Low-temperature-curable coating composition

    公开(公告)号:US10400139B2

    公开(公告)日:2019-09-03

    申请号:US15757472

    申请日:2016-08-19

    Abstract: The present invention provides a coating composition which cures at low temperatures to form a cured film having high solvent resistance. The present invention provides a low-temperature-curable coating composition which comprises (A) a film-forming polymer having a hydrogen-donating functional group that has a heteroatom which bonds covalently to a hydrogen atom, (B) a film-forming polymer having a specific hydrogen-accepting functional group that has a heteroatom to which no hydrogen atom bonds covalently, and (C) a non-basic volatile solvent selected from the group consisting of a non-basic volatile solvent (C-1) having, in the molecule, both a heteroatom that bonds covalently to a hydrogen atom and a heteroatom that does not bond covalently to a hydrogen atom; a mixture of a non-basic volatile solvent (C-2) having, in the molecule, a heteroatom which bonds covalently to a hydrogen atom and a non-basic volatile solvent (C-3) having, in the molecule, a heteroatom to which no hydrogen atom bonds covalently; and combinations thereof.

    SURFACE TREATMENT METHOD, SURFACE TREATMENT LIQUID, AND SURFACE-TREATED ARTICLE

    公开(公告)号:US20190127540A1

    公开(公告)日:2019-05-02

    申请号:US16172952

    申请日:2018-10-29

    Abstract: To provide a surface treatment method capable of successfully making a treatment target including polyimide on a surface thereof hydrophilic or hydrophobic with a safe operation; a two-liquid type surface treatment liquid that can be suitably used for the surface treatment method; and a surface-treated polyimide product that can be obtained by the above-described surface treatment method. A first resin having a primary amino group and/or a hydroxyl group, and a secondary amino group is bonded to a surface of a treatment target including polyimide on a surface thereof, and then a second resin having a (meth)acryloyl group and/or a carbamoyl group, a hydrophilic group and/or a hydrophobic group is bonded to the first resin.

    UNDER LAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20180277359A1

    公开(公告)日:2018-09-27

    申请号:US15468109

    申请日:2017-03-24

    Abstract: Under layer composition and methods of manufacturing semiconductor devices are disclosed. The method of manufacturing semiconductor device includes the following steps. A layer of an under layer composition is formed, wherein the under layer composition includes a polymeric material and a cross-linker, and the cross-linker includes at least one decomposable functional group. A curing process is performed on the layer of the under layer composition to form an under layer, wherein the cross-linker is crosslinked with the polymeric material to form a crosslinked polymeric material having the at least one decomposable functional group. A patterned photoresist layer is formed over the under layer. An etching process is performed to transfer a pattern of the patterned photoresist layer to the under layer. The under layer is removed by decomposing the decomposable functional group.

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