摘要:
A pair of electrodes are provided through a base. A cap and the base constitute a chamber, and are connected to each other by fitting projections provided on the base, into locking grooves formed in the cap. A fuse element is connected to upper portions of the electrodes, located in the chamber, by appropriate means such as soldering or welding. The base is in the form of a rectangle having long sides and short sides. A pair of semi-elliptic air pass holes are formed in substantially central portions of the base along the respective long sides, and opposed to each other.
摘要:
A positive-working photosensitive composition comprises: (1) an alkali-soluble resin; (2) a quinonediazide compound; (3) an organic phosphoric compound; and (4) at least one of a phenylenediamine compound and a derivative thereof, 2-amino-1-phenylethanol, N-phenyldiethanolamine, N-phenylethanolamine, N-ethyldiethanolamine, and N-ethylethanolamine. The resist composition exhibits so higher an adhesion to a substrate than ever as to provide an enhanced accuracy in processing during etching, enabling subsequent faithful transfer of a finer pattern to the substrate.
摘要:
The negative-working photosensitive composition of the invention, which is suitable as a photoresist material in the photolithographic processing of semiconductor devices, comprises (a) a condensation product of a hydroxy-substituted diphenylamine compound such as 4-hydroxy diphenylamine and a methylol melamine or alkoxylated methylol melamine by the reaction in a medium of phosphoric or sulfuric acid and (b) an azide compound capable of strongly absorbing UV or far UV light. The composition gives a photoresist layer having high resistance against heat in the post-baking and the attack of gas plasma encountered in the dry etching for semiconductor processing.
摘要:
A powered seat slide device comprises upper and lower guide rails slidably fitted to each other, and a rail drive mechanism with a reversible motor and a reduction gear box. The drive mechanism includes a screw-threaded shaft being rotatable about its axis through the motor and the gear box and installed on one of the upper and lower guide rails, and a nut member being installed on another rail and screwed into the screw-threaded shaft for a relative axial motion of said screw-threaded shaft with respect to said nut member. An elastic shock-absorbing damper assembly (including essentially annular elastomeric damper) is supported on the screw-threaded shaft in front and in rear of the nut member. The damper assembly includes at least a plastic washer interposed between the nut member and the damper. The plastic washer has a radially and inwardly tapered and circumferentially curved face to define a substantially frusto-conical hollow facing to the flat side wall of the damper, and thus provide an elastic-deformation permissible space of the damper.
摘要:
The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.
摘要:
A method for high fidelity patterning of a photoresist layer involving a dry-process development by exposure to a plasma gas. A photoresist layer which had been irradiated in a pattern with actinic rays is heated at a temperature in the range from 200.degree. to 500.degree. C. by applying heat to the surface of the substrate opposite to the surface bearing the photoresist layer, for example, by placing the substrate on a hot plate with the uncoated surface in contact with the hot plate. Subsequent exposure to plasma gas gives a patterned resist layer with a very high residual film thickness.
摘要:
An air-cooled engine is hung and fixed under a rear part of a backbone of a body frame. The engine is disposed so that the center axis of a cylinder in its cylinder block extends approximately horizontally and so that its cylinder head is directed toward the front. A fuel injection device is located between an intake valve and an intake port in the cylinder head. An injection nozzle of the fuel injection device and an intake valve opening are placed at a short distance. While the vehicle is idling or running at low speed, the vicinity of the tip of an injector of the fuel injection device is cooled by assist air supplied from a throttle body through a secondary passage, and when the vehicle runs normally or at high speed, the fuel injection device is cooled by the wind that hits the cylinder head.
摘要:
An air-cooled engine is hung and fixed under a rear part of a backbone of a body frame. The engine is disposed so that the center axis of a cylinder in its cylinder block extends approximately horizontally and so that its cylinder head is directed toward the front. A fuel injection device is located between an intake valve and an intake port in the cylinder head. An injection nozzle of the fuel injection device and an intake valve opening are placed at a short distance. While the vehicle is idling or running at low speed, the vicinity of the tip of an injector of the fuel injection device is cooled by assist air supplied from a throttle body through a secondary passage, and when the vehicle runs normally or at high speed, the fuel injection device is cooled by the wind that hits the cylinder head.
摘要:
A micropattern-forming, light sensitive resin composition is disclosed. The composition comprises (a) a novolak resin comprising a condensate between formaldehyde and a mixture of m-cresol and p-cresol with a m-cresol to p-cresol charging weight ratio of from 45/55 to 60/40, wherein the novolak resin has the following characteristics: (i) a dissolving rate of 20 to 800 .ANG./sec in an aqueous solution of tetramethylammonium hydroxide (TMAH) and an alkali activity of 0.131N, (ii) a weight average molecular weight of 1000 to 6000 calculated as polystyrene equivalent, and (iii) a non-exposed dissolving rate of equal to or more than 100 .ANG./sec in an aqueous solution of TMAH with an alkali activity of 0.262N; (b) a light-sensitive substance of 1,2-naphthoquinonediazide-4-sulfonyl ester, and (c) a solvent capable of dissolving the novolak resin and the light-sensitive substance; wherein the novolak resin, the light-sensitive substance, and the solvent are present in such amounts that a 1.0 micron thick resist formed of the material has an optical density at 382 nm of 0.1 to 0.4 .mu.m.sup.-1. Also described is a micropattern-forming process having the steps of: (1) spin coating a substrate with the light-sensitive resin composition; (2) drying the light-sensitive composition; (3) exposing the dried light-sensitive composition using deep UV having a wavelength not longer than about 320 nm; and (4) developing the exposed light-sensitive composition.
摘要:
The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.