公开(公告)号：WO2010008467A3

公开(公告)日：2010-03-18

申请号：PCT/US2009003739

申请日：2009-06-23

Applicant: AXCELIS TECH INC ,  GRANT JOHN ,  SPLINTER PATRICK

Inventor： GRANT JOHN ,  SPLINTER PATRICK

IPC: H01J37/09 ,  H01J37/317

CPC classification number: H01J37/04 ,  H01J37/05 ,  H01J37/244 ,  H01J2237/022 ,  H01J2237/0455 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

Abstract: An ion implantation system (100) comprising an ion source (116) configured to generate an ion beam (104) along a beam path (136), a mass analyzer (130) is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture (330) located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.

Abstract translation: 一种离子注入系统（100），其包括被配置为沿着光束路径（136）产生离子束（104）的离子源（116），质量分析器（130）位于所述离子源的下游，其中所述质量分析器被配置 对离子束进行质量分析和位于质量分析器下游并且沿着光束路径的光束互补孔径（330），所述光束互补孔具有对应于离子束的横截面束包络的尺寸和形状。

公开(公告)号：WO2008070003A3

公开(公告)日：2008-08-07

申请号：PCT/US2007024698

申请日：2007-11-30

Applicant: AXCELIS TECH INC ,  FERRARA JOSEPH ,  MITCHELL ROBERT

Inventor： FERRARA JOSEPH ,  MITCHELL ROBERT

IPC: H01L21/00 ,  H01L21/677

CPC classification number: H01L21/67213 ,  C23C14/48 ,  H01L21/67201 ,  H01L21/67265 ,  H01L21/67745

Abstract: An ion implantation apparatus, system, and method are provided for transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.

Abstract translation: 提供一种用于在真空和大气压之间传送多个工件的离子注入装置，系统和方法，其中对准机构可操作以对准多个工件以便大体上同时传送到双工件装载锁定室。 对准机构包括表征装置，电梯和用于支撑两个工件的两个垂直对齐的工件支撑件。 第一和第二大气机器人被配置为一般在负载锁定模块，对准机构和FOUP之间同时传送两个工件。 第三和第四真空机器人被配置为在加载锁模块和处理模块之间一次传送一个工件。

公开(公告)号：WO2008045458A2

公开(公告)日：2008-04-17

申请号：PCT/US2007021615

申请日：2007-10-10

Applicant: AXCELIS TECH INC ,  LEE W DAVIS ,  COLVIN NEIL

Inventor： LEE W DAVIS ,  COLVIN NEIL

IPC: H01J37/244 ,  G01T1/29 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/31703 ,  H01J2237/31705

Abstract: A Faraday cup structure for use with a processing tool. The cup structure has a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the ion beam current. The electrically conductive strike plate is fronted by a mask for dividing an ion beam intercepting cross section into regions or segments. The mask including walls extending to the strike plate for impeding ions reaching the sensor and particles dislodged from the sensor from entering into the evacuated region of the processing tool.

Abstract translation: 法拉第杯结构，用于加工工具。 杯结构具有连接到电路的导电冲击板，用于监测撞击撞击板的离子以获得离子束电流的指示。 导电冲击板由用于将离子束截断截面分成区域或区段的掩模前面。 掩模包括延伸到冲击板的壁，用于阻止到达传感器的离子和从传感器移出的颗粒进入加工工具的抽空区域。

公开(公告)号：WO2007136722A2

公开(公告)日：2007-11-29

申请号：PCT/US2007011863

申请日：2007-05-17

Applicant: AXCELIS TECH INC ,  VANDERBERG BO ,  BENVENISTE VICTOR ,  FALLON JOHN ,  POKIDOV ILYA

Inventor： VANDERBERG BO ,  BENVENISTE VICTOR ,  FALLON JOHN ,  POKIDOV ILYA

CPC classification number: H01J27/08 ,  H01J37/08 ,  H01J37/304 ,  H01J37/32467 ,  H01J2237/002 ,  H01J2237/082 ,  H01J2237/31701

Abstract: An exemplary ion source for creating a stream of ions has an aluminum alloy arc chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. A temperature sensor monitors temperatures within the arc chamber and provides a signal related to sensed temperature. A controller monitors sensed temperature as measured by the sensor and adjusts the temperature to maintain the sensed temperature within a range.

Abstract translation: 用于产生离子流的示例性离子源具有至少部分地限定电弧室的电离区域的铝合金电弧室体。 电弧室主体与热丝电弧室壳体一起使用，其直接或间接地将阴极加热至足够的温度，以使电子流过电弧室的电离区域。 温度传感器监测电弧室内的温度，并提供与感测温度相关的信号。 控制器监测由传感器测量的感测温度，并调节温度以将感测到的温度保持在一定范围内。

公开(公告)号：WO2007120623A3

公开(公告)日：2007-11-29

申请号：PCT/US2007008784

申请日：2007-04-10

Applicant: AXCELIS TECH INC ,  BENVENISTE VISTOR ,  EISNER EDWARD ,  VANDERBERG BO

Inventor： BENVENISTE VISTOR ,  EISNER EDWARD ,  VANDERBERG BO

IPC: H01J37/304 ,  G21K5/10 ,  H01J37/317

CPC classification number: H01J37/3171 ,  G21K5/04 ,  H01J37/304 ,  H01J2237/24507 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/31703

Abstract: One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam profiles are measured as the ion beam is scanned. A corrected scan rate is calculated based on the plurality of measured dynamic beam profiles of the scanned beam. The ion beam is scanned at the corrected scan rate to produce a corrected ribbon ion beam. Other methods and systems are also disclosed.

Abstract translation: 本发明的一个实施例涉及一种用于调整扫描离子束的带状光束通量的方法。 在该方法中，以扫描速率扫描离子束，并且当扫描离子束时测量多个动态光束分布。 基于扫描光束的多个测量的动态光束分布来计算校正的扫描速率。 以校正的扫描速率扫描离子束以产生校正的带状离子束。 还公开了其它方法和系统。

公开(公告)号：WO2006133040A3

公开(公告)日：2007-04-12

申请号：PCT/US2006021646

申请日：2006-06-02

Applicant: AXCELIS TECH INC ,  VANDERPOT JOHN ,  HUANG YONGZHANG

Inventor： VANDERPOT JOHN ,  HUANG YONGZHANG

IPC: H01J37/317 ,  H01J37/244

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/09 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H01J2237/30433 ,  H01J2237/31705

Abstract: A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source (112) , end station (117) , and mass analyzer (106) positioned between the ion source and the end station are provided, wherein an ion beam (110) is formed from the ion source and travels through the mass analyzer to the end station. An ion beam dump assembly comprising a particle collector, particle attractor, and shield are associated with the mass analyzer, wherein an electrical potential of the particle attractor is operable to attract and constrain contamination particles within the particle collector, and wherein the shield is operable to shield the electrical potential of the particle attractor from an electrical potential of an ion beam within the mass analyzer.

Abstract translation: 提供了一种用于减少离子注入期间污染的系统，方法和装置。 提供了一种位于离子源和终端之间的离子源（112），端站（117）和质量分析器（106），其中离子束（110）由离子源形成并且通​​过质量分析器 到终点站。 包括粒子收集器，颗粒吸引子和屏蔽的离子束转储组件与质量分析器相关联，其中，所述粒子吸引子的电位可操作以吸引和约束所述颗粒收集器内的污染颗粒，并且其中所述屏蔽件可操作为 屏蔽质子分析仪内离子束电位的吸引子的电位。

公开(公告)号：WO2006055346A3

公开(公告)日：2007-03-22

申请号：PCT/US2005040463

申请日：2005-11-08

Applicant: AXCELIS TECH INC ,  WALDFRIED CARLO ,  ESCORCIA ORLANDO ,  BERRY IVAN

Inventor： WALDFRIED CARLO ,  ESCORCIA ORLANDO ,  BERRY IVAN

IPC: H01L21/316 ,  H01L21/3105

CPC classification number: H01L21/76825 ,  C23C16/56 ,  H01L21/02107 ,  H01L21/02203 ,  H01L21/02337 ,  H01L21/02348 ,  H01L21/31051 ,  H01L21/31058 ,  H01L21/31695 ,  H01L21/76826

Abstract: Processes for sealing porous low k dielectric film generally comprises exposing the porous surface of the porous low k dielectric film to ultraviolet (UV) radiation at intensities, times, wavelengths and in an atmosphere effective to seal the porous dielectric surface by means of carbonization, oxidation, and/or film densification. The surface of the surface of the porous low k material is sealed to a depth less than or equal to about 20 nanometers, wherein the surface is substantially free of pores after the UV exposure.

Abstract translation: 用于密封多孔低k电介质膜的方法通常包括将多孔低k电介质膜的多孔表面暴露于强度，时间，波长和大气中的紫外（UV）辐射，其有效地通过碳化，氧化来密封多孔电介质表面 ，和/或膜致密化。 多孔低k材料的表面的表面被密封到小于或等于约20纳米的深度，其中在UV暴露后该表面基本上没有孔。

公开(公告)号：WO2006031559A3

公开(公告)日：2006-07-06

申请号：PCT/US2005031832

申请日：2005-09-08

Applicant: AXCELIS TECH INC ,  AGARWAL ADITYA ,  RATHMELL ROBERT ,  HOGLUND DAVID

Inventor： AGARWAL ADITYA ,  RATHMELL ROBERT ,  HOGLUND DAVID

IPC: H01J37/317 ,  H01J37/304

CPC classification number: H01J37/304 ,  H01J37/3171 ,  H01J2237/30472

Abstract: An ion implanter(10) for creating a ribbon or ribbon-like beam by having a scanning device (30) that produces a side to side scanning of ions emitting by a source to provide a thin beam of ions moving into an implantation chamber(50). A workpiece support positions a workpiece within the implantation chamber and a drive (53) moves the workpiece support up and down through the thin ribbon beam of ions perpendicular to the plane of the ribbon to achieve controlled beam processing of the workpiece. A control includes a first control output coupled to said scanning device to limit an extent of side to side scanning of the ion beam to less than a maximum amount and thereby limit ion processing of the workpiece to a specified region of the workpiece and a second control output coupled to the drive simultaneously limits an extent of up and down movement of the workpiece to less than a maximum amount and to cause the ion beam to impact a controlled portion of the workpiece.

Abstract translation: 一种用于通过具有扫描装置（30）来产生色带或带状光束的离子注入机（10），所述扫描装置（30）产生由源发射的离子的侧面扫描以提供移动到注入室中的薄离子束（50 ）。 工件支撑件将工件定位在注入室内，并且驱动器（53）使工件支撑件上下移动穿过垂直于带平面的薄带离子束，以实现对工件的受控束加工。 控制器包括耦合到所述扫描装置的第一控制输出，以将离子束的侧向扫描的范围限制为小于最大量，从而限制工件到工件的指定区域的离子处理和第二控制 耦合到驱动器的输出同时将工件的上下移动范围限制为小于最大量并且使离子束冲击工件的受控部分。

公开(公告)号：WO2006033834A3

公开(公告)日：2006-05-11

申请号：PCT/US2005031855

申请日：2005-09-08

Applicant: AXCELIS TECH INC ,  GRAF MICHAEL ,  RAY ANDREW

Inventor： GRAF MICHAEL ,  RAY ANDREW

IPC: H01J37/317 ,  H01J37/302

CPC classification number: H01J37/3171 ,  H01J37/302 ,  H01J2237/20228 ,  H01J2237/30488

Abstract: The present invention is directed to implanting ions in a workpiece in a serial implantation process in a manner that produces a scan pattern that resembles the size, shape and/or other dimensional aspects of the workpiece. This improves efficiency and yield as an ion beam that the workpiece is oscillated through does not significantly "overshoot" the workpiece. The scan pattern may be slightly larger than the workpiece, however, so that inertial effects associated with changes in direction, velocity and/or acceleration of the workpiece as the workpiece reverses direction in oscillating back and forth are accounted for within a small amount of "overshoot". This facilitates moving the workpiece through the ion beam at a relatively constant velocity which in turn facilitates substantially more uniform ion implantation.

Abstract translation: 本发明涉及以串联注入工艺将离子注入到工件中，以产生类似于工件的尺寸，形状和/或其他尺寸方面的扫描图案。 这提高了工件振荡通过的离子束的效率和产量，并不会显着“过冲”工件。 然而，扫描图案可能稍微大于工件，使得随着工件反向前后摆动的方向，工件的方向，速度和/或加速度的变化所引起的惯性效应在少量的“ 超调”。 这有助于以相对恒定的速度移动工件穿过离子束，这又促进了基本上更均匀的离子注入。

公开(公告)号：WO2005097640A3

公开(公告)日：2005-12-08

申请号：PCT/US2005011581

申请日：2005-04-05

Applicant: AXCELIS TECH INC ,  VANDERPOT JOHN ,  POLLACK JOHN ,  BERRIAN DONALD

Inventor： VANDERPOT JOHN

IPC: A61N5/00 ,  B65H1/00 ,  H01J37/317 ,  H01L21/00 ,  H01L21/687

CPC classification number: H01J37/20 ,  H01J37/3171 ,  H01J2237/0216 ,  H01J2237/20228 ,  H01J2237/20292 ,  H01J2237/31703 ,  H01L21/67069 ,  H01L21/67259 ,  H01L21/68764 ,  H01L21/68792

Abstract: A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operable coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied between the rotor and stator rotates the rotor about the first axis and translates the workpiece through the ion beam along a first scan path. A position of the workpiece is sensed and the electromagnetic force between the rotor and stator is controlled in order to reverse the direction of motion of the workpiece along the first scan path, and wherein the control is based, at least in part, on the sensed position of the workpiece. The stator further rotates about the first axis in reaction to the rotation of the rotor, particularly in the reversal of direction of motion of the workpiece, thus acting as a reaction mass to the rotation of one or more of the rotor, scan arm, and workpiece.

Abstract translation: 提供了一种用于通过离子束在扫描臂上往复运输工件的方法，其中扫描臂可操作地联接到包括转子和定子的电动机，所述电动机可以围绕第一轴线单独地旋转。 施加在转子和定子之间的电磁力围绕第一轴线旋转转子，并使工件沿第一扫描路径平移离子束。 感测工件的位置，并且控制转子和定子之间的电磁力以便沿着第一扫描路径反转工件的运动方向，并且其中控制至少部分地基于感测到的 工件位置。 定子进一步围绕第一轴线转动，以反应转子的旋转，特别是在反转工件的运动方向上，从而作为与转子，扫描臂和转子中的一个或多个的旋转反应的质量 工件。