公开(公告)号：US06190833B1

公开(公告)日：2001-02-20

申请号：US09163008

申请日：1998-09-30

申请人： Atsushi Shiota ,  Masako Suzuki ,  Hozumi Sato

发明人： Atsushi Shiota ,  Masako Suzuki ,  Hozumi Sato

IPC分类号： G03F7029

CPC分类号： G03F7/0045 ,  G03F7/038 ,  H05K3/4661 ,  H05K3/4676

摘要： A radiation-sensitive resin composition comprising: (A) a phenol resin, (B) an amino resin, (C) a compound having two or more crosslinking groups in a molecule, and (D) a halomethyl-1,3,5-triazine compound. The composition can form insulating layers exhibiting high resolution, high plating solution resistance, high adhesion to conductor wiring, and developability using an alkaline aqueous solution, producing cured insulating layers with superior solvent resistance, excellent waterproofing characteristics, and high heat resistance. The composition is useful for fabricating multilayered wiring boards.

摘要翻译： 一种辐射敏感性树脂组合物，其包含：（A）酚醛树脂，（B）氨基树脂，（C）分子中具有两个以上交联基团的化合物，和（D）卤代甲基-1,3,5-三 三嗪化合物。 该组合物可以形成表现出高分辨率，高电镀溶液电阻，对导体布线的高粘附性和使用碱性水溶液的显影性的绝缘层，产生具有优异的耐溶剂性，优异的防水性能和高耐热性的固化绝缘层。 该组合物可用于制造多层布线板。

公开(公告)号：US06689537B2

公开(公告)日：2004-02-10

申请号：US09837655

申请日：2001-04-19

申请人： Toshiyuki Urano ,  Kazuhiro Kohori ,  Hideaki Okamoto

发明人： Toshiyuki Urano ,  Kazuhiro Kohori ,  Hideaki Okamoto

IPC分类号： G03F7029

CPC分类号： G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0388 ,  G03F7/2055 ,  Y10S430/146 ,  Y10S430/148

摘要： A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 &mgr;J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0

摘要翻译： 感光性平版印刷版包括在支撑体上依次形成的感光层和保护层，其中感光层在390〜430nm的波长范围内具有光谱灵敏度的最大峰值，光敏平版印刷的最小曝光 波长410nm（S410）的图像形成用印版最多为100μJ/ cm 2，波长450nm的图像形成的最小曝光（S450）与图像的最小曝光之间的关系 波长410nm（S410）的形成为0

公开(公告)号：US06331376B1

公开(公告)日：2001-12-18

申请号：US09582846

申请日：2000-07-05

申请人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

发明人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

IPC分类号： G03F7029

CPC分类号： G03F7/027 ,  C08F290/067 ,  C08G18/672 ,  C08G18/7642 ,  G03F7/0388 ,  C08G18/48 ,  C08G18/0823

摘要： An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other.

摘要翻译： 含有具有下式表示的重复单元的光聚合性聚氨酯化合物的有机溶剂型光固化抗蚀剂组合物：B- [X] n [Y] mB，其中X由下式表示：Y由下式表示： - OOCHN-A-NHCOO（R2） - ，A是衍生自多异氰酸酯化合物的结构单元，B相同或不同，并且衍生自在分子末端具有至少一个光聚合性不饱和基团的羟基化合物的结构单元，并且任选地含有 醚键，R1是衍生自含羧基的多元醇化合物的结构单元，R2是衍生自多元醇化合物的结构单元，n是1〜10的整数，m是1〜10的整数，条件是一个 X和一个Y彼此键合，或者X和/或Y中的三个或更多个彼此键合。

公开(公告)号：US06770422B2

公开(公告)日：2004-08-03

申请号：US09899123

申请日：2001-07-06

申请人： Ippei Nakamura ,  Tadahiro Sorori

发明人： Ippei Nakamura ,  Tadahiro Sorori

IPC分类号： G03F7029

CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/322 ,  Y10S430/145

摘要： A negative image-recording material which can be imagewise-exposed by IR radiation from IR lasers and enables direct image formation from digital data of a computer or the like. The material, when used in a lithographic printing plate, ensures good hardenability in an image area, exhibits good printing durability, even if not heated for image-formation, and ensures a large number of good prints from the printing plate. The material includes (A) an IR absorber having an oxidation potential of at most 0.35 V (vs. SCE), (B) a thermal radical generator and (C) a radical-polymerizing compound. The material is imagewise-exposed to IR radiation for image formation. Preferably, the IR absorber (A) has, in a chromophoric group, an electron-donating substituent having a Hammett's &sgr;para value of at most −0.10, and the thermal radical generator (B) is an onium salt.

摘要翻译： 可以通过来自IR激光器的IR辐射成像曝光的负图像记录材料，并且能够通过计算机等的数字数据进行直接图像形成。 该材料在平版印刷版中使用时，确保图像区域的良好的淬透性，即使不进行图像形成加热也能显示出良好的印刷耐久性，并且确保了印刷版的大量良好的印刷。 该材料包括（A）具有至多0.35V（相对于SCE）的氧化电位的IR吸收剂，（B）热自由基产生剂和（C）自由基聚合化合物。 该材料成像暴露于IR辐射用于图像形成。 优选地，IR吸收剂（A）在发色基团中具有至多为-0.10的哈米特sigmapara值的给电子取代基，并且热自由基产生剂（B）为鎓盐。

公开(公告)号：US06749995B2

公开(公告)日：2004-06-15

申请号：US10353420

申请日：2003-01-29

申请人： Toshiyuki Matsumura

发明人： Toshiyuki Matsumura

IPC分类号： G03F7029

CPC分类号： G03F7/029 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/126 ,  Y10S430/127

摘要： Disclosed is a light sensitive composition containing a compound represented by the following formula (1): wherein R1, R2 and R3 independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group, provided that R1 and R2 may combine with each other to form a ring or R2 and R3 may combine with each other to form a ring.

摘要翻译： 公开了含有下式（1）表示的化合物的光敏性组合物：其中R 1，R 2和R 3独立地表示氢原子，取代或未取代的烷基，取代或未取代的 烯基，取代或未取代的芳基或取代或未取代的杂环基，条件是R 1和R 2可以彼此结合形成环或R 2和R 3可以结合 彼此形成一个戒指。

公开(公告)号：US06413696B1

公开(公告)日：2002-07-02

申请号：US09602172

申请日：2000-06-22

申请人： Thomas H. Pang ,  Anastasios P. Melisaris ,  Wang Renyi ,  John W. Fong

发明人： Thomas H. Pang ,  Anastasios P. Melisaris ,  Wang Renyi ,  John W. Fong

IPC分类号： G03F7029

CPC分类号： G03F7/038 ,  B29C64/106 ,  B33Y10/00 ,  B33Y70/00 ,  G03F7/0037

摘要： The present invention relates to novel resin compositions containing at least one solid or liquid actinic radiation-curable and cationically polymerizable organic substance, an actinic radiation-sensitive initiator for cationic polymerization, an actinic radiation-curable and radical-polymerizable organic substance and an actinic radiation-sensitive initiator for radical polymerization. The actinic radiation-curable and cationically polymerizable organic substance is at least one glycidylether of a polyhydric aliphatic, alicyclic or aromatic alcohol having at least three epoxy groups with epoxy equivalent weight between 90 and 800 grams per equivalent, at least one solid or liquid alicyclic epoxide with an epoxy equivalent weight between 90 and 330 grams per equivalent having at least two epoxy groups and monomer purity greater than about 90% by weight, or at least a solid or liquid epoxycresol novolac or epoxyphenol novolac having epoxy equivalent weight between 130 and 350, or mixtures thereof. The use of the above-mentioned cationically polymerizable components substantially increases the heat deflection temperature of the cured articles while maintaining high photospeed, accuracy, wetting-recoatability, water resistance and good side wall finish. The present invention further relates to a method of producing a cured product, particularly a three-dimensional article, in which a compositions described above are treated with actinic radiation.

摘要翻译： 本发明涉及含有至少一种固体或液体光化学可辐射固化和可阳离子聚合的有机物质，用于阳离子聚合的光化辐射敏感引发剂，光化学辐射固化和可自由基聚合的有机物质和光化辐射的新型树脂组合物 自由基聚合的敏感引发剂。 光化性可辐射固化和可阳离子聚合的有机物质是具有至少三个环氧基团的多元脂族，脂环族或芳族醇的至少一种缩水甘油醚，环氧当量重量为90-800克/当量，至少一种固体或液体脂环族环氧化物 环氧当量重量在90至330克/当量之间，具有至少两个环氧基团和单体纯度大于约90重量％，或至少具有130至350之间环氧当量的固体或液体环氧甲酚酚醛清漆或环氧苯酚酚醛清漆， 或其混合物。 上述阳离子聚合性组分的使用大大增加了固化物的热变形温度，同时保持了高的感光速度，精度，润湿再涂性，耐水性和良好的侧壁光洁度。 本发明还涉及一种制备固化产物的方法，特别是其中用光化辐射处理上述组合物的三维制品。