公开(公告)号：US20140127519A1

公开(公告)日：2014-05-08

申请号：US14112257

申请日：2012-04-16

申请人： Markus Lechthaler

发明人： Markus Lechthaler

IPC分类号： C23C14/35 ,  B23B51/00

CPC分类号： C23C14/354 ,  B23B51/00 ,  C23C14/345 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/568 ,  H01J37/3405 ,  H01J37/3467 ,  Y10T407/1904 ,  Y10T428/31678

摘要： Method for performing a HIPIMS coating process, whereby a minimal distance 5 between target and substrate is reduced till achieving an essentially maximal bias current at substrate during coating process, and thereby improving considerably coating quality and increasing deposition rate in comparison with conventional HIPIMS coating processes.

摘要翻译： 用于执行HIPIMS涂覆工艺的方法，由此目标和基底之间的最小距离5减小，直到在涂覆过程中在基底处获得基本上最大的偏置电流，从而与传统的HIPIMS涂覆方法相比，显着提高了涂层质量并提高了沉积速率。

公开(公告)号：US20140061034A1

公开(公告)日：2014-03-06

申请号：US14075085

申请日：2013-11-08

申请人： Oerlikon Trading AG, Trübbach

发明人： Helmut Rudigier ,  Jürgen Ramm ,  Beno Widrig ,  Troy Vom Braucke

IPC分类号： C23C14/32

CPC分类号： C23C14/325 ,  C23C14/022 ,  C23C14/025 ,  H01J37/32055 ,  H01J37/32064

摘要： The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.

摘要翻译： 本发明涉及一种用于在真空处理系统中涂覆工件的方法，该真空处理系统具有作为电弧蒸发源的一部分的实施为目标的第一电极。 使用第一电极，电弧以电弧电流运行并蒸发材料。 偏置电压与工件一起施加到偏置电极，偏置电极包括实施为工件保持器的第二电极。 进行金属离子轰击以预处理工件或在多层体系的一层到相邻层的至少一个过渡中，使得不会发生显着的材料去除和显着的材料堆积，而是引入金属离子 进入基板表面或成为多层系统的层。

公开(公告)号：US20130052477A1

公开(公告)日：2013-02-28

申请号：US13575358

申请日：2011-01-25

申请人： Markus Lechthaler ,  Christian Tritremmel

发明人： Markus Lechthaler ,  Christian Tritremmel

IPC分类号： B32B15/04 ,  C23C16/44

CPC分类号： C23C14/0641 ,  C23C14/0647 ,  C23C28/04 ,  C23C30/005 ,  Y10T428/12549 ,  Y10T428/24975 ,  Y10T428/265

摘要： The present invention relates to a multilayer coating system deposited on at least a portion of a solid body surface and containing in the multilayer architecture Al—Cr—B—N individual layers deposited by means of a physical vapour deposition method characterized in that in at least a portion of the overall thickness of the multilayer coating system the Al—Cr—B—N individual layers are combined with Ti—Al—N individual layers, wherein the Al—Cr—B—N and Ti—Al—N individual layers are deposited alternately one on each other, and wherein the thickness of the Al—Cr—B—N individual layers is thicker than the thickness of the Ti—Al—N individual layers, and thereby the residual stress of the multilayer coating system is considerably lower in comparison to the residual stress of the corresponding analogical Al—Cr—B—N monolayer coating.

摘要翻译： 本发明涉及一种沉积在固体表面的至少一部分上的多层涂层体系，其中包含通过物理气相沉积方法沉积的多层结构的Al-Cr-B-N单层，其特征在于至少 Al-Cr-B-N单层与Ti-Al-N单层结合的多层涂层体系的总厚度的一部分，其中Al-Cr-B-N和Ti-Al-N单独层是 交替地沉积在其中，并且其中Al-Cr-B-N单独层的厚度比Ti-Al-N单独层的厚度厚，从而多层涂覆体系的残余应力显着降低 与相应的类似Al-Cr-B-N单层涂层的残余应力相比。

公开(公告)号：US20110143054A1

公开(公告)日：2011-06-16

申请号：US13059257

申请日：2009-08-10

申请人： Denis Kurapov ,  Markus Lechthaler

发明人： Denis Kurapov ,  Markus Lechthaler

IPC分类号： C23C26/00 ,  B05D5/06

CPC分类号： C23C14/081 ,  C23C14/0641 ,  C23C14/325 ,  C23C14/3414 ,  H01J2237/20

摘要： The invention relates to a method for using a target for a coating process of metal oxide and/or metal nitride coatings by means of spark evaporation, wherein the target can be operated at a temperature that is higher than the melting point of the metal used in the target, and wherein the target is comprised of a metal whose oxides and/or nitrides are not electrically conducting. The invention further relates to the use of a target for producing metal oxide coatings and/or metal nitride coatings by means of spark evaporation, wherein the target has a matrix comprised of a metal, in which matrix non electrically conducting oxides and/or nitrides of the metal are embedded.

摘要翻译： 本发明涉及一种通过火花蒸发使用靶用于金属氧化物和/或金属氮化物涂层的涂覆方法的方法，其中所述靶可以在高于所用金属的熔点的温度下操作 靶，其中靶由氧化物和/或氮化物不导电的金属构成。 本发明还涉及用于通过火花蒸发来生产金属氧化物涂层和/或金属氮化物涂层的靶的用途，其中所述靶具有由金属构成的基体，其中基体非导电氧化物和/或氮化物 金属被嵌入。

公开(公告)号：US07883217B2

公开(公告)日：2011-02-08

申请号：US11765502

申请日：2007-06-20

申请人： Peter Menard

发明人： Peter Menard

IPC分类号： G03B21/20

CPC分类号： G03B21/2046 ,  G03B21/145

摘要： A lamp mount system for high voltage projector lamps includes only a few parts which fit together without the need for connecting hardware. A single piece clip snaps into a single piece lamp mount and, together with the lamp form a lamp mounting assembly. The lamp mounting assembly in turn slidably engages with a single piece lamp base. The lamp mount assembly may be slideably removed when the lamp burns out.

摘要翻译： 用于高压投影灯的灯安装系统仅包括几个装配在一起的部件，而不需要连接硬件。 单件夹子卡入单件灯座，并与灯一起形成灯安装组件。 灯安装组件又与单件灯座可滑动地接合。 当灯熄灭时，灯座安装组件可以可滑动地移除。