公开(公告)号：US20100012031A1

公开(公告)日：2010-01-21

申请号：US12308446

申请日：2007-06-14

Applicant: Frank Torregrosa ,  Laurent Roux

Inventor： Frank Torregrosa ,  Laurent Roux

IPC: C23C14/48 ,  G01N21/55 ,  G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/55 ,  G01N2021/215

Abstract: The invention relates to a method of optical characterization, comprising a step of evaluating the doping of a substrate (SUB) using a reflected beam emanating from a light source, said method being carried out using apparatus comprising: said light source (LAS) to produce an incident beam (I) in an axis of incidence; a first detector (DET1, DET2) to measure the power of said reflected beam (R) in an axis of reflection; said axes of incidence and reflection crossing at a measurement point and forming a non-zero angle of measurement; and a polarizer (POL) disposed in the path of the incident beam (I). Furthermore, the light source (LAS) is monochromatic. The invention also envisages an ion implanter provided with said apparatus.

Abstract translation: 本发明涉及一种光学表征的方法，包括使用从光源发出的反射光束来评估衬底（SUB）的掺杂的步骤，所述方法使用以下装置进行：所述光源（LAS）产生 在入射轴上的入射光束（I）; 第一检测器（DET1，DET2），用于在反射轴中测量所述反射光束（R）的功率; 所述入射和反射轴在测量点处交叉并形成非零测量角; 以及设置在入射光束（I）的路径中的偏振器（POL）。 此外，光源（LAS）是单色的。 本发明还设想了设置有所述装置的离子注入机。

公开(公告)号：US20090094001A1

公开(公告)日：2009-04-09

申请号：US12336435

申请日：2008-12-16

Applicant: Vi VUONG ,  Junwei BAO ,  Yan CHEN ,  Weichert HEIKO ,  Sebastien EGRET

Inventor： Vi VUONG ,  Junwei BAO ,  Yan CHEN ,  Weichert HEIKO ,  Sebastien EGRET

IPC: G06F19/00

CPC classification number: G01N21/4788 ,  G01N21/211 ,  G01N2021/215

Abstract: Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables.

Abstract translation: 来自半导体处理系统的测量数据使用多变量分析进行转换。 特别地，获得了对使用该处理系统处理的一个或多个基底测量或模拟的一组度量数据。 使用多变量分析确定获得的度量数据集的一个或多个基本变量。 获得用于使用处理系统处理的一个或多个基底测量或模拟的第一测量数据。 获得的第一个测量数据不是之前获得的测量数据集中的度量数据之一。 使用所确定的一个或多个基本变量将第一计量数据转换成第二计量数据。

公开(公告)号：US07081958B2

公开(公告)日：2006-07-25

申请号：US11234829

申请日：2005-09-23

Applicant: Bengt Ivarsson

Inventor： Bengt Ivarsson

IPC: G01N21/55 ,  G01B11/28

CPC classification number: G01B11/0625 ,  G01N21/552 ,  G01N21/553 ,  G01N2021/212 ,  G01N2021/215

Abstract: A method of examining thin layer structures on a surface for differences in respect of optical thickness, which method comprises the steps of: irradiating the surface with light so that the light is internally or externally reflected at the surface; imaging the reflected light on a first two-dimensional detector; sequentially or continuously scanning the incident angle and/or wavelength of the light over an angular and/or wavelength range; measuring the intensities of light reflected from different parts of the surface and impinging on different parts of the detector, at at least a number of incident angles and/or wavelengths, the intensity of light reflected from each part of the surface for each angle and/or wavelength depending on the optical thickness of the thin layer structure thereon; and determining from the detected light intensities at the different light incident angles and/or wavelengths an optical thickness image of the thin layer structures on the surface. According to the invention, part of the light reflected at said surface is detected on a second detector to determine the incident angle or wavelength of the polarized light irradiating the surface. An apparatus for carrying out the method is also disclosed.

公开(公告)号：US20050195395A1

公开(公告)日：2005-09-08

申请号：US11070785

申请日：2005-03-02

Applicant: Noriaki Soga ,  Hiroshi Mineo ,  Kenichi Akao

Inventor： Noriaki Soga ,  Hiroshi Mineo ,  Kenichi Akao

IPC: G01N21/35 ,  G01J3/30 ,  G01N21/3563

CPC classification number: G01J3/453 ,  G01N21/211 ,  G01N2021/215 ,  G01N2021/3595

Abstract: A high-sensitivity reflection measurement apparatus disposed in an optical path between a light emitter and a detector of an analysis apparatus, the high-sensitivity reflection measurement apparatus comprising an incident-side optical element, wherein the incident-side optical element bends the optical path of measurement light emitted from the light emitter such that the angle of incidence of the measurement light emitted from the light emitter with respect to a sample surface under measurement is a desired angle ranging from 70 degrees inclusive to 90 degrees exclusive with respect to the direction perpendicular to the sample surface under measurement, transmits the measurement light as linearly polarized light having a desired oscillation direction, and makes the linearly polarized light incident on the sample surface under measurement; and information related to the sample surface under measurement is obtained according to light reflected from the sample surface under measurement when the linearly polarized light from the incident-side optical element is incident on the sample surface under measurement.

Abstract translation: 一种高灵敏度反射测量装置，其设置在分析装置的光发射器和检测器之间的光路中，所述高灵敏度反射测量装置包括入射侧光学元件，其中所述入射侧光学元件弯曲所述光路 从光发射器发射的测量光，使得从光发射器发射的测量光相对于被测样品表面的入射角是从垂直于垂直方向排列的70度至90度的期望角度 将测量光作为具有所需振荡方向的直线偏振光透射，并使测量时入射到样品表面的线偏振光; 并且当来自入射侧光学元件的直线偏振光入射到被测试样品表面上时，根据测量时的样品表面反射的光获得与被测样品表面有关的信息。

公开(公告)号：US11885738B1

公开(公告)日：2024-01-30

申请号：US16873259

申请日：2020-03-09

Applicant: Martin M. Liphardt ,  Galen L Pfeiffer ,  Ping He

Inventor： Martin M. Liphardt ,  Galen L Pfeiffer ,  Ping He

IPC: G01N21/21 ,  G01N21/55 ,  G01J3/28

CPC classification number: G01N21/211 ,  G01J3/2823 ,  G01N21/55 ,  G01N2021/215

Abstract: An imaging system, and method of its use, for viewing a sample surface at an inclined angle, preferably in functional combination with a sample investigating reflectometer, spectrophotometer, ellipsometer or polarimeter system; wherein the imaging system provides that a sample surface and multi-element imaging detector surface are oriented with respect to one another to meet the Scheimpflug condition, and wherein a telecentric lens system is simultaneously positioned between the sample surface and the input surface of the multi-element imaging detector such that an image of the sample surface produced by said multi-element imaging detector is both substantially in focus over the extent thereof, and such that substantially no keystone error is demonstrated in said image.

公开(公告)号：US20230213436A1

公开(公告)日：2023-07-06

申请号：US18161245

申请日：2023-01-30

Applicant: FUJIFILM Corporation

Inventor： Yujiro YANAI

IPC: G01N21/21 ,  G01N33/66

CPC classification number: G01N21/21 ,  G01N33/66 ,  G01N2021/215 ,  G01N2201/068 ,  G01N2201/124 ,  G01N2201/061

Abstract: Provided are a concentration measuring method of an optically active substance and a concentration measuring device of an optically active substance, which can easily and accurately measure a concentration of the optically active substance in aqueous humor. The concentration measuring method of an optically active substance includes: a first step of measuring a polarization state of a first reflected light that is obtained by irradiating an aqueous humor in an eye with an incidence light which is polarized and reflecting the incidence light at an interface between the aqueous humor and a lens, in which the polarization state of the first reflected light is measured by irradiating a first incidence light such that an angle between a normal line to a point where the incidence light intersects a surface of the lens, and the incidence light is equal to or smaller than a Brewster angle; a second step of measuring a polarization state of a second reflected light by irradiating with a second incidence light such that an angle of the incidence light is equal to or larger than the Brewster angle; a third step of calculating an optical rotation of the aqueous humor with information on the polarization state of the first reflected light and information on the polarization state of the second reflected light; and a fourth step of calculating a concentration of an optically active substance in the aqueous humor from the optical rotation of the aqueous humor.

公开(公告)号：US09265457B2

公开(公告)日：2016-02-23

申请号：US13701052

申请日：2011-04-28

Applicant: Srinivas Rao Kudavelly ,  Eduard Johannes Meijer

Inventor： Srinivas Rao Kudavelly ,  Eduard Johannes Meijer

IPC: A61B5/1455 ,  A61B5/00 ,  A61B5/145 ,  G01N21/21 ,  G01N21/31 ,  G01N21/47

CPC classification number: A61B5/14558 ,  A61B5/0059 ,  A61B5/14546 ,  A61B5/441 ,  A61B2562/0242 ,  G01N21/21 ,  G01N21/31 ,  G01N21/474 ,  G01N2021/215 ,  G01N2021/3137

Abstract: A tissue analyte measuring device (2) includes a light source (4) structured to emit unpolarized light toward the skin surface of a subject, and a detector assembly (8) configured to receive light reflected from the skin surface of the subject and the transcutaneous tissues of the subject, the detector assembly including a polarizing filter (12) and a number of light detector subassemblies (14). The polarizing filter is structured to filter out s-polarized light and pass only p-polarized light to light detector subassemblies. The light source is structured and positioned to emit the unpolarized light in a manner wherein the unpolarized light will exit the measuring device at a predetermined angle with respect to a normal to a light emitting plane of the measuring device, wherein the predetermined angle is an angle (the Brewster's angle) at which only s-polarized light will be reflected by the skin surface when the unpolarized light is incident thereon.

Abstract translation: 组织分析物测量装置（2）包括被构造成朝向对象的皮肤表面发射非偏振光的光源（4）和被配置为接收从受试者的皮肤表面反射的光和经皮肤的检测器组件（8） 检测器组件包括偏振滤光器（12）和多个光检测器子组件（14）。 偏振滤光器被构造为滤出s偏振光，并且仅将p偏振光通过光检测器子组件。 光源被构造和定位成以这样的方式发射非偏振光，其中非偏振光将相对于测量装置的发光平面的法线以预定角度离开测量装置，其中预定角度是角度 （布鲁斯特角），当非偏振光入射时，只有s偏振光将被皮肤表面反射。

公开(公告)号：US20090153859A1

公开(公告)日：2009-06-18

申请号：US12314839

申请日：2008-12-17

Applicant: Toshifumi Kimba

Inventor： Toshifumi Kimba

IPC: G01J4/00

CPC classification number: G01N21/211 ,  B24B37/013 ,  B24B49/12 ,  G01N2021/215

Abstract: A polishing end point detection method is to detect a polishing end point of a workpiece having a multilayer structure. The method is performed by emitting a first light and a second light to a surface of the workpiece at a first angle of incidence and a second angle of incidence, respectively, receiving the first light and the second light reflected from the surface through a polarizing filter, performing a first analyzing process of analyzing a brightness and a saturation of the surface from the first light received, performing a second analyzing process of analyzing a brightness and a saturation of the surface from the second light received, and determining removal of the upper layer based on changes in the brightness and the saturation of the surface.

Abstract translation: 抛光终点检测方法是检测具有多层结构的工件的抛光终点。 该方法通过以第一入射角和第二入射角分别向工件的表面发射第一光和第二光，通过偏振滤光器接收第一光和从表面反射的第二光， 执行从接收的第一光分析表面的亮度和饱和度的第一分析处理，执行从接收的第二光分析表面的亮度和饱和度的第二分析处理，并且确定上层的去除 基于表面的亮度和饱和度的变化。

公开(公告)号：US20070013912A1

公开(公告)日：2007-01-18

申请号：US11482501

申请日：2006-07-07

Applicant: Bengt Ivarsson

Inventor： Bengt Ivarsson

IPC: G01N21/55

CPC classification number: G01B11/0625 ,  G01N21/552 ,  G01N21/553 ,  G01N2021/212 ,  G01N2021/215

Abstract: A method of examining thin layer structures on a surface for differences in respect of optical thickness, which method comprises the steps of: irradiating the surface with light so that the light is internally or externally reflected at the surface; imaging the reflected light on a first two-dimensional detector; sequentially or continuously scanning the incident angle and/or wavelength of the light over an angular and/or wavelength range; measuring the intensities of light reflected from different parts of the surface and impinging on different parts of the detector, at at least a number of incident angles and/or wavelengths, the intensity of light reflected from each part of the surface for each angle and/or wavelength depending on the optical thickness of the thin layer structure thereon; and determining from the detected light intensities at the different light incident angles and/or wavelengths an optical thickness image of the thin layer structures on the surface. According to the invention, part of the light reflected at said surface is detected on a second detector to determine the incident angle or wavelength of the polarized light irradiating the surface. An apparatus for carrying out the method is also disclosed.

公开(公告)号：US20050007605A1

公开(公告)日：2005-01-13

申请号：US10766696

申请日：2004-01-27

Applicant: Bengt Ivarsson

Inventor： Bengt Ivarsson

IPC: G01N33/543 ,  G01B11/06 ,  G01N21/27 ,  G01N21/55 ,  G01B11/28

CPC classification number: G01B11/0625 ,  G01N21/552 ,  G01N21/553 ,  G01N2021/212 ,  G01N2021/215

Abstract: A method of examining thin layer structures on a surface for differences in respect of optical thickness, which method comprises the steps of: irradiating the surface with light so that the light is internally or externally reflected at the surface; imaging the reflected light on a first two-dimensional detector; sequentially or continuously scanning the incident angle and/or wavelength of the light over an angular and/or wavelength range; measuring the intensities of light reflected from different parts of the surface and impinging on different parts of the detector, at at least a number of incident angles and/or wavelengths, the intensity of light reflected from each part of the surface for each angle and/or wavelength depending on the optical thickness of the thin layer structure thereon; and determining from the detected light intensities at the different light incident angles and/or wavelengths an optical thickness image of the thin layer structures on the surface. According to the invention, part of the light reflected at said surface is detected on a second detector to determine the incident angle or wavelength of the polarized light irradiating the surface. An apparatus for carrying out the method is also disclosed.

Abstract translation: 一种检查表面上薄层结构相对于光学厚度差异的方法，该方法包括以下步骤：用光照射表面，使得光在表面内部或外部反射; 对第一二维检测器上的反射光进行成像; 在角度和/或波长范围内顺序地或连续地扫描光的入射角和/或波长; 测量从表面的不同部分反射的光的强度，并且以至少多个入射角和/或波长在入射角和/或波长的至少多个入射角度和/或波长处撞击从表面的每个部分反射的光的强度和/ 或波长取决于其上的薄层结构的光学厚度; 并且根据检测到的不同光入射角的光强度和/或波长确定表面上的薄层结构的光学厚度图像。 根据本发明，在第二检测器上检测在所述表面反射的光的一部分，以确定照射表面的偏振光的入射角或波长。 还公开了一种用于执行该方法的装置。