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114 条记录 (耗时 0.024 秒)

    PROCESS FOR MANUFACTURING COLLOIDAL MATERIALS, COLLOIDAL MATERIALS AND THEIR USES
    6.
    发明申请
    PROCESS FOR MANUFACTURING COLLOIDAL MATERIALS, COLLOIDAL MATERIALS AND THEIR USES 有权
    制造胶体材料，胶体材料及其用途的方法

    公开(公告)号：US20110248222A1

    公开(公告)日：2011-10-13

    申请号：US13063543

    申请日：2009-09-10

    申请人： Benoit Dubertret ,  Sandrine Ithurria

    发明人： Benoit Dubertret ,  Sandrine Ithurria

    IPC分类号： H01B1/00 ,  B82Y30/00

    CPC分类号： B01J13/0026 ,  B01J13/00

    摘要： The present invention relates to a process for manufacturing a colloidal material, to colloidal materials obtainable by this process and to uses of said colloidal material for the manufacture of optic devices. The colloidal material obtainable by the process of the present invention is of formula AnXm, wherein A is an element selected from groups II, III or IV of the periodic table, wherein X is a metal selected from groups V or VI of the periodic table, and wherein, in the selection of the pair (A, X), the groups of the periodic table of A and X, respectively, are selected from the following combinations: (group II, group VI), (group III, group V) or (group IV, group VI); and wherein n and m are such that AnXm is a neutral compound. For example, the colloidal compound obtainable by the process of the present invention may be CdS, In P, or PbS. Other examples are provided below. The process of the present invention comprises a step of solution phase decomposition of a mixture of X and a carboxylate of formula A(R—COO)p in the presence of a non- or weakly-coordinating solvent, and a step of injecting an acetate salt or acetic acid in the mixture; wherein p is an integer between 1 and 2; R is a linear or branched C1-30alkyl group. The colloidal material of the present invention may be used for example for the manufacture of a laser or an optoelectronic device.

    摘要翻译： 本发明涉及一种胶体材料的制造方法，可通过该方法获得的胶体材料以及所述胶体材料用于制造光学装置的用途。 通过本发明的方法得到的胶态材料具有式AnXm，其中A是选自元素周期表的II，III或IV族的元素，其中X是选自元素周期表V或VI族的金属， 并且其中，在选择对（A，X）时，A和X的周期表分别分别选自以下组合：（组II，组VI），（组III，组V） 或（IV组，VI组）; 并且其中n和m使得AnXm是中性化合物。 例如，可以通过本发明的方法获得的胶体化合物可以是CdS，In P或PbS。 以下提供其他示例。 本发明的方法包括在非配位或非配位溶剂的存在下，将式A（R-COO）p的X和羧酸酯的混合物溶解相分解的步骤和注入乙酸酯 盐或乙酸; 其中p是1和2之间的整数; R是直链或支链的C 1-3烷基。 本发明的胶体材料可用于例如制造激光或光电器件。

    Reactive monomer-dispersed silica sol and production method thereof, and curable composition and cured article thereof
    7.
    发明申请
    Reactive monomer-dispersed silica sol and production method thereof, and curable composition and cured article thereof 审中-公开
    反应性单体分散二氧化硅溶胶及其制备方法，固化性组合物及其固化物

    公开(公告)号：US20110172331A1

    公开(公告)日：2011-07-14

    申请号：US13064293

    申请日：2011-03-16

    申请人： Naohiko Suemura ,  Keiko Yoshitake

    发明人： Naohiko Suemura ,  Keiko Yoshitake

    IPC分类号： C08K3/36 ,  C08F8/42 ,  C08G59/14 ,  C08L63/00

    CPC分类号： C08F2/40 ,  B01J13/0008 ,  B01J13/0026 ,  B01J13/0047 ,  C01B33/146 ,  C08F2/44 ,  C08G59/621

    摘要： A reactive monomer-dispersed silica sol having high stability by reducing the solid acidity of the surfaces of the colloidal silica particles contained in the reactive monomer-dispersed silica sol, and a production method thereof, and a curable composition using the reactive monomer-dispersed silica sol, and a cured article in which the deterioration, the degradation, or the like of the polymer is suppressed. A reactive monomer-dispersed silica sol containing a colloidal silica particle in which an alkaline earth metal ion is bonded to a surface of the colloidal silica particle.

    摘要翻译： 通过降低反应性单体分散二氧化硅溶胶中所含的胶态二氧化硅粒子的表面的固体酸性而得到的具有高稳定性的反应性单体分散硅溶胶及其制造方法以及使用该反应性单体分散二氧化硅的固化性组合物 溶胶以及抑制聚合物的劣化，劣化等的固化物。 含有胶体二氧化硅颗粒的反应性单体分散二氧化硅溶胶，其中碱土金属离子结合到胶体二氧化硅颗粒的表面。