公开(公告)号：WO2020022893A1

公开(公告)日：2020-01-30

申请号：PCT/NL2019/050482

申请日：2019-07-24

Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO

Inventor： HERFST, Roelof Willem ,  BIJNAGTE, Anton Adriaan ,  BIEMOND, Jan Jacobus Benjamin ,  MATUROVÁ, Klára

IPC: G01Q40/02 ,  G01Q40/00

Abstract: The invention is directed at a method of performing scanning probe microscopy on a substrate surface using a scanning probe microscopy system. A probe tip and substrate surface are moved relative to each other in one or more directions parallel to the scanning plane to position the probe tip to a scanning position on the substrate surface with the probe tip; a displacement is measured by an encoder of said probe tip in said one or more directions; and a fiducial pattern is provided fixed relative to the substrate surface, said fiducial pattern having a scannable structure that is scannable by said probe tip and said structure forming a grid of fiducial marks in said one or more dimensions; said grid dimensioned to allow for measuring placement deviations of the probe tip relative to the probe head by identifying one or more fiducial marks in the fiducial pattern.

公开(公告)号：WO2019011702A1

公开(公告)日：2019-01-17

申请号：PCT/EP2018/067835

申请日：2018-07-02

Applicant: CARL ZEISS SMT GMBH

Inventor： KORNILOV, Kinga ,  BAUR, Christof ,  BAUER, Markus

IPC: G01Q40/00 ,  G01Q40/02

Abstract: Die vorliegende Erfindung bezieht sich ein Verfahren zum Untersuchen einer Messspitze (100, 110) eines Rastersondenmikroskops (520), wobei das Verfahren folgende Schritte aufweist: (a) Erzeugen zumindest einer Prüfstruktur (600, 650, 710, 730, 750, 770, 810, 850) vor oder nach einem Analysieren einer Probe (400, 510) durch die Messspitze (100, 110); und (b) Untersuchen der Messspitze (100, 110) mit Hilfe der zumindest einen erzeugten Prüfstruktur (600, 650, 710, 730, 750, 770, 810, 850).

公开(公告)号：WO2008073213A3

公开(公告)日：2008-10-23

申请号：PCT/US2007024148

申请日：2007-11-16

Applicant: MTS SYSTEM CORP ,  HAY JENNIFER ,  OLIVER WARREN

Inventor： HAY JENNIFER ,  OLIVER WARREN

IPC: G01B21/04 ,  G01B7/02 ,  G01B7/34 ,  G01D5/241 ,  G01L1/14 ,  G01L5/00 ,  G01N3/40 ,  G01Q40/00

CPC classification number: G01B21/045 ,  G01B3/008 ,  G01B7/34 ,  G01D5/2417 ,  G01D18/00 ,  G01L25/00 ,  G01Q40/00

Abstract: Concepts presented herein relate to a portable device (10) that includes a frame (20) and a fixture (22) for engaging a mechanical probe (12) to be calibrated. The fixture (22) can be a platform of hard material that receives pushing action of the mechanical probe (12). A displacement sensor (30) senses position of the platform (22) with respect to the frame (20). An actuator is coupled to the displacement sensor and a controller (32) is coupled to the actuator. The controller (32) operates the actuator to cause the platform (22) to move to a position (as indicated by the displacement sensor (30)), while the force required to cause the displacement is measured with a force sensor.

Abstract translation: 本文提出的概念涉及一种便携式装置（10），其包括框架（20）和用于接合待校准的机械探针（12）的固定装置（22）。 固定件（22）可以是接收机械探针（12）的推动作用的硬质材料的平台。 位移传感器（30）感测平台（22）相对于框架（20）的位置。 致动器联接到位移传感器，并且控制器（32）联接到致动器。 控制器（32）操作致动器以使平台（22）移动到位置（如位移传感器（30）所示），同时用力传感器测量引起位移所需的力。

公开(公告)号：WO2008079349A9

公开(公告)日：2008-10-16

申请号：PCT/US2007026193

申请日：2007-12-21

Applicant: VEECO METROLOGY INC ,  BAO TIANMING ,  LIU HAO-CHIH ,  GREGORY DAHLEN A ,  JAIN ROHIT

Inventor： BAO TIANMING ,  LIU HAO-CHIH ,  GREGORY DAHLEN A ,  JAIN ROHIT

IPC: G01B21/30 ,  G01Q30/06 ,  G01Q40/00 ,  H01J37/28

CPC classification number: G01Q40/00 ,  G01Q30/06 ,  Y10S977/878 ,  Y10S977/881

Abstract: A scanning probe microscope's probe tip dimensions as they exist or existed for a certain data or measurement are inferred based on probe activity taking place since a probe characterization procedure was performed. The inferred probe tip dimensions can be used to correct nanoscale measurements taken by the probe to account for changes in the probe's geometry such as wear.

Abstract translation: 扫描探针显微镜的探针尖端尺寸，因为它们存在或存在以用于某一数据或测量，所以基于探针活动发生，因为执行了探针表征过程。 推断的探针尖端尺寸可用于校正探针所采取的纳米尺度测量，以考虑探针几何形状（例如磨损）的变化。

公开(公告)号：WO2004099712A3

公开(公告)日：2005-05-12

申请号：PCT/US2004010687

申请日：2004-04-07

Applicant: UNIV MICHIGAN STATE ,  XI NING ,  FUNG WAI-KEUNG ,  YU MENGMENG ,  LI GUANGYONG

Inventor： XI NING ,  FUNG WAI-KEUNG ,  YU MENGMENG ,  LI GUANGYONG

IPC: G01Q30/04 ,  G01Q40/00 ,  G01Q60/24 ,  G01B7/34 ,  B82B3/00 ,  G12B21/00 ,  G12B21/02

CPC classification number: G01Q30/04 ,  Y10S977/85 ,  Y10S977/855

Abstract: An improved method is provided for performing nanomanipulations using an atomic force microscope. The method includes: performing a nanomanipulation operation on a sample surface using an atomic force microscope; determining force data for forces that are being applied to the tip of the cantilever during the nanomanipulation operation, where the force data is derived along at least two perpendicularly arranged axis; and updating a model which represents the topography of the sample surface using the force data.

Abstract translation: 提供了一种使用原子力显微镜进行纳米操作的改进方法。 该方法包括：使用原子力显微镜对样品表面进行纳米操作操作; 确定在纳米操纵操作期间施加到悬臂的尖端的力的力数据，其中力数据沿着至少两个垂直布置的轴被导出; 以及使用力数据更新表示样品表面的形貌的模型。

公开(公告)号：WO2004015455A3

公开(公告)日：2005-03-10

申请号：PCT/US0324086

申请日：2003-07-30

Applicant: CALIFORNIA INST OF TECHN ,  QUAKE STEPHEN R ,  LESSARD GUILLAUME ,  WADE LAWRENCE A ,  GERTON JORDAN M

Inventor： QUAKE STEPHEN R ,  LESSARD GUILLAUME ,  WADE LAWRENCE A ,  GERTON JORDAN M

IPC: G01B11/30 ,  G01Q30/02 ,  G01Q30/04 ,  G01Q30/18 ,  G01Q40/00 ,  G01Q60/06 ,  G01Q60/20 ,  G01Q70/12 ,  G02B21/00 ,  G02B21/16 ,  H01J3/14 ,  G01J3/04 ,  G01J3/44 ,  G01N21/00 ,  H01J5/16 ,  H01J40/14 ,  H01J65/06 ,  H01J65/08

CPC classification number: G01Q60/20 ,  G01Q30/025 ,  G01Q30/04 ,  G01Q30/18 ,  G01Q40/00 ,  G01Q60/06 ,  G01Q70/12 ,  G02B21/16 ,  Y10S977/862

Abstract: Methods and systems for operating an apertureless microscope for observing one or more features to a molecular sensitivity on objects are described. More particularly, the method includes moving a tip of a probe coupled to a cantilever in a vicinity of a feature of a sample, which emits one or more photons at a detected rate relative to a background rate of the sample based upon the presence of the tip of the probe in the vicinity of the feature. The method modifies the detected rate of the feature of the sample, whereupon the modifying of the detected rate causes the feature of the sample to enhance relative to background rate of the feature.

Abstract translation: 描述了用于操作无孔显微镜以观察一个或多个特征以使物体上的分子灵敏度的方法和系统。 更具体地，该方法包括将耦合到悬臂的探针的尖端移动到样本特征附近，基于样本的存在以相对于样本的背景速率以检测到的速率发射一个或多个光子 探头尖端附近的特征。 该方法修改检测到的样本特征的速率，于是修改检测到的速率导致样本的特征相对于特征的背景速率增强。

公开(公告)号：WO01011656A1

公开(公告)日：2001-02-15

申请号：PCT/US2000/022005

申请日：2000-08-11

IPC: G01B15/00 ,  G01Q30/02 ,  G01Q40/00 ,  H01J37/02 ,  H01J37/20 ,  H01J37/28 ,  H01L21/66

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J2237/2816 ,  H01J2237/30433

Abstract: A scanning electron microscope (SEM) is calibrated for the effects of local charging on a measured critical dimension (CD) of a wafer by first calibrating the microscope with respect to a calibration wafer with a known CD. Local charging on a wafer may be measured as a local landing energy (LLE) so that a scale factor based on a ratio of LLEs for the measurement wafer and a calibration wafer is used to correct a measured CD for the measurement wafer.

Abstract translation: 通过首先使用已知CD相对于校准晶片校准显微镜，对扫描电子显微镜（SEM）进行局部充电对晶片的测量临界尺寸（CD）的影响进行校准。 可以将晶片上的局部充电测量为局部着陆能量（LLE），使得基于用于测量晶片的LLE和校准晶片的比例的比例因子被用于校正测量晶片的测量CD。

公开(公告)号：WO00011702A1

公开(公告)日：2000-03-02

申请号：PCT/US1999/018186

申请日：1999-08-11

IPC: H01J37/22 ,  G01Q30/02 ,  G01Q40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26

CPC classification number: H01J37/252 ,  H01J37/05 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/24485 ,  H01J2237/24585 ,  H01J2237/2826

Abstract: Electron optical aberrations of an energy filtering system (120) of an energy filtering transmission electron microscope (100) (EFTEM) are automatically corrected under computer control to set up the EFTEM for use. Optics of the electron microscope preceding an energy filter are used to scan the beam at the entrance to the filter in a pattern corresponding to a defined geometry. The beam can either be finely focused to yield a spot at each position visited during the pattern scan, or the beam can be spread out and imprinted with a well-defined intensity distribution, such as normally occurs due to passage of the beam through a specimen, so that its relative scanned displacements can be assessed using cross-correlation techniques. In the case of the finely focused beam, electron images of the scanned pattern directly yield a spot pattern image. Deviations of the recorded spot pattern image from the defined scan geometry reflect the imaging aberrations introduced by the energy filter. In the case of the spread out beam, post-filter electron images of the scanned beam are cross-correlated with an image of the beam taken without scanning yielding cross-correlation peak images that give the effective displacement of each scanned beam position due to the aberrations/distortions of the filter. Summing the cross-correlation peak images again yields a spot pattern image that is equivalent to that obtained in the focused beam case. Deviations of the recorded spot pattern image from the defined scan geometry are analyzed to assess and subsequently correct aberrations introduced by the energy filter.

Abstract translation: 能量过滤透射电子显微镜（100）（EFTEM）的能量过滤系统（120）的电子光学像差在计算机控制下自动校正，以建立使用的EFTEM。 使用能量过滤器之前的电子显微镜的光学元件以对应于限定的几何形状的图案在过滤器入口处扫描光束。 光束可以精细聚焦，以在图案扫描期间访问的每个位置处产生斑点，或者光束可以被展开并且以明确的强度分布进行印刷，例如通常由于光束通过样本而发生 ，使得其相对扫描的位移可以使用互相关技术来评估。 在精细聚焦光束的情况下，扫描图案的电子图像直接产生点图案图像。 记录的斑点图像与定义的扫描几何的偏差反映了由能量过滤器引入的成像像差。 在扩展光束的情况下，扫描光束的后置滤光子电子图像与不扫描的光束的图像交叉相关，产生互相关峰值图像，由此产生每个扫描光束位置的有效位移 过滤器的像差/失真。 对互相关峰值图像进行求和再次产生等同于在聚焦光束情况下获得的斑点图像图像的斑点图像。 分析记录的斑点图像与定义的扫描几何形状的偏差，以评估和随后校正由能量过滤器引入的像差。

公开(公告)号：WO99023483A1

公开(公告)日：1999-05-14

申请号：PCT/US1998/023059

申请日：1998-10-30

IPC: G01B7/34 ,  G01N27/60 ,  G01Q40/00 ,  G01Q60/30 ,  G01Q60/40 ,  G01R29/12

CPC classification number: G01Q40/00 ,  G01Q60/30 ,  G01Q60/40 ,  Y10S977/852 ,  Y10S977/864

Abstract: An atomic force microscope using a cantilevered sensor (12) which is influenced by an electrostatic force given by the charge in the Unit Under Test (40). The cantilever sensor is preferably made of nickel foil. Both charge distribution and thickness of the sample are plotted in a 3D graph.

Abstract translation: 使用悬臂传感器（12）的原子力显微镜，其受被测单元（40）中的电荷给出的静电力的影响。 悬臂传感器优选由镍箔制成。 样品的电荷分布和厚度都绘制在3D图中。

公开(公告)号：WO2022231426A1

公开(公告)日：2022-11-03

申请号：PCT/NL2022/050228

申请日：2022-04-28

Applicant: NEARFIELD INSTRUMENTS B.V.

Inventor： PISKUNOV, Taras ,  SADEGHIAN MARNANI, Hamed ,  TABAK, Erik

IPC: G01Q30/02 ,  G01Q40/00 ,  G01Q40/02 ,  G02B21/00

Abstract: The present document relates to a method of calibrating, in a scanning probe microscopy system, an optical microscope. The optical microscope is configured for providing a reference data for positioning a probe tip on a surface of a substrate. The calibration is performed using a calibration structure being a spatial structure including features at different Z-levels relative to a Z-axis, the Z-axis being perpendicular to the surface of the substrate. The method comprises a step of obtaining, with the optical microscope, at least two images of at least a part of the calibration structure. The at least two images are focused in at least two different levels of the Z-levels. The method further comprises a step of determining a lateral shift, in a direction perpendicular to the Z-axis, of the calibration structure as depicted in the at least two images focused in the at least two different levels. The invention is further directed at a calibration structure, a substrate carrier and scanning probe microscopy device.