Abstract:
A structure and method of fabrication thereof relate to a Deeply Depleted Channel (DDC) design, allowing CMOS based devices to have a reduced σV T compared to conventional bulk CMOS and can allow the threshold voltage V T of FETs having dopants in the channel region to be set much more precisely. A novel dopant profile indicative of a distinctive notch enables tuning of the V T setting within a precise range. This V T set range may be extended by appropriate selection of metals so that a very wide range of V T settings is accommodated on the die. The DDC design also can have a strong body effect compared to conventional bulk CMOS transistors, which can allow for significant dynamic control of power consumption in DDC transistors. The result is the ability to independently control VT (with a low oV T ) and VDD, so that the body bias can be tuned separately from V T for a given device.
Abstract:
A covered chip (10 )having an optical element (14) integrated in the cover (12) is provided which includes a chip (11) having a front surface (18), an optically active circuit area (16), and bond pads (20) disposed at the front surface. The chip is covered by an at least partially optically translucent or transparent unitary cover (12) that is mounted to the front surface of the chip, and has at least one optical element (14) integrated in the unitary cover. The cover (12) is aligned with the optically active circuit area (16) and vertically spaced from the optically active circuit area.
Abstract:
A covered chip (10 ) having an optical element (14) integrated in the cover (12) is provided which includes a chip (11) having a front surface (18), an optically active circuit area (16), and bond pads (20) disposed at the front surface. The chip is covered by an at least partially optically translucent or transparent unitary cover (12) that is mounted to the front surface of the chip, and has at least one optical element (14) integrated in the unitary cover. The cover (12) is aligned with the optically active circuit area (16) and vertically spaced from the optically active circuit area.