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公开(公告)号：US20240327308A1
公开(公告)日：2024-10-03
申请号：US18579024
申请日：2022-07-12
发明人： Bernhard KOHLHAUSER , Helmut SCHOECH , Beno WIDRIG , Juergen RAMM
CPC分类号： C04B41/4515 , C04B41/526 , C04B41/90
摘要： A CMAS resistant overlay coating including at least one CMAS resistant layer, wherein the overlay coating is i. disposed over a surface of a substrate including a material susceptible to CMAS corrosion, ii. includes a metal oxide matrix and iii. has at least partially a vertical columnar structure. Moreover, at least one non-oxidized metallic constituent selected from the group of aluminum, chromium and metallic constituents including aluminum and chromium is embedded in the metal oxide matrix. Furthermore, a substrate has a CMAS resistant overlay coating at issue on a surface of a material susceptible to CMAS corrosion. A CAE process is provided for forming such a CMAS resistant overlay coating on a surface of a material susceptible to CMAS corrosion.
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公开(公告)号：US20240084430A1
公开(公告)日：2024-03-14
申请号：US17768000
申请日：2020-10-09
发明人： Franco AROSIO , Rolf HEINECKE , Hossein NAJAFI
CPC分类号： C23C4/02 , C23C8/02 , C23C8/32 , F16D65/0025 , F16D65/125 , F16D65/127 , F16D2200/0013 , F16D2250/003 , F16D2250/0046
摘要： The invention relates to a method of producing a corrosion resistant coating system on a cast iron substrate preferably in the shape of a brake disc, the coating system being completed by a thermally sprayed top layer, characterised in that the cast iron substrate is first subjected to activation by means of a pulsed water jet after completion of machining which increases the surface roughness of the surface thus treated, whereupon the surface is nitrocarburized so that a corresponding diffusion layer is formed on it, whereupon the surface is subjected to an oxidation process in a next step and only then the top layer is applied by thermal spraying.
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公开(公告)号：US20240043991A1
公开(公告)日：2024-02-08
申请号：US18256986
申请日：2021-12-14
发明人： Olaf DIETRICH , Dirk BREIDT
CPC分类号： C23C16/27 , C23C16/042 , C23C16/0272 , C23C28/046
摘要： A method for producing a selective diamond-coated substrate, wherein the diamond-coated substrate includes: a substrate having surfaces including cemented carbide material, areas selected to be coated, and areas not selected to be coated; and one or more diamond coatings on the areas selected to be coated, the method including following steps in order: a first masking step, wherein the areas not selected to be coated but could be chemically attacked during a chemical pre-treatment step, are masked by applying a latex-mask covering these areas; one or more chemical pre-treatment steps; a mask-removing step, wherein the latex-mask is removed; a second masking step, wherein the areas of the substrate surfaces from which the latex-mask was removed and not selected to be coated but could be coated with one or more diamond coatings during one or more coating steps, are covered with one or more masking-covers; and one or more coating steps.
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公开(公告)号：US20240011145A1
公开(公告)日：2024-01-11
申请号：US18254267
申请日：2021-11-30
发明人： Timea STELZIG , Astrid GIES , Juergen BECKER
CPC分类号： C23C14/0641 , C23C14/352 , C23C14/024
摘要： Method for the production of a Mo—N-based coating structure, including: providing a substrate to be coated and applying a hard material layer on the substrate, wherein the hard material layer includes at least one layer of Mo—N having a hexagonal crystal structure and at least one layer of Mo—N having a cubic crystal structure or a mixed hexagonal/cubic crystal structure, wherein the hard material layer is applied by a low temperature closed field unbalanced reactive magnetron sputtering coating process.
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公开(公告)号：US20240006216A1
公开(公告)日：2024-01-04
申请号：US18255394
申请日：2021-12-02
发明人： Matthew Paul KIRK
IPC分类号： H01L21/683 , H01J37/32 , C23C14/02 , C23C14/35 , C23C16/02
CPC分类号： H01L21/6833 , H01J37/32697 , H01J37/32715 , C23C14/025 , H01J37/32495 , C23C14/35 , C23C16/0281 , H01J2237/3341
摘要： A device to be used within a plasma etching chamber for the manufacturing of semiconductor components, including providing a body forming the substrate of the device, applying a first coating on the surface of the body, wherein the first coating includes a metal and/or a metal alloy thin film coating layer in order to form a metal coated body, applying a second coating on the metal coated body, wherein the second coating includes a ceramic coating layer, wherein the second coating at least partially overlaps with the first coating.
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6.发明公开公开(公告)号：US20230265564A1
公开(公告)日：2023-08-24
申请号：US18003759
申请日：2021-06-29
发明人： Beno Widrig , Oliver Jarry , Bernhard Kohlhauser , Jürgen Ramm
IPC分类号： C23C28/00
CPC分类号： C23C28/325 , C23C28/3215 , C23C28/345
摘要： A surface coating for protecting substrates with Ti—Al material, preferably comprising one or more of the materials from table 1, wherein the coating comprises a layer sequence with at least one layer which forms a diffusion barrier for Ti, preferably according to one or more of the layer sequences specified in table 1 in rows, and wherein the coating comprises an oxidation barrier which is in particular adjusted to the diffusion barrier and preferably adjusted according to table 2, and in particular wherein the surface coating comprises a thermal barrier which is preferably adjusted to the oxidation barrier according to table 3.
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公开(公告)号：US11578401B2
公开(公告)日：2023-02-14
申请号：US16753565
申请日：2018-10-04
摘要： An ARC evaporator comprising: a cathode assembly comprising a cooling plate (11), a target (1) as cathode element, an electrode arranged for enabling that an arc between the electrode and the front surface (1A) of the target (1) can be established—a magnetic guidance system placed in front of the back surface (1 B) of the target (i) comprising means for generating one or more magnetic whereas: —the borders of the cathode assembly comprise a surrounding shield (15) made of ferromagnetic material, wherein the surrounding shield (15) has a total height (H) in the transversal direction, said total height (H) including a component (C) for causing a shielding effect of magnetic field lines extending in any longitudinal directions, establishing in this manner the borders of the cathode assembly as limit of the extension of the magnetic field lines in any longitudinal direction.
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公开(公告)号：US11542587B2
公开(公告)日：2023-01-03
申请号：US16095369
申请日：2017-04-21
摘要： A method for applying a coating having at least one TiCN layer to a surface of a substrate to be coated by means of high power impulse magnetron sputtering (HIPIMS), wherein, to deposit the at least one TiCN layer, at least one Ti target is used as the Ti source for producing the TiCN layer, said target being sputtered in a reactive atmosphere by means of a HIPIMS process in a coating chamber, wherein the reactive atmosphere comprises at least one inert gas; preferably argon, and at least nitrogen gas as the reactive gas, wherein: the reactive atmosphere additionally contains, as a second reactive gas, a gas containing carbon, preferably CH4, used as the source of carbon to produce the TiCN layer wherein, while depositing the TiCN layer, a bipolar bias voltage is applied to the substrate to be coated, or at least one graphite target is used as the source of carbon for producing the TiCN layer, said target being used for sputtering in the coating chamber using a HIPIMS process with the reactive atmosphere having only nitrogen gas as the reactive gas, wherein the Ti targets are preferably operated by means of a first power supply device or a first power supply unit and the graphite targets are operated with pulsed power by means of a second power supply device or a second power supply unit.
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公开(公告)号：US11517933B2
公开(公告)日：2022-12-06
申请号：US17007527
申请日：2020-08-31
发明人： Phillip J. LaForce
摘要： A coating assembly for coating a plurality of substrates. The coating assembly includes a chamber. At least one target is disposed in the chamber and includes a coating material. At least one power supply is connected to the target. At least one support fixture is disposed in the chamber. The at least one support fixture includes a base having a plurality of recesses formed in an upper surface of the base. A first mounting component has a plurality of slots. The first mounting component is positioned on the upper surface of the base wherein at least some of the plurality of recesses are in registry with corresponding ones of the plurality of slots to define a plurality of cavities, each of the plurality of cavities configured to hold at least one of the plurality of substrates to be coated.
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公开(公告)号：US20220307125A1
公开(公告)日：2022-09-29
申请号：US17597246
申请日：2020-07-03
摘要： A cathodic arc evaporation apparatus including a target which has a target surface including an active surface from where material can be evaporated in a cathodic arc process; a confinement surrounding an outer boarder of the target surface; an anode having an electron receiving surface, the anode encompassing at least one of the target and the confinement in at least one of a target plane and an axial distance in front of the active surface; and a magnetic guidance system adapted to provide a magnetic field at the target surface being essentially in parallel to at least an outer region of the target surface so that magnetic field lines are in parallel to the target surface or inclined to it in an acute angle α, whereat an active surface is defined in a surface area where magnetic field lines enter the target surface in an acute angle α≤45°.
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