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21 条记录 (耗时 0.011 秒)

    Mask repair system
    1.
    发明授权
    Mask repair system 失效
    面膜修复系统

    公开(公告)号：US4906326A

    公开(公告)日：1990-03-06

    申请号：US328459

    申请日：1989-03-24

    申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

    发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

    IPC分类号： G03F1/00

    CPC分类号： G03F1/74 ,  Y10S430/139

    摘要： A method and apparatus for inspecting and repairing a mask usable in the manufacture of semiconductor microcircuits, by using an electron beam is disclosed. The inspection and repair of a mask pattern are made in a single apparatus, by using a controlled current of an electron beam. For inspection, the surface of a mask having a mask pattern and a radiation-sensitive layer, covering it, is scanned with an electron beam and, by detecting secondary electrons or reflected electrons caused at that time, the state of the pattern is inspected. If any defect is detected, the portion of the radiation-sensitive layer on the detected defect is irradiated with an electron beam of greater magnitude than that for the inspection and, thereafter, the exposed portion of the radiation-sensitive layer is removed. Then, etching or plating is made to the thus uncovered portion, whereby repair of the mask pattern is made.

    Radiation-curable compositions for restorative and/or protective treatment of photographic elements
    2.
    发明授权
    Radiation-curable compositions for restorative and/or protective treatment of photographic elements 失效
    用于照相材料的修复和/或保护性处理的可辐射固化组合物

    公开(公告)号：US4426431A

    公开(公告)日：1984-01-17

    申请号：US421694

    申请日：1982-09-22

    申请人： Louis P. Harasta ,  Gerald M. Leszyk ,  Edward D. Morrison

    发明人： Louis P. Harasta ,  Gerald M. Leszyk ,  Edward D. Morrison

    IPC分类号： C09D4/06 ,  G03C11/08 ,  G03C1/78 ,  C08F2/46 ,  G03C1/68 ,  G03C1/76

    CPC分类号： G03C11/08 ,  C09D4/06 ,  Y10S430/139 ,  Y10S430/162 ,  Y10T428/31511 ,  Y10T428/31663

    摘要： Radiation-curable compositions useful for restorative and/or protective treatment of photographic elements are comprised of a polymerizable epoxy compound, a cationic initiator for initiating polymerization of the epoxy compound, a polymerizable acrylic compound, a haloalkylated aromatic ketone which serves as a free-radical initiator for initiating polymerization of the acrylic compound, and a polymerizable organofunctional silane. Photographic elements, such as still films, motion picture films, paper prints, microfiche, and the like, are provided with a protective overcoat layer which is permanently bonded to the element, and serves to protect it from abrasion and scratches, by coating the element with the radiation-curable composition and irradiating the coating to bond it to the element and cure it to form a transparent, flexible, scratch-resistant, cross-linked polymeric layer. The protective overcoat layer can be applied to the image-bearing side of the element or to the support side of the element or to both sides. The radiation-curable composition can also be used as a restorative composition in the treatment of photographic elements which have scratches, abrasion marks, and the like, which impair the appearance or projection capabilities of the element. In use as a restorative composition, the radiation-curable composition can be applied locally in the region of the defects only, to effectively eliminate them and restore the element to a substantially defect-free condition, or it can be applied over the entire surface of the element to both eliminate the defects and form a protective overcoat layer that is capable of providing protection against subsequent scratching or abrasion.

    摘要翻译： 可用于修复和/或保护性处理照相元件的可辐照固化组合物由可聚合环氧化合物，用于引发环氧化合物聚合的阳离子引发剂，可聚合丙烯酸化合物，用作自由基的卤代烷基化芳族酮组成 用于引发丙烯酸类化合物聚合的引发剂和可聚合的有机官能硅烷。 诸如静止胶片，电影胶片，纸张印刷，缩微胶片等的照相元件设置有永久地结合到元件上的保护外涂层，并且用于通过涂覆元件来保护其免受磨损和划伤 与辐射固化组合物并照射涂层以将其粘合到元件上并使其固化以形成透明，柔性，耐划伤的交联聚合物层。 保护性外涂层可以施加到元件的图像承载侧或元件的支撑侧或两侧。 可辐射固化组合物还可以用作修复组合物，用于处理有损伤元件的外观或投影能力的划痕，磨损痕迹等的照相元件。 在用作修复组合物时，可放射线固化的组合物可以仅在缺陷区域局部施用，以有效地消除它们并将元件恢复到基本上无缺陷的状态，或者可以将其施加在 该元件既消除缺陷并形成保护性外涂层，其能够提供防止随后的刮擦或磨损的保护。

    Photoprinting on metal and similar substrates
    6.
    发明授权
    Photoprinting on metal and similar substrates 失效
    金属和类似基材上的照片印刷

    公开(公告)号：US5494779A

    公开(公告)日：1996-02-27

    申请号：US341022

    申请日：1994-11-17

    申请人： Alberto Rizzo ,  Robin Narvaez

    发明人： Alberto Rizzo ,  Robin Narvaez

    IPC分类号： G03C1/77 ,  G03C1/93

    CPC分类号： G03C1/77 ,  G03C1/93 ,  Y10S430/136 ,  Y10S430/139

    摘要： The improvement in photoprinting on metallic surfaces which comprises masking the yellowish tint on the polyurethane coating on the metallic surface by including in the solution of the polyurethane coating being applied a Violet dye and a Dark Green dye.

    摘要翻译： 金属表面上的照相印刷的改进包括通过在聚氨酯涂层的溶液中涂覆紫色染料和深绿色染料来掩蔽金属表面上的聚氨酯涂层上的淡黄色。

    Hydrophilic colloid silver halide emulsion hardened with a bis(vinyl-sulfonylmethyl) ether and an acrylic compound
    8.
    发明授权
    Hydrophilic colloid silver halide emulsion hardened with a bis(vinyl-sulfonylmethyl) ether and an acrylic compound 失效
    用乙二胺（VINYL-SULFONYLMETHYL）醚和丙烯酸酯化合物硬化的水解胶体银卤化物乳液

    公开(公告)号：US3850639A

    公开(公告)日：1974-11-26

    申请号：US35797573

    申请日：1973-05-07

    申请人： EASTMAN KODAK CO

    发明人： DALLON D ,  DE SEYN M

    IPC分类号： C08L89/00 ,  G03C1/30

    CPC分类号： G03C1/30 ,  Y10S430/139

    摘要： Certain blends of A. ACRYLIC HARDENER, PLUS B. BIS(VINYLSULFONYLMETHYL)ETHER EXHIBIT SYNERGISM WITH RESPECT TO CONTROLLING THE ''''AFTERHARDENING'''' THAT IS USUALLY OBSERVED WHEN, FOR EXAMPLE, GELATIN-CONTAINING COMPOSITIONS ARE CHEMICALLY HARDENED. The hardened gelatin compositions are particularly useful as emulsion layers in photographic elements.

    摘要翻译： A.丙烯酸硬化剂，乙二胺四乙酸酯（VINYLSULFONYLMETHYL）的一些混合物，涉及到控制“后处理”，当使用含有凝胶组合物的化合物进行化学处理时，通常使用“后处理”。 硬化的明胶组合物特别可用作摄影元件中的乳剂层。

    Method and apparatus for redressing defective photomask
    10.
    发明授权
    Method and apparatus for redressing defective photomask 失效
    用于纠正有缺陷的光掩模的方法和装置

    公开(公告)号：US4463073A

    公开(公告)日：1984-07-31

    申请号：US394642

    申请日：1982-07-01

    申请人： Tateoki Miyauchi ,  Katsuro Mizukoshi ,  Mikio Hongo ,  Masao Mitani ,  Masaaki Okunaka ,  Takao Kawanabe ,  Isao Tanabe

    发明人： Tateoki Miyauchi ,  Katsuro Mizukoshi ,  Mikio Hongo ,  Masao Mitani ,  Masaaki Okunaka ,  Takao Kawanabe ,  Isao Tanabe

    IPC分类号： G03F1/00 ,  G03F1/72 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00

    CPC分类号： G03F1/72 ,  H01L21/30 ,  Y10S430/139 ,  Y10S430/146

    摘要： A method and apparatus for repairing defect portions of a photomask. A complex material from which a light shading material can be deposited is applied over the photomask. A white (blank) defect region is irradiated with a continuous wave laser light beam projected in a slit-like light image to thereby convert the complex material into the shading material. After washing, a half-deposited portion formed in a peripheral portion of the light shading region is further deposited by a post-baking process. Those portions of the light shading film which depart from the desired mask pattern are removed together with black (solid) defect portion originally present in the photomask through irradiation with a pulse laser light beam. The pulse laser is constituted by a Dye-laser, while the continuous wave laser is constituted by an Ar-laser. A specific half-mirror which transmits therethrough Ar-laser light while reflecting Dye-laser light is displaceable provided. The white and the black defects are selectively centered on a same optical axis of an optical projection system including a slit and a condenser lens, whereby the white and the black defect portions are each removed through irradiation with the associated laser light projected thereto in a slit-like light image through the same optical projection system.

    摘要翻译： 一种用于修复光掩模的缺陷部分的方法和装置。 将光阴影材料沉积的复合材料施加在光掩模上。 用投影在狭缝状光图像中的连续波激光束照射白色（空白）缺陷区域，从而将复合材料转换成遮光材料。 洗涤后，通过后烘烤处理进一步沉积形成在遮光区域的周边部分中的半沉积部分。 通过照射脉冲激光，与原来存在于光掩模中的黑色（实心）缺陷部分一起除去遮光膜的偏离所需掩模图案的那些部分。 脉冲激光由染料激光器构成，而连续波激光由Ar激光器构成。 通过反射染料激光而透过其的Ar激光的特定半反射镜是可置换的。 白色和黑色缺陷选择性地集中在包括狭缝和聚光透镜的光学投影系统的相同光轴上，由此白色和黑色缺陷部分通过照射投射到狭缝中的相关激光而被去除 类似的光图像通过相同的光学投影系统。