Cleaning composition
    2.
    发明授权
    Cleaning composition 有权
    清洁组合物

    公开(公告)号:US06720297B2

    公开(公告)日:2004-04-13

    申请号:US10351880

    申请日:2003-01-27

    申请人: Earl Jenevein

    发明人: Earl Jenevein

    IPC分类号: C11D162

    摘要: A cleaning composition for treating and removing stains from a non-porous surface has one or more salts, such as quaternary ammonium salts, sulfates and chlorides, a chelator and a dispersant, dissolved in an aqueous solution of alcohol. The preferred salts are myristyltrimethylammonium bromide and benzethonium chloride, the chelator is tetrasodium salt ethylenediamine of tetraacetic acid, and the dispersant is polyvinyl alcohol. The cleaning composition is incorporated into a product, which has a non-woven polyester carrier impregnated with the cleaning composition.

    摘要翻译: 用于从无孔表面处理和除去污渍的清洁组合物具有溶解在醇的水溶液中的一种或多种盐,例如季铵盐,硫酸盐和氯化物,螯合剂和分散剂。 优选的盐是肉豆蔻基三甲基溴化铵和苄索氯铵,螯合剂是四乙酸的四钠盐乙二胺,分散剂是聚乙烯醇。 将清洁组合物掺入到具有浸渍有清洁组合物的无纺聚酯载体的产品中。

    Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device
    3.
    发明授权
    Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device 失效
    半导体装置用清洗剂及半导体装置的制造方法

    公开(公告)号:US06462005B1

    公开(公告)日:2002-10-08

    申请号:US08369215

    申请日:1995-01-05

    IPC分类号: C11D162

    摘要: A cleaning agent for use in the manufacture of a semiconductor device comprising an aqueous solution containing a quarternary ammonium salt and a fluoro compound, or an aqueous solution containing a quarternary ammonium salt and a fluoro compound, as well as an organic solvent selected from the group consisting of amides, lactones, nitriles, alcohols and esters. In the semiconductor device manufacturing process, after forming a mask with a photoresist, a wiring structure is formed by dry etching of a conductive layer, wherein a protecting deposition film has been formed on side walls of the conductive layer. Use of the cleaning agent enables the protecting deposition film to be removed in a highly reliable manner with the surface of the conductive layer being decontaminated and cleaned such that no corrosion of the conductive layer occurs.

    摘要翻译: 一种用于制造半导体器件的清洁剂,其包含含有季铵盐和氟化合物的水溶液,或含有季铵盐和氟化合物的水溶液,以及选自下组的有机溶剂 由酰胺,内酯,腈,醇和酯组成。 在半导体器件制造方法中,在用光致抗蚀剂形成掩模之后,通过干蚀刻导电层形成布线结构,其中在导电层的侧壁上形成保护沉积膜。 使用清洁剂能够以高度可靠的方式去除保护性沉积膜,同时导电层的表面被净化和清洁,使得不会发生导电层的腐蚀。

    Chelating agents for improved color fidelity
    5.
    发明授权
    Chelating agents for improved color fidelity 失效
    螯合剂可提高色彩保真度

    公开(公告)号:US06296670B1

    公开(公告)日:2001-10-02

    申请号:US08882924

    申请日:1997-06-26

    IPC分类号: C11D162

    摘要: Rinsing dyed or white fabrics in a chelator-containing rinse bath restores color and brightness. Rinse added compositions comprising chelators such as diethylenetriaminepentaacetate or ethylenediamine disuccinate are used to restore the appearance of colored and white fabrics whose drab appearance has been caused by interactions with metal ions, especially copper and nickel. Compositions comprising the chelators in combination with fabric care auxiliaries such as fabric softeners, cellulase enzymes and chlorine scavengers are provided.

    摘要翻译: 在含螯合剂的冲洗浴中冲洗染色或白色织物恢复颜色和亮度。 使用包含螯合剂如二亚乙基三胺五乙酸酯或乙二胺二琥珀酸盐的漂洗添加组合物来恢复由金属离子,特别是铜和镍的相互作用引起的有色和白色织物的外观。 提供包含螯合剂与织物护理助剂如织物柔软剂,纤维素酶和氯清除剂组合的组合物。

    Hair conditioning composition
    7.
    发明授权
    Hair conditioning composition 有权
    头发调理组成

    公开(公告)号:US06730641B2

    公开(公告)日:2004-05-04

    申请号:US10106465

    申请日:2002-03-26

    IPC分类号: C11D162

    CPC分类号: A61Q5/12 A61K8/342 A61K8/416

    摘要: The present invention provides a hair conditioning composition that comprises stearalkonium chloride and cetrimonium chloride. The hair conditioner composition of the invention preferably imparts a silky wet feel to hair and inhibits fly-away at 34% relative humidity when applied as a rinse off conditioner. In some embodiments, the hair conditioner of the invention is essentially free of an amidoamine; is characterized by a weight ratio of cetrimonium chloride to stearalkonium chloride of from about 0.65 to about 2; and/or the total combined amount of stearalkonium chloride and cetrimonium chloride is at most about 1% by weight of the composition. The present invention also provides a method of conditioning hair.

    摘要翻译: 本发明提供一种头发调理组合物,其包含十八烷基氯化铵和氯化三西铵。 本发明的护发素组合物优选地赋予头发柔滑的湿感,并且当以冲洗掉的调理剂施用时,抑制在相对湿度为34%时飞散。 在一些实施方案中,本发明的护发素基本上不含酰胺胺; 其特征在于氯化三铵与十八烷基氯化铵的重量比为约0.65至约2; 和/或十八烷基氯化铵和氯化十六烷基铵的总合量为组合物重量的至多约1%。 本发明还提供一种调理头发的方法。

    Softener composition
    10.
    发明授权
    Softener composition 有权
    软化剂组成

    公开(公告)号:US06596685B2

    公开(公告)日:2003-07-22

    申请号:US09936929

    申请日:2001-09-19

    IPC分类号: C11D162

    摘要: The softener composition of the present invention comprises a compound having one or more C8-36 hydrocarbon groups and two or more groups selected from an amino group and a quaternary ammonium group in the molecule (component (a)), an anionic surfactant having a C8-36 hydrocarbon group (component (b)) and a nonionic surfactant (component (c)), wherein the molar ratio of the component (a) to the component (b) is from 90/10 to 50/50. This softener composition can endow cotton and cotton clothes in particular with a preferred softness, elasticity (fluffy feeling) and feeling of dryness with small oiliness.

    摘要翻译: 本发明的软化剂组合物包含在分子中具有一个或多个C 8〜36烃基和两个以上选自氨基和季铵基的基团的化合物(组分(a)),具有C8 -36烃基(组分(b))和非离子表面活性剂(组分(c)),其中组分(a)与组分(b)的摩尔比为90/10至50/50。 这种柔软剂组合物可以特别具有优良的柔软度,弹性(蓬松感)和干燥感,具有小油性的棉和棉衣服。