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1.
公开(公告)号:US20240339964A1
公开(公告)日:2024-10-10
申请号:US18745582
申请日:2024-06-17
发明人: Matthew David ESCARRA , Luke ARTZT , Yaping JI , Daniel CODD , Matthew BARRIOS , Kazi M. ISLAM , David M. BAR-OR , Jacqueline C. FAILLA , Claire C. DAVIS , Maxwell W. WOODY
IPC分类号: H02S40/44 , F24S10/70 , F24S20/20 , F24S23/72 , F24S30/452 , F24S70/65 , H01L31/0304 , H01L31/0336 , H01L31/05 , H01L31/06
CPC分类号: H02S40/44 , F24S10/744 , F24S20/20 , F24S70/65 , F24S23/72 , F24S30/452 , H01L31/03046 , H01L31/0336 , H01L31/0512 , H01L31/06
摘要: A method for concentrated photovoltaic-thermal power generation includes converting a first portion of concentrated sunlight into electrical power when the first portion of concentrated sunlight illuminates an array of photovoltaic cells; and thermally coupling heat generated by the photovoltaic cells into a heat transfer plate. The method also includes cooling the heat transfer plate by flowing heat transfer fluid through an internal path of a cooling block in direct thermal contact with the heat transfer plate; and flowing the heat transfer fluid through a helical tube to absorb thermal energy from a second portion of concentrated sunlight illuminating the helical tube.
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2.
公开(公告)号:US20240290901A1
公开(公告)日:2024-08-29
申请号:US18174359
申请日:2023-02-24
发明人: Chung Yin Johnny HO , Weijun WANG , You MENG , Wei WANG
IPC分类号: H01L31/109 , H01L31/0336 , H01L31/0352 , H01L31/18
CPC分类号: H01L31/109 , H01L31/0336 , H01L31/035209 , H01L31/035227 , H01L31/1896
摘要: Continuous miniaturization of semiconductor devices is the key to boosting modern electronics development. However, such downscaling strategy has been rarely utilized in photoelectronics and photovoltaics. Here, in this work, a full-vdWs 1D p-Te/2D n-Bi2O2Se heterodiode with a rationally-designed nanoscale ultra-photosensitive channel is reported. Enabled by the dangling bond-free mixed-dimensional vdWs integration, the Te/Bi2O2Se type-II diodes show a high rectification ratio of 3.6×104. Operating with 100 mV reverse bias or in a self-power mode, the photodiodes demonstrated excellent photodetection performances, including high responsivities of 130 A W−1 (100 mV bias) and 768.8 mA W−1 (self-power mode), surpassing most of the reports of other heterostructures. More importantly, a superlinear photoelectric conversion phenomenon is uncovered in these nanoscale full-vdWs photodiodes, in which a model based on the in-gap trap-assisted recombination is proposed for this superlinearity. All these results provide valuable insights in light-matter interactions for further performance enhancement of photoelectronic devices.
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公开(公告)号:US20240213391A1
公开(公告)日:2024-06-27
申请号:US18146150
申请日:2022-12-23
发明人: Chung Yin Johnny HO , Wei WANG , Weijun WANG , You MENG
IPC分类号: H01L31/113 , H01L31/0304 , H01L31/032 , H01L31/0336 , H01L31/0352 , H01L31/18
CPC分类号: H01L31/1136 , H01L31/03046 , H01L31/032 , H01L31/0336 , H01L31/035218 , H01L31/035227 , H01L31/18
摘要: Mixed-dimensional heterostructure nano-devices with multi-functionality for use in semiconductors. Specifically, a gate-tunable and anti-ambipolar phototransistor is devised based on 1D p-type GaAsSb nanowire/2D n-type MoS2 nanoflake mixed-dimensional van der Waals (vdW) heterojunctions. Methods of making the mixed-dimensional heterostructure nano-devices with multi-functionality, gate-tunability and anti-ambipolar phototransistor.
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公开(公告)号:US11855118B2
公开(公告)日:2023-12-26
申请号:US18066744
申请日:2022-12-15
发明人: Chia-Yu Wei , Yen-Liang Lin , Kuo-Cheng Lee , Hsun-Ying Huang , Hsin-Chi Chen
IPC分类号: H01L27/146 , H01L31/103 , H01L31/0352 , H01L31/0336 , H01L31/028 , H01L31/0312 , H01L31/0304 , H01L31/0296
CPC分类号: H01L27/14649 , H01L27/1461 , H01L27/1463 , H01L27/1464 , H01L27/14645 , H01L27/14698 , H01L31/035272 , H01L31/103 , H01L27/14621 , H01L27/14627 , H01L27/14689 , H01L31/028 , H01L31/0296 , H01L31/0304 , H01L31/0312 , H01L31/0336
摘要: An image sensor device includes a semiconductor substrate, a radiation sensing member, a device layer, and a color filter layer. The semiconductor substrate has a photosensitive region and an isolation region surrounding the photosensitive region. The radiation sensing member is embedded in the photosensitive region of the semiconductor substrate. The radiation sensing member has a material different from a material of the semiconductor substrate, and an interface between the radiation sensing member and the isolation region of the semiconductor substrate includes a direct band gap material. The device layer is under the semiconductor substrate and the radiation sensing member. The color filter layer is over the radiation sensing member and the semiconductor substrate.
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5.
公开(公告)号:US20230215965A1
公开(公告)日:2023-07-06
申请号:US18181607
申请日:2023-03-10
发明人: Kazushige Yamamoto , Yukitami Mizuno , Yuya Honishi , Soichiro Shibasaki , Naoyuki Nakagawa , Yasutaka Nishida , Mutsuki Yamazaki
IPC分类号: H01L31/0687 , H01L31/0336
CPC分类号: H01L31/0687 , H01L31/0336
摘要: A solar cell according to an embodiment includes a p-electrode, a p-type light-absorbing layer containing a cuprous oxide or/and a complex oxide of cuprous oxides as a main component on the p-electrode, an n-type layer containing an oxide containing Ga on the p-type light-absorbing layer, and an n-electrode. A first region is included between the p-type light-absorbing layer and the n-type layer. The first region is a region from a depth of 2 nm from an interface between the p-type light-absorbing layer and the n-type layer toward the p-type light absorbing layer to a depth of 2 nm from the interface between the p-type light-absorbing layer and the n-type layer toward the n-type layer. Cu, Ga, M1, and O are contained in the first region. M1 is one or more elements selected from the group consisting of Sn, Sb, Ag, Li, Na, K, Cs, Rb, Al, In, Zn, Mg, Si, Ge, N, B, Ti, Hf, Zr, and Ca. A ratio of Cu, Ga, M1, and O is a1:b1:c1:d1. a1, b1, c1, and d1 satisfy 1.80≤a1≤2.20, 0.005≤b1≤0.05, 0≤c1≤0.20, and 0.60≤d1≤1.00.
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公开(公告)号:US11605745B2
公开(公告)日:2023-03-14
申请号:US17209147
申请日:2021-03-22
发明人: Gerhard Strobl
IPC分类号: H01L31/0304 , H01L31/0336 , H01L31/118
摘要: A stacked III-V semiconductor photonic device having a second metallic terminal contact layer at least formed in regions, a highly doped first semiconductor contact region of a first conductivity type, a very low doped absorption region of the first or second conductivity type having a layer thickness of 20 μm-2000 μm, a first metallic terminal contact layer, wherein the first semiconductor contact region extends into the absorption region in a trough shape, the second metallic terminal contact layer is integrally bonded to the first semiconductor contact region and the first metallic terminal contact layer is arranged below the absorption region. In addition, the stacked III-V semiconductor photonic device has a doped III-V semiconductor passivation layer of the first or second conductivity type, wherein the III-V semiconductor passivation layer is arranged at a first distance of at least 10 μm to the first semiconductor contact region.
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7.
公开(公告)号:US20230006087A1
公开(公告)日:2023-01-05
申请号:US17938990
申请日:2022-09-07
发明人: Soichiro Shibasaki , Yuya Honishi , Naoyuki Nakagawa , Mutsuki Yamazaki , Yukitami Mizuno , Yasutaka Nishida , Kazushige Yamamoto
IPC分类号: H01L31/072 , H01L31/0336 , H01L31/05
摘要: A solar cell of an embodiment includes a p-electrode, an n-electrode, a p-type light-absorbing layer located between the p-electrode and the n-electrode and mainly containing a cuprous oxide, and a first n-type layer which is located between the p-type light-absorbing layer and the n-electrode, which mainly contains a compound represented by Gax1M1x2M2x3M3x4M4x5Ox6, the M1 being Hf and/or Zr, the M2 being one or more selected from the group consisting of In, Ti, and Zn, the M3 being Al and/or B, the M4 is one or more selected from the group consisting of Sn, Si, and Ge, the x1, the x2, and the x6 being more than 0, the x3, the x4, and the x5 being 0 or more, and the x6 when a sum of the x1, the x2, the x3, the x4, and the x5 is 2 being 3.0 or more and 3.8 or less.
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公开(公告)号:US11538948B2
公开(公告)日:2022-12-27
申请号:US16857687
申请日:2020-04-24
IPC分类号: H01L31/0352 , H01L31/0224 , H01L31/108 , H01L31/0336 , H01L31/18 , H01L31/032 , H01L31/07 , H01L31/0304 , H01L31/0312 , H01L51/42
摘要: The present disclosure is directed to photovoltaic junctions and methods for producing the same. Embodiments of the disclosure may be incorporated in various devices for applications such as solar cells and light detectors and may demonstrate advantages compared to standard materials used for photovoltaic junctions such as silica. An example embodiment of the disclosure includes a photovoltaic junction, the junction including a light absorbing material, an electron acceptor for shuttling electrons, and a metallic contact. In general, embodiments of the disclosure as disclosed herein include photovoltaic junctions which provide absorption across one or more wavelengths in the range from about 200 nm to about 1000 nm, or from near IR (NIR) to ultra-violet (UV). Generally, these embodiments include a multi-layered light absorbing material that can be formed from quantum dots that are successively deposited on the surface of an electron acceptor (e.g., a semiconductor).
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公开(公告)号:US11532662B2
公开(公告)日:2022-12-20
申请号:US17183871
申请日:2021-02-24
发明人: Chia-Yu Wei , Yen-Liang Lin , Kuo-Cheng Lee , Hsun-Ying Huang , Hsin-Chi Chen
IPC分类号: H01L27/146 , H01L31/103 , H01L31/0352 , H01L31/0336 , H01L31/028 , H01L31/0312 , H01L31/0304 , H01L31/0296
摘要: A method includes providing a semiconductor substrate having a front side surface and a back side surface opposite to the front side surface. A photosensitive region of the semiconductor substrate is etched to form a recess. A semiconductor material is deposited on the semiconductor substrate to form a radiation sensing member filling the recess. The semiconductor material has an optical band gap energy smaller than 1.77 eV. A device layer is formed over the front side surface of the semiconductor substrate and the radiation sensing member. A trench isolation is formed in an isolation region of the semiconductor substrate and extending from the back side surface of the semiconductor substrate.
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公开(公告)号:US11380808B1
公开(公告)日:2022-07-05
申请号:US17035581
申请日:2020-09-28
申请人: Magnolia Solar, Inc.
IPC分类号: H01L31/0352 , H01L31/0749 , H01L31/032 , H01L31/0336 , H01L31/072 , H01L31/18
摘要: A photovoltaic (PV) device having a quantum dot sensitized interface includes a first conductor layer and a second conductor layer. At least one of the conductor layers is transparent to solar radiation. A quantum dot (nanoparticle) sensitized photo-harvesting interface comprises a photo-absorber layer, a quantum dot layer and a buffer layer, placed between the two conductors. The absorber layer is a p-type material and the buffer layer is an n-type material. The quantum dot layer has a tunable bandgap to cover infrared (IR), visible light and ultraviolet (UV) bands of solar spectrum.
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