公开(公告)号：WO0161071B1

公开(公告)日：2002-11-14

申请号：PCT/EP0101698

申请日：2001-02-15

申请人： AIXTRON AG ,  JUERGENSEN HOLGER ,  KAEPPELER JOHANNES ,  STRAUCH GERT ,  SCHMITZ DIETMAR

发明人： JUERGENSEN HOLGER ,  KAEPPELER JOHANNES ,  STRAUCH GERT ,  SCHMITZ DIETMAR

IPC分类号： C23C14/24 ,  C23C14/22 ,  C23C16/44 ,  C23C16/448 ,  C23C16/455 ,  C23C16/46 ,  C23C16/52

CPC分类号： C23C16/45574 ,  C23C14/0015 ,  C23C14/12 ,  C23C14/22 ,  C23C14/228 ,  C23C16/006 ,  C23C16/4481 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/45572

摘要： A method and device for the production of coated substrates, such as OLEDs is disclosed, whereby at least one layer is deposited on the at least one substrate, by means of a condensation method and a solid and/or fluid precursor and, in particular, at least one sublimate source is used for at least one part of the reaction gases. The invention is characterised in that, by means of a temperature control of the reaction gases between precursor source(s) and substrate, a condensation of the reaction gases before the substrate(s) is avoided.

摘要翻译： 公开的是用于制造经涂覆的基材，例如，通过“的OLED”的方法和设备，其中一个层为基板，至少由冷凝过程的装置上施加的至少，并且其中含有固体和/或用于反应气体的一部分中的至少 液体前体，特别是至少一种升华源。 本发明的特征在于前体源和基体之间的反应气体的温度控制，由此避免了反应气体在基体前面的冷凝。

公开(公告)号：WO0155475A2

公开(公告)日：2001-08-02

申请号：PCT/RU0100027

申请日：2001-01-25

申请人： V I P VACUUM ION PLASMA TECHNO ,  DODONOV ALEXANDR IGOREVICH ,  DIAMANT VALERY ,  BASHKOV VALERY MIKHAILOVICH

发明人： DODONOV ALEXANDR IGOREVICH ,  DIAMANT VALERY ,  BASHKOV VALERY MIKHAILOVICH

IPC分类号： C23C14/02 ,  C23C14/32 ,  H01J37/317 ,  H01J37/34 ,  C23C14/22 ,  H01J37/32

CPC分类号： C23C14/32 ,  C23C14/022 ,  H01J37/3178 ,  H01J37/32412 ,  H01J37/34 ,  H01J2237/3142 ,  H01J2237/32

摘要： The present invention relates to a system (1) and method for deposition of coatings on a substrate (10). More particularly, the invention concerns a system and method for low-temperature deposition of corrosion-proof, wear-resistant ion-plasma coatings. A system for deposition of an ion plasma coating on a substrate, said system comprising: a housing (2) defining a vacuum chamber and having access means for the introduction and retrieval of a substrate (10) to be coated; a plasma vacuum deposition (PVD) source (8) communicating with the interior of said housing; an electrically conductive support (12) on which said substrate is placed; a gas ion-plasma source (14) cathode assembly communicating with said chamber in spaced-apart relationship to said support; a first power supply (20') electrically connected to said support; a second power supply (20'') electrically connected to said cathode assembly, and a third power supply (20''') of additional discharge electrically connectable to said cathode assembly, wherein said power supplies are operative to effect pulsed discharge on said gas ion-plasma source cathode assembly or pulsed accelerating voltage on said support.

摘要翻译： 本发明涉及一种用于在衬底（10）上沉积涂层的系统（1）和方法。 更具体地说，本发明涉及用于耐腐蚀，耐磨的离子等离子体涂层的低温沉积的系统和方法。 一种用于在衬底上沉积离子等离子体涂层的系统，所述系统包括：限定真空室的壳体（2），并具有用于引入和取出待涂覆的衬底（10）的入口装置; 与所述壳体的内部连通的等离子体真空沉积（PVD）源（8）; 导电支撑件（12），其上放置所述基板; 气体离子源（14）阴极组件，与所述腔室以间隔开的关系与所述支撑件连通; 电连接到所述支撑件的第一电源（20'）; 电连接到所述阴极组件的第二电源（20“）和与所述阴极组件电连接的另外的放电的第三电源（20”），其中所述电源用于在所述气体上实现脉冲放电 离子 - 等离子体源极阴极组件或所述支撑件上的脉冲加速电压。

公开(公告)号：WO0055388A3

公开(公告)日：2001-06-28

申请号：PCT/US0003028

申请日：2000-02-04

申请人： GEN ELECTRIC

发明人： IACOVANGELO CHARLES DOMINIC ,  BORST KEITH MILTON ,  JERABEK ELIHU CALVIN ,  MARZANO PATRICK PETER ,  YANG BARRY LEE-MEAN

IPC分类号： B60J1/00 ,  C23C14/08 ,  C23C14/32 ,  C23C16/513 ,  H01J37/32 ,  C23C16/50 ,  B05B7/22 ,  C23C14/22 ,  C23C14/24

CPC分类号： C23C14/228 ,  C23C14/32 ,  C23C16/513 ,  H01J37/32422

摘要： A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant (12); introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate (20). This method is used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate (20). An apparatus (4) for depositing a UV filter coating on a polymeric substrate comprises a plasma generator (10) having an anode (19) and a cathode (13) to form a plasma, and a first inlet (12) for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate (20) by the plasma (50). Optionally, an injection nozzle (18) can be utilized to provide a controlled delivery of the first reactant into the plasma (50).

摘要翻译： 一种用于在基底上沉积涂层的方法和装置。 涂布基材的方法包括蒸发第一反应物（12）; 将蒸发的反应物引入等离子体; 以及将所述第一反应物沉积在所述衬底（20）的表面上。 该方法用于在玻璃或聚碳酸酯基材（20）上高速沉积导电的紫外线过滤器涂层。 一种用于在聚合物基材上沉积UV过滤器涂层的装置（4）包括具有阳极（19）和阴极（13）以形成等离子体的等离子体发生器（10）和用于引入第一 反应物进入等离子体，第一反应物包含通过等离子体（50）沉积在衬底（20）上的蒸发材料。 任选地，喷嘴（18）可用于提供第一反应物到等离子体（50）的受控输送。

公开(公告)号：WO00071776A1

公开(公告)日：2000-11-30

申请号：PCT/US2000/014068

申请日：2000-05-22

IPC分类号： C23C14/22 ,  C23C14/28 ,  C23C14/58 ,  C30B23/02

CPC分类号： C23C14/223 ,  C23C14/28 ,  C23C14/5806 ,  C30B23/02 ,  C30B29/34

摘要： A method of forming an oriented film. A molecular sieve target is provided and material from the target is ablated by pulsed laser onto a substrate to form a film. The film is heated in a synthesis gel of the target material to orient the film.

摘要翻译： 一种形成取向膜的方法。 提供分子筛靶，并且通过脉冲激光将来自靶的材料烧蚀到基底上以形成膜。 将膜在目标材料的合成凝胶中加热以使膜定向。

公开(公告)号：WO00071775A1

公开(公告)日：2000-11-30

申请号：PCT/US2000/014067

申请日：2000-05-22

IPC分类号： C23C14/22 ,  C23C14/28 ,  C23C14/58

CPC分类号： C23C14/223 ,  C23C14/28 ,  C23C14/5806 ,  Y10T428/29 ,  Y10T428/2913 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/2993 ,  Y10T428/2995 ,  Y10T428/2996 ,  Y10T428/2998

摘要： A method of coating a three-dimensional substrate with a molecular sieve (zeolite, phosphate or mesoporous). A target is ablated by pulsed laser to create a plume. The substrate is manipulated, which may be by vibration, in the plume to coat the substrate with a film. The film is heated in a synthesis gel of the target to form the oriented film.

摘要翻译： 用分子筛（沸石，磷酸盐或介孔）涂覆三维底物的方法。 目标被脉冲激光烧蚀以产生羽流。 在羽状物中通过振动操纵基底，以便用薄膜涂覆基底。 将膜在靶的合成凝胶中加热以形成取向膜。

公开(公告)号：WO00068455A1

公开(公告)日：2000-11-16

申请号：PCT/IB2000/000635

申请日：2000-05-10

IPC分类号： C23C14/06 ,  C23C14/24 ,  C23C14/32 ,  C23C14/34 ,  C23C14/22

CPC分类号： C23C14/0605 ,  C23C14/06 ,  C23C14/325 ,  C23C14/3414 ,  Y10S427/103 ,  Y10S427/106 ,  Y10T428/263 ,  Y10T428/30

摘要： The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements. A composite coating comprises tetrahedral amorphous carbon and a metallic element other than carbon, the composite coating having an sp content of at least 60 %. A target for use in a cathode arc source comprises a mixture of carbon and a metallic element other than carbon.

摘要翻译： 本发明描述了复合涂层，特别是包括碳和另一种金属元素如硅或铝。 这些涂层与纯四面体无定形碳涂层相比具有改进的性能，因为它们具有降低的应力水平并且可以以更高的厚度沉积，同时保持可接受的硬度和其它有用的机械性能。 还描述了制备复合涂层的方法，用于制备涂层的材料和其上涂覆的基材。 具体地，使用阴极电弧源将涂层施加到基板的方法包括在阴极靶和源极的阳极之间产生电弧，并在基板上沉积正靶离子以形成涂层，其中涂层是复合材料 至少第一和第二元件，并且所述目标包括所述至少第一和第二元件。 复合涂层包含四面体无定形碳和除碳之外的金属元素，复合涂层的sp 3含量至少为60％。 用于阴极电弧源的靶包括碳和除碳之外的金属元素的混合物。

公开(公告)号：WO0013207A3

公开(公告)日：2000-06-02

申请号：PCT/KR9900500

申请日：1999-09-01

申请人： GENITECH CO LTD ,  KOH WON YONG ,  KANG SANG WON

发明人： KOH WON-YONG ,  KANG SANG-WON

IPC分类号： H01L21/28 ,  C23C16/18 ,  C23C16/44 ,  C23C16/455 ,  H01L21/02 ,  H01L21/285 ,  C23C14/22 ,  C23C16/00

CPC分类号： C23C16/45523 ,  C23C16/18 ,  C23C16/44 ,  H01L21/28556 ,  H01L28/60

摘要： A method for forming a metal film for use in semiconductor devices on a substrate. A catalyst metal layer for facilitating formation of a metal film is formed first on a substrate using thermal chemical vapor deposition. Then, at least one source of the metal film is prepared as a gas phase. The metal film is formed on the catalyst metal layer by applying the gas phase source to the catalyst metal layer. According to the present invention, a metal film of uniform thickness can be formed on an uneven substrate surface or on a hole with a high aspect ratio.

摘要翻译： 一种用于在基板上形成用于半导体器件的金属膜的方法。 首先使用热化学气相沉积在基板上形成促进金属膜形成的催化剂金属层。 然后，制备金属膜的至少一个源作为气相。 通过将气相源施加到催化剂金属层，在催化剂金属层上形成金属膜。 根据本发明，可以在不平坦的基板表面或具有高纵横比的孔上形成均匀厚度的金属膜。

公开(公告)号：WO99065626A1

公开(公告)日：1999-12-23

申请号：PCT/US1999/013450

申请日：1999-06-15

IPC分类号： C23C14/08 ,  C23C14/22 ,  B21D39/00 ,  B05D3/06

CPC分类号： C23C14/225 ,  C23C14/083 ,  C23C14/228

摘要： A method and an apparatus for producing a thermal barrier coating system for a substrate comprising a bond coat adhering to said substrate, a top layer adhering to said bond coat and said top layer having a microstructure comprises at least one zig-zag segment. The method comprises providing said substrate (10) in a deposition chamber (12); impinging an evaporant source (18) with an electron beam (13) generated from an electron beam gun (14) to form an evaporant; entraining said evaporant in a carrier gas (20) to form a flow of evaporant; and depositing said evaporant onto said substrate to form said top layer, wherein during the deposition said substrate is rotated by a device (22) so that varying the angle of the incidence of the flow on the substrate.

摘要翻译： 一种用于制造用于基材的热障涂层系统的方法和装置，包括粘附到所述基底上的粘合涂层，粘附到所述粘合涂层的顶层和具有微结构的所述顶层包括至少一个之字形段。 该方法包括在沉积室（12）中提供所述衬底（10）。 用电子束枪（14）产生的电子束（13）冲击蒸发源（18）以形成蒸发器; 将所述蒸发器夹带在载气（20）中以形成蒸发剂流; 以及将所述蒸发剂沉积到所述衬底上以形成所述顶层，其中在沉积期间，所述衬底由装置（22）旋转，从而改变衬底上的流入的角度。

公开(公告)号：WO99060598A1

公开(公告)日：1999-11-25

申请号：PCT/US1999/010623

申请日：1999-05-13

IPC分类号： C23C14/00 ,  C23C14/06 ,  C23C14/22 ,  H01J1/30 ,  H01J9/02 ,  C23C16/30

CPC分类号： C23C14/22 ,  C23C14/0021 ,  C23C14/06 ,  H01J1/30 ,  H01J9/022

摘要： Low work function, stable compound clusters are generated by co-evaporation of a solid semiconductor (i.e., Si) and alkali metal (i.e., Cs) elements in an oxygen environment. The compound clusters are easily patterned during deposition on substrate surfaces using a conventional photo-resist technique. The cluster size distribution is narrow, with a peak range of angstroms to nanometers depending on the oxygen pressure and the Si source temperature. Tests have shown that compound clusters when deposited on a carbon substrate contain the desired low work function property and are stable up to 600 DEG C. Using the patterned cluster containing plate as a cathode baseplate and a faceplate covered with phosphor as an anode, one can apply a positive bias to the faceplate to easily extract electrons and obtain illumination.

摘要翻译： 低功函数，稳定的化合物簇是通过在氧气环境中共同蒸发固体半导体（即Si）和碱金属（即Cs）元素而产生的。 使用常规的光刻胶技术，在沉积在基板表面上时，可以容易地将化合物簇图案化。 簇尺寸分布窄，峰值范围为纳米，取决于氧气压力和Si源温度。 试验表明，当沉积在碳基板上时，化合物簇含有所需的低功函数特性，在600℃以下是稳定的。使用图案化的聚集体板作为阴极底板和覆盖有磷光体作为阳极的面板， 对面板施加正偏压以容易地提取电子并获得照明。

公开(公告)号：WO99051473A1

公开(公告)日：1999-10-14

申请号：PCT/DE1999/000806

申请日：1999-03-22

IPC分类号： B60S1/38 ,  C23C14/22 ,  C23C16/50 ,  C23C16/30 ,  C23C16/04

CPC分类号： B60S1/38 ,  B60S2001/3829

摘要： The invention relates to a wiper blade rubber (10) consisting of elastomer, with a protective layer. According to the invention, the protective layer is applied in a vapourous state using plasma. The protective layer makes the elastomer more resistant to wear.

摘要翻译： 本发明涉及弹性体的刮水橡胶（10）具有保护层。 本发明提出，在蒸气状态中的保护层是等离子辅助的施加，使弹性体更耐磨。