复单元和式（2a）至（2d）的重复单元的聚合物，其中R 1是F或氟烷基，R 2是单键 或亚烷基或氟亚烷基，R 3和R 4是H，F，烷基或氟代烷基，R 3和R 3中的至少一个， SUP> 4 含有F，R 5是H或酸不稳定基团，R 6是酸不稳定基团，粘合剂基团，烷基或氟烷基，和 “a”为1或2用作基础树脂以配制抗蚀剂组合物，该抗蚀剂组合物具有波长高达200nm的辐射的高透明度，底物粘合性，显影剂亲和性和耐干蚀刻性等优点。
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公开(公告)号：US07001707B2
公开(公告)日：2006-02-21
申请号：US10925014
申请日：2004-08-25
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03F7/004 , C08F114/18
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108
摘要： A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.
摘要翻译： 包含具有醇基作为可溶性基团的环状聚合物和具有羧酸或六氟醇基团的聚合物的共聚物的抗蚀剂组合物，其氢原子被酸不稳定基团替代为基础树脂形成抗蚀剂膜，其透明度提高，碱溶解对比度 和等离子体耐蚀刻性。
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公开(公告)号：US07125643B2
公开(公告)日：2006-10-24
申请号：US10969097
申请日：2004-10-21
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
CPC分类号： G03F7/0397 , C08F216/1408 , C08F220/24 , G03F7/0046 , G03F7/085 , Y10S430/108 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) and recurring units of formulae (2a) to (2d) wherein R1 is F or fluoroalkyl, R2 is a single bond or an alkylene or fluoroalkylene, R3 and R4 are H, F, alkyl or fluoroalkyl, at least one of R3 and R4 contains F, R5 is H or an acid labile group, R6 is an acid labile group, adhesive group, alkyl or fluoroalkyl, and “a” is 1 or 2 is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
摘要翻译： 包含式（1）的重复单元和式（2a）至（2d）的重复单元的聚合物，其中R 1是F或氟烷基，R 2是单键 或亚烷基或氟亚烷基，R 3和R 4是H，F，烷基或氟代烷基，R 3和R 3中的至少一个， SUP> 4 含有F，R 5是H或酸不稳定基团，R 6是酸不稳定基团，粘合剂基团，烷基或氟烷基，和 “a”为1或2用作基础树脂以配制抗蚀剂组合物，该抗蚀剂组合物具有波长高达200nm的辐射的高透明度，底物粘合性，显影剂亲和性和耐干蚀刻性等优点。
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公开(公告)号：US07067231B2
公开(公告)日：2006-06-27
申请号：US10968971
申请日：2004-10-21
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
CPC分类号： G03F7/0046 , C08F220/24 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance
摘要翻译： 包含具有式（1）的部分结构的重复单元的聚合物，其中R 1是单键或亚烷基或氟代亚烷基，R 2和R 3， SUP>是H或烷基或氟代烷基，R 2和R 3中的至少一个含有至少一个氟原子用作基础树脂以配制抗蚀剂组合物，其中 具有波长高达200nm的辐射的高透明度，底物粘附性，显影剂亲和性和耐干蚀刻性的优点
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公开(公告)号：US20050175935A1
公开(公告)日：2005-08-11
申请号：US11052214
申请日：2005-02-08
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： C08F220/00 , C08F232/08 , G03C1/76 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A chemically amplified resist composition comprising an alternating copolymer of an acrylate monomer having a fluoroalkyl group at alpha-position with a norbornene derivative, when processed through ArF excimer laser exposure by lithography, is improved in resolution and dry etching resistance and minimized in line edge roughness.
摘要翻译： 当通过光刻法通过ArF准分子激光曝光进行处理时，包含具有α-位置上的氟代烷基的丙烯酸酯单体与降冰片烯衍生物的交替共聚物的化学增幅抗蚀剂组合物的分辨率和干蚀刻电阻提高并且线边缘粗糙度最小化 。
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公开(公告)号：US20050089797A1
公开(公告)日：2005-04-28
申请号：US10968971
申请日：2004-10-21
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： C08G61/02 , C08F16/26 , C08F20/28 , C08F32/08 , C08F220/24 , G03C1/10 , G03C1/76 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , C08F220/24 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
摘要翻译： 包含具有式（1）的部分结构的重复单元的聚合物，其中R 1是单键或亚烷基或氟代亚烷基，R 2和R 3， SUP>是H或烷基或氟代烷基，R 2和R 3中的至少一个含有至少一个氟原子用作基础树脂以配制抗蚀剂组合物，其中 具有波长高达200nm的辐射的高透明度，底物粘附性，显影剂亲和性和耐干蚀刻性的优点。
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公开(公告)号：US20050084796A1
公开(公告)日：2005-04-21
申请号：US10925014
申请日：2004-08-25
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03C1/494 , G03F7/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108
摘要： A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.
摘要翻译： 包含具有醇基作为可溶性基团的环状聚合物和具有羧酸或六氟醇基团的聚合物的共聚物的抗蚀剂组合物，其氢原子被酸不稳定基团替代为基础树脂形成抗蚀剂膜，其透明度提高，碱溶解对比度 和等离子体耐蚀刻性。
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公开(公告)号：US07241553B2
公开(公告)日：2007-07-10
申请号：US11051721
申请日：2005-01-27
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03F7/039 , G03F7/30 , C08F18/20 , C08F118/00 , C08F120/22
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A chemically amplified resist composition using an alternating copolymer of α-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness.
摘要翻译： 使用α-三氟丙烯酸与降冰片烯作为基础聚合物的交替共聚物的化学放大抗蚀剂组合物适用于ArF激光平版印刷微图案，并提高了透明度，等离子体耐蚀刻性和线边缘粗糙度。
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公开(公告)号：US20050221221A1
公开(公告)日：2005-10-06
申请号：US11051721
申请日：2005-01-27
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03F7/004 , C08F20/22 , C08F212/14 , C08F220/10 , C08F224/00 , C08F232/08 , C08F234/00 , G03C1/76 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A chemically amplified resist composition using an alternating copolymer of α-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness.
摘要翻译： 使用α-三氟丙烯酸与降冰片烯作为基础聚合物的交替共聚物的化学放大抗蚀剂组合物适用于ArF激光平版印刷微图案，并提高了透明度，等离子体耐蚀刻性和线边缘粗糙度。
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公开(公告)号：US07378218B2
公开(公告)日：2008-05-27
申请号：US11345325
申请日：2006-02-02
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0
摘要翻译： 提供了包含式（1a）至（1d）的重复单元并且Mw为1,000-500,000的含氟聚合物。 R 1是酸不稳定基团，R 2是单键或亚甲基，a1，a2，a3和a4是大于0至小于1的数， 并且0
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