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公开(公告)号：US20140239175A1
公开(公告)日：2014-08-28
申请号：US13779142
申请日：2013-02-27
申请人： FEI COMPANY
发明人： Mostafa Maazouz
CPC分类号： H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
摘要： The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
摘要翻译： 本发明提供了一种带电粒子束系统，其中聚焦离子束列的中间部分被偏压到高的负电压，允许光束以比该塔的该部分内的最终光束能量更高的电位移动。 在低kV电位下，像差和库仑相互作用减小，这导致光斑尺寸的显着改善。
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公开(公告)号：US09679742B2
公开(公告)日：2017-06-13
申请号：US14981164
申请日：2015-12-28
申请人： FEI Company
CPC分类号： H01J37/21 , H01J37/10 , H01J37/31 , H01J2237/0453 , H01J2237/30472 , H01J2237/317 , H01J2237/31745 , H01J2237/31749
摘要： The present invention provides a method for optimizing a shaped working beam having a sharp edge for making sufficiently precise cuts and a high beam current for faster processing. An ion beam is directed along an optical column through a reference aperture to form a reference beam that has a preferred shape and an associated reference current. The reference beam is optimized using selected parameters of the optical components within the optical column. The ion beam is then directed through a working aperture to form a working beam for use in a processing application. The working beam has a different shape from the reference beam and an associated working current that is higher than the reference current. The reference aperture and working aperture have at least one corresponding dimension. The working beam is then optimized using the selected optical component parameters used to align and focus the reference beam.
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公开(公告)号：US09443692B2
公开(公告)日：2016-09-13
申请号：US14803964
申请日：2015-07-20
申请人： FEI Company
发明人： Mostafa Maazouz
IPC分类号： H01J3/14 , H01J37/07 , H01J37/21 , H01J37/10 , H01J37/04 , H01J37/305 , H01J3/02 , H01J37/06 , H01J37/147 , H01J37/248
CPC分类号： H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
摘要： The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
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公开(公告)号：US20150083929A1
公开(公告)日：2015-03-26
申请号：US14565051
申请日：2014-12-09
申请人： FEI Company
发明人： Mostafa Maazouz
IPC分类号： H01J37/147 , H01J37/248 , H01J37/06
CPC分类号： H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
摘要： The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
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5.发明授权公开(公告)号：US10923318B2
公开(公告)日：2021-02-16
申请号：US16228201
申请日：2018-12-20
申请人： FEI Company
发明人： Galen Gledhill , Mostafa Maazouz , Gavin Mitchson
IPC分类号： H01J37/304 , H01J37/305 , G01T1/29 , G06N3/08 , G06N3/04
摘要： A focused ion beam (FIB) is used to mill beam spots into a substrate at a variety of ion beam column settings to form a set of training images that are used to train a convolutional neural network. After the neural network is trained, an ion beam can be adjusted by obtaining spot image which is processed with the neural network. The neural network can provide a magnitude and direction of defocus, aperture position, lens adjustments, or other ion beam or ion beam column settings. In some cases, adjustments are not made by the neural network, but serve to indicate that the ion beam and associated ion column continue to operate stably, and additional adjustment is not required.
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公开(公告)号：US08933414B2
公开(公告)日：2015-01-13
申请号：US13779142
申请日：2013-02-27
申请人： FEI Company
发明人： Mostafa Maazouz
CPC分类号： H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
摘要： The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
摘要翻译： 本发明提供了一种带电粒子束系统，其中聚焦离子束列的中间部分被偏压到高的负电压，允许光束以比该塔的该部分内的最终光束能量更高的电位移动。 在低kV电位下，像差和库仑相互作用减小，这导致光斑尺寸的显着改善。
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公开(公告)号：US20230411109A1
公开(公告)日：2023-12-21
申请号：US17807362
申请日：2022-06-16
申请人： FEI Company
IPC分类号： H01J37/09 , H01J37/244 , H01J37/22
CPC分类号： H01J37/09 , H01J37/244 , H01J37/226 , H01J2237/2443 , H01J2237/2445 , H01J2237/0458
摘要： Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.
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公开(公告)号：US20180061613A1
公开(公告)日：2018-03-01
申请号：US15683734
申请日：2017-08-22
申请人： FEI Company
发明人： Bohuslav Sed'a , Lubomír Tuma , Petr Hlavenka , Marek Uncovský , Radovan Vasina , Jan Trojek , Mostafa Maazouz
IPC分类号： H01J37/26 , H01J37/20 , H01J37/244
CPC分类号： H01J37/261 , G21K7/00 , H01J37/12 , H01J37/1413 , H01J37/18 , H01J37/20 , H01J37/244 , H01J2237/121 , H01J2237/1415 , H01J2237/188 , H01J2237/2605
摘要： A charged-particle microscope having a vacuum chamber comprises a specimen holder, a particle-optical column, a detector and an exchangeable column extending element. The specimen holder is for holding a specimen. The particle-optical column is for producing and directing a beam of charged particles along an axis so as to irradiate the specimen. The column has a terminal pole piece at an extremity facing the specimen holder. The detector is for detecting a flux of radiation emanating from the specimen in response to irradiation by the beam. The exchangeable column extending element is magnetically mounted on the pole piece in a space between the pole piece and the specimen holder. Methods of using the microscope are also disclosed.
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公开(公告)号：US09691583B2
公开(公告)日：2017-06-27
申请号：US14792771
申请日：2015-07-07
申请人： FEI Company
CPC分类号： H01J37/08 , H01J37/026 , H01J37/10 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/3007 , H01J37/3171 , H01J2237/0492 , H01J2237/08 , H01J2237/18 , H01J2237/188 , H01J2237/31713 , H01J2237/31749
摘要： Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
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公开(公告)号：US20170125207A1
公开(公告)日：2017-05-04
申请号：US14981164
申请日：2015-12-28
申请人： FEI Company
CPC分类号： H01J37/21 , H01J37/10 , H01J37/31 , H01J2237/0453 , H01J2237/30472 , H01J2237/317 , H01J2237/31745 , H01J2237/31749
摘要： The present invention provides a method for optimizing a shaped working beam having a sharp edge for making sufficiently precise cuts and a high beam current for faster processing. An ion beam is directed along an optical column through a reference aperture to form a reference beam that has a preferred shape and an associated reference current. The reference beam is optimized using selected parameters of the optical components within the optical column. The ion beam is then directed through a working aperture to form a working beam for use in a processing application. The working beam has a different shape from the reference beam and an associated working current that is higher than the reference current. The reference aperture and working aperture have at least one corresponding dimension. The working beam is then optimized using the selected optical component parameters used to align and focus the reference beam.
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