GAS MIXING AND PRODUCT PRODUCTION SYSTEMS AND METHODS

    公开(公告)号:US20240286097A1

    公开(公告)日:2024-08-29

    申请号:US18174026

    申请日:2023-02-24

    Inventor: Jeffrey GRILL

    CPC classification number: B01F35/714 B01F23/191 B01F35/2211 B01F35/718051

    Abstract: A method of for mixing gases is described. The gases may include a first and a second gas wherein a gas mixing system accepts the gases and operates in a plurality of modes of operation to produce a discharge gas including a mixture thereof, and the second gas may be supplied without the first gas, and the first gas may be supplied without the second gas. The gas mixing system may be integrated with a gas processing system to produce a biogas-related product. The gas mixing system may be a compressor, a jet compressor, an ejector, an eductor, venturi jet pump, eductor-jet pump, and/or a thermocompressor, that uses a first stream of high-pressure gas to entrain a relatively lower pressure second gas, mixes the two, and discharges a third gas mixture that is of a sufficiently elevated pressure to be supplied to other areas of a production facility.

    FACILITY AND METHOD FOR DISTRIBUTING A GAS MIXTURE FOR DOPING SILICON WAFERS

    公开(公告)号:US20230285911A1

    公开(公告)日:2023-09-14

    申请号:US18008375

    申请日:2021-05-27

    Abstract: Plant for delivering a gas mixture to a silicon wafer doping unit comprising a source of a dopant gas (1), a source of a carrier gas (2), a mixer device (3) connected to the container of dopant gas (1) and to the source of carrier gas (2), a first flow regulator member (41) and a second flow regulator member (42) for regulating the flows of the dopant gas (1) and of the carrier gas (2) towards the mixer device (3), a control unit (5) for controlling the first and second flow regulator members (41, 42) so as to adjust the first flow rate setpoint (D1) and the second flow rate setpoint (D2) in proportions determined as a function of at least one target content (C1, C2) of dopant gas (1) and/or carrier gas (2) in the mixture, a buffer tank (7), a delivery line (6) for delivering the mixture to a doping unit (10) with a consumption flow rate (DC), at least one measurement sensor (8) for measuring a physical quantity, the variation of which is representative of a variation in the consumption flow rate (DC) and for providing a first measurement signal, the control unit (5) being connected to the sensor (8) and configured to produce a first control signal from the first measurement signal, the flow regulator members (41, 42) being configured to adjust the first and second flow rate setpoints (D1, D2) in response to said first control signal.

    DISSOLUTION SYSTEM
    10.
    发明公开
    DISSOLUTION SYSTEM 审中-公开

    公开(公告)号:US20240116016A1

    公开(公告)日:2024-04-11

    申请号:US18045082

    申请日:2022-10-07

    Applicant: Cytiva US LLC

    Abstract: A dissolution system includes a dissolution line and a bypass line. The dissolution line fluidly couples a biocontainer, a pump, a cartridge, an upstream filter, and a downstream filter in a circulation loop. The bypass line is in fluid communication with the dissolution line at an upstream junction and a downstream junction such that the bypass line is in parallel relationship with the cartridge. A flow control system is configured to control the flow of fluid through the cartridge such that the flow of fluid through at least one of the dissolution line and the bypass line is selectively controlled based upon a pressure in the dissolution line downstream of the cartridge between the cartridge and the biocontainer.

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