摘要:
A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, optionally an organic acid, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethylanolamine, gallic acid ascorbic acid, and water with the alkalinity of the cleaning solution greater than 0.073 milliequivalents base per gram of solution.
摘要:
A cleaning composition for treating and removing stains from a non-porous surface has one or more salts, such as quaternary ammonium salts, sulfates and chlorides, a chelator and a dispersant, dissolved in an aqueous solution of alcohol. The preferred salts are myristyltrimethylammonium bromide and benzethonium chloride, the chelator is tetrasodium salt ethylenediamine of tetraacetic acid, and the dispersant is polyvinyl alcohol. The cleaning composition is incorporated into a product, which has a non-woven polyester carrier impregnated with the cleaning composition.
摘要:
A cleaning agent for use in the manufacture of a semiconductor device comprising an aqueous solution containing a quarternary ammonium salt and a fluoro compound, or an aqueous solution containing a quarternary ammonium salt and a fluoro compound, as well as an organic solvent selected from the group consisting of amides, lactones, nitriles, alcohols and esters. In the semiconductor device manufacturing process, after forming a mask with a photoresist, a wiring structure is formed by dry etching of a conductive layer, wherein a protecting deposition film has been formed on side walls of the conductive layer. Use of the cleaning agent enables the protecting deposition film to be removed in a highly reliable manner with the surface of the conductive layer being decontaminated and cleaned such that no corrosion of the conductive layer occurs.
摘要:
Substances for the preparation of textile softening compositions comprising salts of oligomeric amine esters obtained by the reaction of triethanolamine, fatty acids and dicarboxylic acids in defined ratios, optionally followed by quaternization. Textile softening compositions comprising these substances are also described.
摘要:
Rinsing dyed or white fabrics in a chelator-containing rinse bath restores color and brightness. Rinse added compositions comprising chelators such as diethylenetriaminepentaacetate or ethylenediamine disuccinate are used to restore the appearance of colored and white fabrics whose drab appearance has been caused by interactions with metal ions, especially copper and nickel. Compositions comprising the chelators in combination with fabric care auxiliaries such as fabric softeners, cellulase enzymes and chlorine scavengers are provided.
摘要:
A composition useful for moisturizing skin which comprises (a) a moisturizing effective amount of a compound of the structure: wherein X is selected from the group consisting of: CH2OH, CH OH CH2CO2—, or mixtures thereof wherein when X does not bear a negative charge, the said compound is a salt; and (b) a skin compatible carrier.
摘要:
The present invention provides a hair conditioning composition that comprises stearalkonium chloride and cetrimonium chloride. The hair conditioner composition of the invention preferably imparts a silky wet feel to hair and inhibits fly-away at 34% relative humidity when applied as a rinse off conditioner. In some embodiments, the hair conditioner of the invention is essentially free of an amidoamine; is characterized by a weight ratio of cetrimonium chloride to stearalkonium chloride of from about 0.65 to about 2; and/or the total combined amount of stearalkonium chloride and cetrimonium chloride is at most about 1% by weight of the composition. The present invention also provides a method of conditioning hair.
摘要:
An antimicrobial composition comprising an alcohol in an amount from about 60 to about 95 weight percent of the total composition, a preservative, a cationic cellulose polymer thickening agent, a moisturizer and/or, a cationic emulsifier, and water in an amount from about 6 to about 30 weight percent. The skin disinfecting formulation will not irritate, dry or crack the skin and will provide antimicrobial effectiveness to the skin.
摘要:
A composition comprising A) from about 0.1% by weight of a polymer, copolymer, or mixtures thereof, said polymer or copolymer comprising one or more monomers having a cationic group and which is capable of attenuating and/or abating the loss of fabric dye; and B) the balance carriers and adjunct ingredients.
摘要:
The softener composition of the present invention comprises a compound having one or more C8-36 hydrocarbon groups and two or more groups selected from an amino group and a quaternary ammonium group in the molecule (component (a)), an anionic surfactant having a C8-36 hydrocarbon group (component (b)) and a nonionic surfactant (component (c)), wherein the molar ratio of the component (a) to the component (b) is from 90/10 to 50/50. This softener composition can endow cotton and cotton clothes in particular with a preferred softness, elasticity (fluffy feeling) and feeling of dryness with small oiliness.