SPINAL IMPLANT
    1.
    发明申请
    SPINAL IMPLANT 审中-公开

    公开(公告)号:US20190133776A1

    公开(公告)日:2019-05-09

    申请号:US16176045

    申请日:2018-10-31

    申请人: Gun Choi

    发明人: Gun Choi

    IPC分类号: A61F2/44 A61B17/70

    摘要: Provided is a spinal implant. The spinal implant include an implant unit disposed between a vertebra (hereinafter, referred to as a ‘first vertebra’) and a neighboring vertebra (hereinafter, referred to as a ‘second vertebra’) and a buffer unit provided in the implant unit to disperse or absorb a pressure, an impact, or a load, which is applied from the first vertebra and the second vertebra. The spinal implant may promote bone fusion formation in the state of being inserted between the vertebra and the neighboring vertebra during the surgery and to promote the quickly recovery after the surgery and also may fulfill its role as a substitute for a damaged disk through the shape deformation and the restoration of the buffer unit after the surgical procedure.