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1.发明申请公开(公告)号：US20120274931A1
公开(公告)日：2012-11-01
申请号：US13510300
申请日：2010-11-12
IPC分类号： G01N21/88
CPC分类号： G01N21/8806 , G01N21/21 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/8848 , G01N2201/06113 , G01N2201/063
摘要： The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope (5), which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optimal microscope (14) that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope (14). The electron microscope (5), which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optimal microscope (14) that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope (14).
摘要翻译： 所公开的使用电子显微镜等精细观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的装置可以将观察到的缺陷可靠地插入电子显微镜领域或 喜欢，可以是一个规模较小的设备。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜（5）具有结合有重新检测缺陷的最佳显微镜（14），以及空间滤波器 当使用该光学显微镜（14）进行暗视场观察时，在瞳平面处插入分布偏振元件。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜（5）具有结合重新检测缺陷的最佳显微镜（14），并且插入分配滤波器 在使用该光学显微镜（14）进行暗视场观察时在瞳孔平面上。
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2.发明授权公开(公告)号：US08953156B2
公开(公告)日：2015-02-10
申请号：US13510300
申请日：2010-11-12
IPC分类号： G01N21/00 , G01N21/95 , G01N21/21 , G01N21/956 , G01N21/88
CPC分类号： G01N21/8806 , G01N21/21 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/8848 , G01N2201/06113 , G01N2201/063
摘要： The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.
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3.发明授权公开(公告)号：US08483035B2
公开(公告)日：2013-07-09
申请号：US13482065
申请日：2012-05-29
申请人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Shinji Homma , Tsuneo Nakagomi , Teruaki Tokutomi , Toshihiko Nakata , Takehiro Tachizaki
发明人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Shinji Homma , Tsuneo Nakagomi , Teruaki Tokutomi , Toshihiko Nakata , Takehiro Tachizaki
CPC分类号： G11B5/455 , G11B2005/0021
摘要： In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.
摘要翻译： 在用于检查热辅助磁记录头元件的方法和装置中，将样本安装在可在扫描探针显微镜装置的平面中移动的台上，从所述样本的渐逝光的发光部分产生ev逝光 通过在平面中移动台来检测ev逝光的散射光，同时具有探针的扫描探针显微镜的悬臂在试样的表面附近垂直振动，并且从from射光发射的ev逝光的强度分布 使用基于检测到的散射光的ev逝光的产生的位置信息来检查ev逝光的发光部分或试样的ev逝光的发光部分的表面轮廓。
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公开(公告)号：US20130160552A1
公开(公告)日：2013-06-27
申请号：US13819355
申请日：2011-06-01
CPC分类号： G01N29/221 , G01N29/04 , G01N29/043 , G01N29/0654 , G01N29/2418
摘要： It is intended to provide an internal defect inspection method and an apparatus for implementing the method by which an ultrasonic wave is excited in a sample without contact with the sample and accordingly without damaging the sample, and an ultrasonic wave from any internal defect of the sample is detected without being affected by the sample surface, in a non-contact state and with high sensitivity.By the internal defect inspection method, an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, an ultrasonic wave reflected by the sample is detected as an interference signal with an imaging type common-path interferometer, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal.
摘要翻译： 旨在提供一种内部缺陷检查方法和实现这样一种方法的装置，其中超声波在样品中被激发而不与样品接触，因此不损伤样品，并且来自样品的任何内部缺陷的超声波 被检测而不受样品表面的影响，处于非接触状态并具有高灵敏度。 通过内部缺陷检查方法，从超声波发射器向样品发射超声波，将由样本反射的超声波作为干涉信号与成像式共轨干涉仪进行检测，从超声波信号 从超声波信号中检测出干扰信号和样本内的任何缺陷。
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公开(公告)号：US09134279B2
公开(公告)日：2015-09-15
申请号：US13819355
申请日：2011-06-01
CPC分类号： G01N29/221 , G01N29/04 , G01N29/043 , G01N29/0654 , G01N29/2418
摘要： An internal defect inspection method where an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, the ultrasonic wave reflected by the sample is detected by an imaging type common-path interferometer as an interference signal, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal. An internal defect inspection apparatus including an ultrasonic wave transmitter, an imaging type common-path interferometer and an ultrasonic wave signal detecting device is also provided.
摘要翻译： 从超声波发射器向样品发射超声波的内部缺陷检查方法，由成像型共通干涉仪作为干扰信号检测由样品反射的超声波，从超声波信号获得超声波信号 干扰信号，并从超声波信号中检测出样本内的任何缺陷。 还提供了包括超声波发射器，成像型共轨干涉仪和超声波信号检测装置的内部缺陷检查装置。
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公开(公告)号：US20130003038A1
公开(公告)日：2013-01-03
申请号：US13518727
申请日：2011-01-28
申请人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
发明人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
IPC分类号： G01C3/08
CPC分类号： G01S17/36 , G01B9/02003 , G01B9/02007 , G01B9/02008 , G01B9/0207 , G01S7/4815 , G01S7/4911 , G01S17/42
摘要： Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要翻译： 公开了使用光梳的距离测量装置。 为了使具有低反射率或散射面的表面的测量对象的绝对距离相差10微米，使用光学和非接触方法可以容易地测量精度为0.1mm以上， 测量到被测量物体的距离的距离测量装置被配置为通过比较反射或散射的光源和多个CW激光器之间的拍频信号的相位来测量到被测量物体的距离 在被照射到物体上之前，通过光源和多个CW激光器之间的拍频信号的相位的对象。
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公开(公告)号：US20110194101A1
公开(公告)日：2011-08-11
申请号：US13123906
申请日：2009-09-28
IPC分类号： G01N21/88
CPC分类号： G01N23/2251 , G01N21/9501 , G01N21/956 , G01N2223/6116 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： An electron microscope, for observing a defect detected by an optical defect inspection device or an optical appearance inspection device, is configured in such a manner that an optical microscope for re-detecting the defect is mounted thereon, and that a polarization-distribution polarizer and a spatial filter are inserted into a pupil plane when the optical microscope is used to observe a dark field.
摘要翻译： 用于观察由光学缺陷检查装置或光学外观检查装置检测到的缺陷的电子显微镜被配置为使得用于重新检测缺陷的光学显微镜安装在其上，并且偏振分布偏振器和 当使用光学显微镜观察暗场时，将空间滤光片插入瞳孔平面。
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公开(公告)号：US09063168B2
公开(公告)日：2015-06-23
申请号：US14009729
申请日：2012-04-04
IPC分类号： G01Q60/06 , G01Q60/18 , B82Y20/00 , B82Y35/00 , G01N21/552 , B82Y15/00 , G01Q60/22 , G01Q70/12
摘要： Disclosed is a measurement method of a scanning probe microscope based upon a measurement method of a scanning probe microscope for observing a shape and an optical property of a sample by exciting near-field light, scanning relative positions of the near-field light and the sample and detecting scattered light by the sample of the near-field light and having a characteristic that the near-field light is modulated to periodically vary the relative positions of the near-field light and the sample and that a frequency of modulation applied to the near-field light and an interference signal generated at a frequency for varying the relative positions of the near-field light and the sample are selectively extracted.
摘要翻译： 公开了基于扫描探针显微镜的测量方法的扫描探针显微镜的测量方法，用于通过激发近场光来观察样品的形状和光学性质，扫描近场光和样品的相对位置 并且通过近场光的样本检测散射光，并具有调制近场光的周期性地改变近场光和样本的相对位置的特性，并且将调制频率应用于近场光 选择性地提取场射光和以用于改变近场光和样本的相对位置的频率产生的干涉信号。
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公开(公告)号：US08982332B2
公开(公告)日：2015-03-17
申请号：US13518727
申请日：2011-01-28
申请人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
发明人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
CPC分类号： G01S17/36 , G01B9/02003 , G01B9/02007 , G01B9/02008 , G01B9/0207 , G01S7/4815 , G01S7/4911 , G01S17/42
摘要： Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要翻译： 公开了使用光梳的距离测量装置。 为了使具有低反射率或散射面的表面的测量对象的绝对距离相差10微米，使用光学和非接触方法可以容易地测量精度为0.1mm以上， 测量到被测量物体的距离的距离测量装置被配置为通过比较反射或散射的光源和多个CW激光器之间的拍频信号的相位来测量到被测量物体的距离 在被照射到物体上之前，通过光源和多个CW激光器之间的拍频信号的相位的对象。
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10.发明申请公开(公告)号：US20120307605A1
公开(公告)日：2012-12-06
申请号：US13482065
申请日：2012-05-29
申请人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Shinji Homma , Tsuneo Nakagomi , Teruaki Tokutomi , Toshihiko Nakata , Takehiro Tachizaki
发明人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Shinji Homma , Tsuneo Nakagomi , Teruaki Tokutomi , Toshihiko Nakata , Takehiro Tachizaki
IPC分类号： G11B13/04
CPC分类号： G11B5/455 , G11B2005/0021
摘要： In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.
摘要翻译： 在用于检查热辅助磁记录头元件的方法和装置中，将样本安装在可在扫描探针显微镜装置的平面中移动的台上，从所述样本的渐逝光的发光部分产生ev逝光 通过在平面中移动台来检测ev逝光的散射光，同时具有探针的扫描探针显微镜的悬臂在试样的表面附近垂直振动，并且从from射光发射的ev逝光的强度分布 使用基于检测到的散射光的ev逝光的产生的位置信息来检查ev逝光的发光部分或试样的ev逝光的发光部分的表面轮廓。
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