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公开(公告)号：US20120180864A1
公开(公告)日：2012-07-19
申请号：US13381214
申请日：2010-07-16
申请人： Kun-ho Hwang , Yong-jun Jung , Min-soo Ko , Mee-hye Jeong
发明人： Kun-ho Hwang , Yong-jun Jung , Min-soo Ko , Mee-hye Jeong
IPC分类号： H01L31/0224 , H01L31/18 , H01B1/12
CPC分类号： H01L31/022425 , H01B1/22 , H01L31/0747 , Y02E10/50
摘要： There is provided a paste for the production of a solar cell electrode, which exhibits high electrical conductivity, low contact resistance, high aspect ratio, superior storage stability and excellent adhesive strength. When a solar cell electrode is produced from the paste according to the present invention, it can be cured at a drying temperature without undergoing a separate sintering process, thereby increasing productivity in the manufacture of solar cell electrodes
摘要翻译： 提供了用于生产太阳能电池电极的糊料，其具有高导电性，低接触电阻，高纵横比，优异的储存稳定性和优异的粘合强度。 当根据本发明的浆料制造太阳能电池电极时，其可以在干燥温度下固化而不经历单独的烧结工艺，从而提高制造太阳能电池电极的生产率
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公开(公告)号：US20180374655A1
公开(公告)日：2018-12-27
申请号：US16062504
申请日：2016-12-13
发明人： Young Sam Jin
IPC分类号： H01G9/20
摘要： A monolithic-type module of a perovskite solar cell includes: a plurality of unit cells including a substrate, a first electrode layer formed on the substrate and having conductivity, a perovskite optical absorption layer formed on the upper surface of the first electrode layer, and made of a porous metal oxide to which an optical absorber having a perovskite structure is attached, and a hole transport layer formed on the upper surface of the perovskite optical absorption layer; and a second electrode layer formed on the hole transport layer and formed of a conductive material, wherein an interconnection partition electrode of a predetermined height is formed between individual unit cells such that the plurality of unit cells are connected in series by interconnection wiring for electrically connecting the second electrode layer of each unit cell with the first electrode layer of a neighboring unit cell by the interconnection partition electrode.
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3.发明授权公开(公告)号：US11518908B2
公开(公告)日：2022-12-06
申请号：US16473697
申请日：2017-12-28
发明人： Seong Keun Jang , Seong Yeon Oh , Doo Shik Kim , Seung Sock Choi , Dong Jin Nam , Kyu Soon Shin
IPC分类号： C09D183/08 , C08G77/24 , C08K5/52 , C09D183/04 , C09D7/20 , C09D7/47 , C08K3/32 , C09D5/16 , C08K5/521 , C09K3/18
摘要： A water-repellent coating composition, and particularly, a water-repellent coating composition having improved adhesion and durability by including a phosphoric acid or a phosphoric acid-based compound, is provided.
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公开(公告)号：US20220334478A1
公开(公告)日：2022-10-20
申请号：US17854922
申请日：2022-06-30
发明人： Hyoc Min YOUN , Tai Hoon YEO , Gi Seon LEE , Bong Hee KIM , Dong Myung KIM
摘要： A positive photosensitive resin composition includes a polymer resin, a quinonediazide compound, and a solvent. The polymer resin includes (i) 5 to 95 wt. % of a polyimide precursor having a structural unit represented by Formula 1, ii) 5 to 95 wt. % of a polyimide precursor having a structural unit represented by Formula 2, and iii) 0 to 20 wt. % of a polyimide precursor having a structural unit represented by Formula 3. The quinonediazide compound is included in an amount of 5 to 50 parts by weight per 100 parts by weight of the polymer resin. The solvent is included in an amount of 100 to 2,000 parts by weight per 100 parts by weight of the polymer resin.
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公开(公告)号：US20210324261A1
公开(公告)日：2021-10-21
申请号：US17360831
申请日：2021-06-28
发明人： Young Mi KIM , Jong Bok Kim , Jong Gyu Baek , Joo Cheol Lee , Kyu Soon Shin
IPC分类号： C09K9/02 , G02F1/1516 , G02F1/1523
摘要： Disclosed are an electrochromic device and a manufacturing method therefor. The disclosed electrochromic device may comprise: a first electrochromic layer made of a first electrochromic agent; and a second electrochromic layer located on at least one surface of the first electrochromic layer and made of at least one of a second electrochromic derivative and a second electrochromic agent.
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公开(公告)号：US10712662B2
公开(公告)日：2020-07-14
申请号：US15405612
申请日：2017-01-13
发明人： Jin-A Ryu , Jung-Youl Lee , Kyung-Lyul Moon , Yool Kang , Hyun-Jin Kim , Yu-Jin Jeoung , Man-Ho Han
IPC分类号： C08G18/02 , G03F7/11 , H01L21/3213 , H01L21/311 , H01L21/027 , H01L49/02 , C09D175/00 , G03F7/004 , G03F7/09 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38 , H01L21/306 , H01L21/308
摘要： A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.
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7.发明授权公开(公告)号：US10539874B2
公开(公告)日：2020-01-21
申请号：US15609471
申请日：2017-05-31
发明人： Hyo Jung Roh , Ji Hyun Kim , Seung Jin Kim , Hyun Jin Kim
摘要： Provided is a composition for forming an organic anti-reflective coating layer used in a negative tone development, which not only enhance an adhesion to a photoresist while having a high refractive index and a high etch rate but also improve a pattern profile of undercut etc. The composition an isocyanurate compound containing at least one moiety which is represented by Formula 2; a polymer represented by Formula 3 and an organic solvent for dissolving the above-mentioned components.
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8.发明授权公开(公告)号：US10410758B2
公开(公告)日：2019-09-10
申请号：US15101488
申请日：2014-12-29
发明人： Byong Wook Lee , Sung Hyun Lee , Kyung Eun Kim , Myeong Jin Kim , Dong Min Seo , Seong Bae Kim
摘要： The present invention relates to a method for patterning a metal nanowire-based transparent conductive film through surface treatment and, more particularly, to a method wherein the refractive index is adjusted by adding an optical functional layer prior to a patterning process, the surface of a metal nanowire transparent conductive film is oxidized using a surface treatment agent composition or a salt compound is generated, thereby changing the color and insulating the surface, and a film having excellent visibility is patterned.
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公开(公告)号：US10332650B2
公开(公告)日：2019-06-25
申请号：US15192613
申请日：2016-06-24
发明人： Seon Yeong Gong , Soo Yeon Lee , Hyeonseong Choe , Chongchan Lee
IPC分类号： C01B32/174 , B22F9/24 , B82Y40/00 , H01B1/04 , C09D5/24 , C09D11/52 , C09D167/00 , C09D11/037 , C09D11/10 , C09D7/61 , C08K3/08 , C08K3/04
摘要： The present invention relates to a carbon-metal composite and a method for preparing carbon-metal composite, and more particularly to a method for preparing carbon-metal composite, which: is capable of reducing graphene oxide; which is capable of decreasing the steps and the time for hybridization of graphene which is obtained from the reduction, graphene or carbon nanotube, with metal; which is done under mild condition and; also which is capable of lowering resistivity of the carbon-metal composite. The method for preparing the carbon-metal composite comprises the steps of: reacting a composition containing a carbon compound selected from a group consisting of graphene, graphene oxide and carbon nanotube, a metallic precursor, a reducing agent and a solvent; and removing solvent partially or wholly from the composition reaction-completed. Wherein the reducing agent is selected from a group consisting of ethylene glycol, diethylene glycol, 1,2-propylene glycol, triethylene glycol, tetraethylene glycol, 1,3-propylene glycol, glycerol, and mixtures thereof.
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公开(公告)号：US20190077993A1
公开(公告)日：2019-03-14
申请号：US16189207
申请日：2018-11-13
发明人： Hye Jung Park , Jae Hyun Kim , Jong Dai Park , Min Gun Lee , Jong Chul Shin , Sung Hoon Jin
IPC分类号： C09G1/02
摘要： Disclosed is a chemical-mechanical polishing slurry composition having a small change in pH over time under an acidic condition and thus being easy to store for a long time. The chemical-mechanical polishing slurry composition includes an abrasive; an amount of about 0.000006 to 0.01 weight % of an aluminum component based on the total weight of the polishing slurry composition; and water. The number of silanol groups on a surface of the abrasive and a content of the aluminum component satisfy the requirements of following Equation 1: 0.0005≤(S*C)*100≤4.5, [Equation 1] wherein, S is the number of the silanol groups present on 1 nm2 of the abrasive surface (unit: number/nm2), and C is the content of the aluminum component (weight %) in the slurry composition.
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