公开(公告)号：US20130049149A1

公开(公告)日：2013-02-28

申请号：US13598087

申请日：2012-08-29

申请人： Keita KATO ,  Atsushi NAKAMURA

发明人： Keita KATO ,  Atsushi NAKAMURA

IPC分类号： G03F7/027 ,  G03F7/004 ,  H01L31/00 ,  G03F7/20

CPC分类号： G03F7/0045 ,  C07C2602/14 ,  C07C2603/56 ,  C07C2603/74 ,  C08F212/08 ,  C08F220/10 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/325 ,  H01L21/0274 ,  H01L21/3081 ,  Y10S430/114

摘要： Provided is a method of forming a pattern, including forming an actinic-ray- or radiation-sensitive resin composition into a film, the actinic-ray- or radiation-sensitive resin composition including a resin (A) including a repeating unit containing a group that when acted on by an acid, is decomposed to thereby produce a polar group and including an aromatic group, which resin when acted on by an acid, decreases its solubility in an organic solvent, a nonionic compound (B) that when exposed to actinic rays or radiation, generates an acid and a solvent (C), exposing the film to actinic rays or radiation, and developing the exposed film with a developer including an organic solvent to thereby form a negative pattern.

摘要翻译： 提供一种形成图案的方法，包括将光敏射线或辐射敏感性树脂组合物形成在膜中，所述光化学射线或辐射敏感性树脂组合物包括含有包含基团的重复单元的树脂（A） 当被酸作用时，其被分解，从而产生极性基团并且包括芳族基团，该树脂在被酸作用时降低其在有机溶剂中的溶解度，当暴露于光化反应时的非离子化合物（B） 产生酸和溶剂（C），将膜暴露于光化射线或辐射，并用包含有机溶剂的显影剂显影曝光的膜，从而形成负图案。

公开(公告)号：US3450775A

公开(公告)日：1969-06-17

申请号：US3450775D

申请日：1966-11-30

申请人： SUN OIL CO

发明人： SCHNEIDER ABRAHAM

IPC分类号： C07C20060101 ,  C07C29/48 ,  C07C29/50 ,  C07C35/22 ,  C07C35/37

CPC分类号： A01N31/06 ,  C07C29/48 ,  C07C29/50 ,  C07C35/37 ,  C07C2603/56 ,  C07C2603/74 ,  C07C35/22

公开(公告)号：US20170320802A1

公开(公告)日：2017-11-09

申请号：US15520063

申请日：2015-07-20

申请人： COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH

发明人： Sandip BHARATE ,  Ajay KUMAR ,  Jaideep BHARATE ,  Prashant JOSHI ,  Abubakar WANI ,  Ramesh MUDUDUDDLA ,  Rohit SHARMA ,  Ram VISHWAKARMA

IPC分类号： C07C49/84 ,  A61K31/122 ,  C07C205/34 ,  C07C49/743 ,  C07C2603/70

CPC分类号： C07C49/84 ,  A61K31/122 ,  C07C49/743 ,  C07C205/34 ,  C07C2603/56 ,  C07C2603/70 ,  C07D311/96

摘要： The present invention relates to the polyprenylated phloroglucinol compounds of formulae I and II. The present invention also provides synthesis and p-glycoprotein induction activity of the alkyl- and acyl-polyprenylated phloroglucinol compounds. Further, use of the compounds as p-glycoprotein inducers and methods of treatment of Alzheimer's disease using compounds of the invention are also provided.

公开(公告)号：US20190047943A1

公开(公告)日：2019-02-14

申请号：US15765903

申请日：2017-04-18

申请人： TAISHO PHARMACEUTICAL CO., LTD

发明人： Norikazu OTAKE ,  Takashi HASHIHAYATA ,  Yohei MATSUDA ,  Seiji MASUDA ,  Yuko YAMAUCHI

IPC分类号： C07C229/50 ,  C07D213/61 ,  C07D213/64

CPC分类号： C07C229/50 ,  C07C255/47 ,  C07C271/24 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/16 ,  C07C2602/18 ,  C07C2602/42 ,  C07C2602/48 ,  C07C2603/56 ,  C07C2603/74 ,  C07D213/61 ,  C07D213/64

摘要： Provided is an amino acid derivative prodrug represented by general formula (I-A) that is a prodrug form of an amino acid derivative which is a group 2 metabotropic glutamate receptor antagonist, or a pharmaceutically acceptable salt thereof.More specifically, provided is an amino acid derivative prodrug represented by general formula (I-A) that is a preventive or therapeutic drug for mood disorders (including depression and bipolar disorder), anxiety disorder, cognitive disorders, developmental disorders, Alzheimer's disease, Parkinson's disease, movement disorders associated with muscular rigidity, sleep disorders, Huntington's chorea, eating disorders, drug dependence, epilepsy, brain infarction, cerebral ischemia, cerebral insufficiency, cerebral edema, spinal cord disorders, head trauma, inflammation and immune-related diseases, and so on.

公开(公告)号：US09086623B2

公开(公告)日：2015-07-21

申请号：US13598087

申请日：2012-08-29

申请人： Keita Kato ,  Atsushi Nakamura

发明人： Keita Kato ,  Atsushi Nakamura

IPC分类号： G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  C08F220/10 ,  C08F212/08 ,  H01L21/027 ,  H01L21/308 ,  G03F7/039

CPC分类号： G03F7/0045 ,  C07C2602/14 ,  C07C2603/56 ,  C07C2603/74 ,  C08F212/08 ,  C08F220/10 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/325 ,  H01L21/0274 ,  H01L21/3081 ,  Y10S430/114

摘要： Provided is a method of forming a pattern, including forming an actinic-ray- or radiation-sensitive resin composition into a film, the actinic-ray- or radiation-sensitive resin composition including a resin (A) including a repeating unit containing a group that when acted on by an acid, is decomposed to thereby produce a polar group and including an aromatic group, which resin when acted on by an acid, decreases its solubility in an organic solvent, a nonionic compound (B) that when exposed to actinic rays or radiation, generates an acid and a solvent (C), exposing the film to actinic rays or radiation, and developing the exposed film with a developer including an organic solvent to thereby form a negative pattern.

摘要翻译： 提供一种形成图案的方法，包括将光敏射线或辐射敏感性树脂组合物形成在膜中，所述光化学射线或辐射敏感性树脂组合物包括含有包含基团的重复单元的树脂（A） 当被酸作用时，其被分解，从而产生极性基团并且包括芳族基团，该树脂在被酸作用时降低其在有机溶剂中的溶解度，当暴露于光化反应时的非离子化合物（B） 产生酸和溶剂（C），将膜暴露于光化射线或辐射，并用包含有机溶剂的显影剂显影曝光的膜，从而形成负图案。