公开(公告)号：US20240318317A1

公开(公告)日：2024-09-26

申请号：US18575699

申请日：2022-06-29

Applicant: SAINT-GOBAIN GLASS FRANCE

Inventor： Jean-Thomas FONNE ,  Denis GUIMARD ,  Lorenzo MANCINI ,  Nadia ZENID

IPC: C23C28/04 ,  C23C14/06 ,  C23C14/08 ,  C23C14/18 ,  C23C14/35 ,  C23C14/58 ,  C23C16/26 ,  C23C16/50 ,  C23C16/56 ,  C23C28/00

CPC classification number: C23C28/046 ,  C23C14/0652 ,  C23C14/086 ,  C23C14/185 ,  C23C14/35 ,  C23C14/5806 ,  C23C16/26 ,  C23C16/50 ,  C23C16/56 ,  C23C28/322 ,  C23C28/343

Abstract: A substrate coated with a stack of layers includes the following series of layers, starting from the surface of the substrate: a layer of diamond-like carbon DLC; a germanium or germanium oxide layer having a thickness of between 2 and 40 nm, the germanium or germanium oxide layer including less than 20% tin; and optionally, an oxygen barrier layer.

公开(公告)号：US20240153745A1

公开(公告)日：2024-05-09

申请号：US17981394

申请日：2022-11-05

Applicant: Applied Materials, Inc.

Inventor： Katherine Woo ,  Jennifer Y. Sun ,  Jian Li ,  Wenhao Zhang ,  Mayur Govind Kulkarni ,  Chidambara A. Ramalingam ,  Ryan Sheil ,  Martin J. Seamons ,  Nitin Deepak

IPC: H01J37/32 ,  C23C16/455 ,  C23C28/04 ,  C25D11/18

CPC classification number: H01J37/32495 ,  C23C16/45525 ,  C23C28/046 ,  C25D11/18 ,  H01J37/32467

Abstract: Semiconductor fabrication component preparation methods are described. In embodiments, the methods include forming a first layer on a surface of the semiconductor fabrication component. The first layer is characterized by a porosity of greater than or about 0.01 vol. %. The methods further include depositing a second layer on the first layer, where the second layer is characterized by a porosity of less than or about 20 vol. %. Treated semiconductor fabrication components are also described. In embodiments, the treated components include a first layer formed in the surface of the semiconductor fabrication component, where the first layer is characterized by a porosity of greater than or about 0.01 vol. %., and a second layer positioned on the first layer, where the second layer is characterized by a porosity of less than or about 20 vol. %.

公开(公告)号：US11661647B2

公开(公告)日：2023-05-30

申请号：US16566423

申请日：2019-09-10

Applicant: SCHLUMBERGER TECHNOLOGY CORPORATION

Inventor： Bing Han ,  Manuel Marya ,  Yuteng Liang

IPC: C23C8/22 ,  C23C16/50 ,  C23C14/06 ,  E21B43/12 ,  C23C8/32 ,  C23C8/08 ,  C23C16/26 ,  C23C28/04

CPC classification number: C23C8/22 ,  C23C8/08 ,  C23C8/32 ,  C23C14/0605 ,  C23C16/26 ,  C23C16/50 ,  C23C28/044 ,  C23C28/046 ,  E21B43/126

Abstract: Artificial lift pump components such as couplings are disclosed, all having a body formed from a selected material, the body having an inner diameter and an outer diameter, a first surface treatment introducing carbon, nitrogen, boron into the material to form a first and hard layer, and a second layer defined as an deposited coating to the first layer that is also made of a carbon, nitrogen, or boron and is further characterized as being ceramic like (hard) and having a low-friction.

公开(公告)号：US11644106B2

公开(公告)日：2023-05-09

申请号：US17298383

申请日：2019-12-18

Applicant: OERLIKON METCO (US) INC.

Inventor： Kevin Williams ,  James Vecchio ,  Jonathon Bracci ,  Justin Cheney ,  Petr Fiala

IPC: F16K3/02 ,  C23C4/126 ,  C22C19/05 ,  C22C29/08 ,  C23C4/10 ,  C23C4/18 ,  F16K3/36 ,  C23C28/04 ,  F16K25/00

CPC classification number: F16K3/0263 ,  C22C19/055 ,  C22C19/056 ,  C22C29/08 ,  C23C4/10 ,  C23C4/126 ,  C23C4/18 ,  C23C28/042 ,  C23C28/044 ,  C23C28/046 ,  F16K3/36 ,  F16K25/005

Abstract: A method of manufacturing a device includes thermally spraying tungsten carbine in feedstock that does not include Cobalt but that includes Nickel, Copper, or a Nickel-Copper alloy, the method improves the base coating toughness, anticorrosion, and antifouling properties for high load application in sea water and brackish water environments. Additionally, a Cobalt-free material lowers material costs and reduces the global demand of Cobalt. Providing a topcoat of a Silicon-doped DLC significantly reduces the topcoat brittleness of common DLC failures such as “egg shell” in high stress applications. Thus, high hardness, low friction applications may be tailored in high stress applications.

公开(公告)号：US20180221916A1

公开(公告)日：2018-08-09

申请号：US15758109

申请日：2015-10-29

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： KUAN-TING WU ,  CHI-HAO CHANG ,  WEI-CHUNG CHEN

IPC: B05D7/00 ,  C25D11/02 ,  C25D11/30

CPC classification number: B05D7/57 ,  B05D1/02 ,  B05D1/18 ,  B05D3/067 ,  B05D2202/20 ,  B05D2350/00 ,  B05D2602/00 ,  C22C23/00 ,  C23C28/00 ,  C23C28/04 ,  C23C28/046 ,  C25D11/026 ,  C25D11/30

Abstract: The present invention relates to a multi-layered sheet comprising Mg-based alloy substrate, micro-arc oxidized layers formed on two opposite surfaces of the Mg-based alloy substrate and graphene-based barrier coating on either one or both of the micro-arc oxidized layers, wherein said graphene-based barrier coating comprises 20-70 wt % of graphene based on the total weight of the graphene-based barrier coating, a process for preparing the multi-layered sheet and the use of the multi-layered sheet as a housing in laptop, tablet PC, desktop computer, smart phone and 3C electronic devices.

公开(公告)号：US09922820B2

公开(公告)日：2018-03-20

申请号：US15420579

申请日：2017-01-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Noriaki Fukiage ,  Takayuki Karakawa ,  Toyohiro Kamada ,  Akihiro Kuribayashi ,  Takeshi Oyama ,  Jun Ogawa

IPC: H01L21/02 ,  C23C8/34 ,  H01J37/32 ,  H01L21/687

CPC classification number: H01L21/02277 ,  C23C8/34 ,  C23C16/345 ,  C23C16/4554 ,  C23C16/45551 ,  C23C28/04 ,  C23C28/046 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32715 ,  H01J2237/332 ,  H01L21/0217 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/68764

Abstract: A method of forming a silicon nitride film on a substrate in a vacuum vessel, includes forming the silicon nitride film by depositing a layer of reaction product by repeating a cycle a plurality of times. The cycle includes a first process of supplying a gas of a silicon raw material to the substrate to adsorb the silicon raw material to the substrate, subsequently, a second process of supplying a gas of ammonia in a non-plasma state to the substrate to physically adsorb the gas of the ammonia to the substrate, and subsequently, a third process of supplying active species obtained by converting a plasma forming gas containing a hydrogen gas for forming plasma into plasma to the substrate and causing the ammonia physically adsorbed to the substrate to react with the silicon raw material to form the layer of reaction product.

公开(公告)号：US09759322B2

公开(公告)日：2017-09-12

申请号：US14379286

申请日：2013-02-15

Applicant: MAHLE Metal Leve S.A. ,  MAHLE International GmbH

Inventor： Juliano A. Araujo ,  Nuno Costa

IPC: F16C33/04 ,  B32B7/02 ,  G11B5/64 ,  B32B9/00 ,  F16J9/26 ,  C23C28/00

CPC classification number: F16J9/26 ,  C10N2280/00 ,  C23C14/0605 ,  C23C14/0635 ,  C23C14/34 ,  C23C28/04 ,  C23C28/046 ,  C23C28/322 ,  C23C28/341 ,  C23C28/343 ,  C23C28/347 ,  C23C28/42 ,  F16C33/124 ,  F16C2206/04 ,  F16C2223/60

Abstract: A sliding element for use in an internal combustion engine may include a ferrous base having a peripheral sliding surface covered by a protective surface layer, the protective surface layer including at least one nitride applied via at least one of physical vapour deposition and a nitrided layer. The peripheral sliding surface may have a diamond like carbon (DLC) coating disposed thereon. The coating may include at least one of (a) one or more transition layers composed of WC1-x and (b) an adhesive layer of metallic chromium with a crystal structure. The coating may include an intermediate layer of metal DLC, the metal may be tungsten in a multilayer structure of a-C:H:W and a-C:H, and an outer layer of metal-free DLC.

公开(公告)号：US20170043406A1

公开(公告)日：2017-02-16

申请号：US15305917

申请日：2015-04-24

Applicant: KYOCERA Corporation

Inventor： Masahiro WAKI

IPC: B23B27/14 ,  C23C16/27 ,  C01B31/06 ,  B23B51/02

CPC classification number: B23B27/14 ,  B23B51/02 ,  B23B2226/31 ,  B23B2228/04 ,  B23B2228/105 ,  B23B2228/44 ,  C23C16/26 ,  C23C16/27 ,  C23C16/271 ,  C23C28/044 ,  C23C28/046 ,  C23C28/048 ,  C23C30/005

Abstract: A coated tool is provided which is capable of inhibiting occurrence of chipping, peeling-off, or the like of a diamond layer by enhancing fracture resistance, and which has the diamond layer with high wear resistance. The coating tool is, for example, a drill having a diamond layer coated on a surface of a base material. The diamond layer has a first coating layer located close to the base material, and a second coating layer located on the first coating layer. A mean particle size of second diamond particles constituting the second coating layer is smaller than a mean particle size of first diamond particles constituting the first coating layer. The diamond layer contains hydrogen, and a hydrogen content in the second coating layer is larger than a hydrogen content in the first coating layer.

Abstract translation: 提供了一种涂覆的工具，其能够通过提高抗断裂性而抑制金刚石层的切屑，剥离等的发生，并且具有高耐磨性的金刚石层。 涂覆工具是例如具有涂覆在基材表面上的金刚石层的钻头。 金刚石层具有靠近基材的第一涂层和位于第一涂层上的第二涂层。 构成第二涂层的第二金刚石颗粒的平均粒径小于构成第一涂层的第一金刚石颗粒的平均粒径。 金刚石层含有氢，第二涂层中的氢含量大于第一涂层中的氢含量。

公开(公告)号：US20170036274A1

公开(公告)日：2017-02-09

申请号：US15303301

申请日：2015-04-22

Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)

Inventor： MAIKO ABE ,  Kenji YAMAMOTO

IPC: B23B27/14 ,  C23C14/06

CPC classification number: B23B27/148 ,  B23B27/14 ,  B23B51/00 ,  B23B2222/28 ,  B23B2228/10 ,  B23C5/16 ,  C23C14/06 ,  C23C14/0641 ,  C23C28/044 ,  C23C28/046

Abstract: A cutting tool has a substrate. A surface of the substrate for the cutting tool is covered with a hard film. In the cutting tool, the hard film has a root-mean-square slope RΔq in a surface of the hard film of 0.060° or less.

Abstract translation: 切割工具具有基底。 用于切削工具的基板的表面被硬膜覆盖。 在切削工具中，硬膜的硬膜的表面的均方根斜率RΔq为0.060°以下。

公开(公告)号：US20160305014A1

公开(公告)日：2016-10-20

申请号：US15101925

申请日：2014-12-01

Applicant: MAHLE METAL LEVE S/A ,  MAHLE INTERNATIONAL GMBH

Inventor： Paulo Jose Da Rocha Mordente ,  Edney Deschauer Rejowski ,  Jose Valentim Lima Sarabanda ,  Robert Richard Field

IPC: C23C16/04 ,  C23C16/50 ,  F02F1/20 ,  C23C16/26

CPC classification number: C23C16/045 ,  C23C16/029 ,  C23C16/26 ,  C23C16/50 ,  C23C28/046 ,  C23C28/048 ,  F02F1/20

Abstract: A process for coating a cylinder or a liner of an internal combustion engine may involve a plasma assisted chemical vapour deposition (PACVD) technique. The process may include placing a component to be coated in a PACVD system; forming a negative pressure within the system in an inert atmosphere including argon, hydrogen, or a mixture thereof; activating a surface of the component at a bias voltage of 300 to 550 Vbias; performing an ionization of the component at a bias voltage of 800 to 1200 Vbias; depositing an adhesive layer having a precursor element on the surface of the component; depositing a transition layer having a gradient content of increasing amorphous carbon and decreasing precursor element; and depositing an upper layer composed of an amorphous carbon with the precursor element.

Abstract translation: 用于涂覆内燃机的气缸或衬套的方法可以包括等离子体辅助化学气相沉积（PACVD）技术。 该方法可以包括将待涂覆的部件放置在PACVD系统中; 在包括氩，氢或其混合物的惰性气氛中在体系内形成负压; 在偏置电压为300至550Vbias时激活部件的表面; 以800〜1200Vbias的偏置电压进行元件的电离; 在组件的表面上沉积具有前体元素的粘合剂层; 沉积具有增加的无定形碳和减少的前体元素的梯度含量的过渡层; 以及由所述前体元件沉积由无定形碳组成的上层。