公开(公告)号：WO2019020396A1

公开(公告)日：2019-01-31

申请号：PCT/EP2018/068980

申请日：2018-07-12

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： REN, Weiming ,  LIU, Xuedong ,  HU, Xuerang ,  LUO, Xinan ,  CHEN, Zhongwei

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/28 ,  H01J37/244

Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.

公开(公告)号：WO2022135920A1

公开(公告)日：2022-06-30

申请号：PCT/EP2021/084694

申请日：2021-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  KRUPIN, Oleg ,  REN, Weiming ,  HU, Xuerang ,  LIU, Xuedong

IPC: H01J37/244 ,  H01J37/28

Abstract: A method of detecting charged particles may include detecting beam intensity as a primary charged particle beam moves along a first direction; acquiring a secondary beam spot projection pattern as the primary charged particle beam moves along a second direction; and determining a parameter of a secondary beam spot based on the acquired secondary beam spot projection pattern. A method of compensating for beam spot changes on a detector may include acquiring a beam spot projection pattern on the detector, determining a change of the beam spot projection pattern, and adjusting a parameter of a detector cell of the detector based on the change. Another method may be provided for forming virtual apertures with respect to detector cells of a detector.

公开(公告)号：WO2022063540A1

公开(公告)日：2022-03-31

申请号：PCT/EP2021/074216

申请日：2021-09-02

Applicant: ASML NETHERLANDS B.V.

Inventor： KRUPIN, Oleg ,  REN, Weiming ,  HU, Xuerang ,  LIU, Xuedong

IPC: H01J37/147 ,  H01J37/21 ,  H01J37/244

Abstract: A method of operating a secondary imaging system of a charged particle beam apparatus may include using an anti-scanning mode. Excitation of a component of the secondary imaging system may be adjusted synchronously with a primary scanning deflection unit. Together with an anti- scanning deflection unit performing anti-scanning, a component of the secondary imaging system, such as a lens, may be adjusted in step. As scanning and anti-scanning is performed, excitation parameters of the component may also be constantly updated.

公开(公告)号：WO2022048898A1

公开(公告)日：2022-03-10

申请号：PCT/EP2021/072716

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： WALVOORT, Derk, Ferdinand ,  MUDRETSOV, Dmitry ,  HU, Xuerang ,  XI, Qingpo ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/28 ,  H01J37/317

Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.

公开(公告)号：WO2021249872A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/064949

申请日：2021-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： OTTEN, Christiaan ,  CRANS, Peter-Paul ,  SMITS, Marc ,  DEL TIN, Laura ,  TEUNISSEN, Christan ,  HUANG, Yang-Shan ,  STEENBRINK, Stijn, Wilem, Herman, Karel ,  HU, Xuerang ,  XI, Qingpo ,  LUO, Xinan ,  LIU, Xuedong

IPC: H01J37/02 ,  H01J37/18 ,  H01J2237/184 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/15 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

Abstract: 2019P00380WO 68 ABSTRACT Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the 5 support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus. [FIG. 7]

公开(公告)号：WO2021122863A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/086595

申请日：2020-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  GONG, Zizhou ,  HU, Xuerang ,  LIU, Xuedong ,  CHEN, Zhong-wei

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/153 ,  H01J37/244 ,  H01J37/29 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/049 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/1532 ,  H01J2237/20207 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/292 ,  H01J37/3177

Abstract: Systems and methods of forming images of a sample using a multi-beam apparatus are disclosed. The method may include generating a plurality of secondary electron beams from a plurality of probe spots on the sample upon interaction with a plurality of primary electron beams. The method may further include adjusting an orientation of the plurality of primary electron beams interacting with the sample, directing the plurality of secondary electron beams away from the plurality of primary electron beams, compensating astigmatism aberrations of the plurality of directed secondary electron beams, focusing the plurality of directed secondary electron beams onto a focus plane, detecting the plurality of focused secondary electron beams by a charged-particle detector, and positioning a detection plane of the charged-particle detector at or close to the focus plane.

公开(公告)号：WO2020030483A1

公开(公告)日：2020-02-13

申请号：PCT/EP2019/070566

申请日：2019-07-31

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  LIU, Xuedong ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/28 ,  H01J37/04 ,  H01J37/153 ,  H01J37/05

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：WO2019068666A1

公开(公告)日：2019-04-11

申请号：PCT/EP2018/076707

申请日：2018-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： HU, Xuerang ,  LIU, Xuedong ,  REN, Weiming ,  CHEN, Zhongwei

IPC: H01J37/28

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

公开(公告)号：WO2019063561A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/075996

申请日：2018-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xuedong ,  XI, Qingpo ,  JIANG, Youfei ,  REN, Weiming ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/02 ,  H01J37/04 ,  H01J37/28

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

公开(公告)号：WO2018197169A1

公开(公告)日：2018-11-01

申请号：PCT/EP2018/058631

申请日：2018-04-04

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： HU, Xuerang ,  REN, Weiming ,  LIU, Xuedong ,  CHEN, Zhongwei

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/12

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.