公开(公告)号：WO2013048434A1

公开(公告)日：2013-04-04

申请号：PCT/US2011/054176

申请日：2011-09-30

Applicant: INTEL CORPORATION ,  BAILEY, Abdul, M. ,  SMITH, Ned, M. ,  GUPTA, Atul

Inventor： BAILEY, Abdul, M. ,  SMITH, Ned, M. ,  GUPTA, Atul

IPC: H04L9/32

CPC classification number: H04L63/08 ,  H04L9/3215 ,  H04L63/18 ,  H04W12/06

Abstract: In an embodiment a single user authentication event, performed between a trusted path hardware module and a service provider via an out of band communication, can enable a user to transparently access multiple service providers using strong credentials that are specific to each service provider. The authentication event may be based on multifactor authentication that is indicative of a user's actual physical presence. Thus, for example, a user would not need to enter a different retinal scan to gain access to each of the service providers. Other embodiments are described herein.

Abstract translation: 在一个实施例中，通过带外通信在可信路径硬件模块和服务提供商之间执行的单个用户认证事件可以使得用户能够使用对每个服务提供商特定的强凭证来透明地访问多个服务提供商。 认证事件可以基于指示用户的实际物理存在的多因素认证。 因此，例如，用户不需要输入不同的视网膜扫描以获得对每个服务提供商的访问。 本文描述了其它实施例。

公开(公告)号：WO2012044533A1

公开(公告)日：2012-04-05

申请号：PCT/US2011/052970

申请日：2011-09-23

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  BATEMAN, Nicholas, P., T. ,  DANIELS, Kevin, M. ,  GUPTA, Atul ,  LOW, Russell, J. ,  RIORDON, Benjamin, D. ,  MITCHELL, Robert, J. ,  ANELLA, Steven, M.

Inventor： BATEMAN, Nicholas, P., T. ,  DANIELS, Kevin, M. ,  GUPTA, Atul ,  LOW, Russell, J. ,  RIORDON, Benjamin, D. ,  MITCHELL, Robert, J. ,  ANELLA, Steven, M.

IPC: H01L21/677 ,  H01J37/317 ,  H01L21/687

CPC classification number: H01L21/677 ,  H01J37/3171 ,  H01J2237/31711 ,  H01L21/68735 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns cart be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier, in addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier, in some embodiments, gravity is used to held the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.

Abstract translation: 公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。 此外，公开了改进的基板载体。 通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。 在一些实施例中，可以使用载体创建各种图案，使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤，此外，由于基板与载体的对准是关键的，因此 载体可以包含对准特征以确保基底适当地定位在载体上，在一些实施例中，重力用于将基底保持在载体上，因此离子被引导以使得离子束向下朝向底侧 的承运人。

公开(公告)号：WO2012006354A1

公开(公告)日：2012-01-12

申请号：PCT/US2011/043077

申请日：2011-07-06

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  GUPTA, Atul

Inventor： GUPTA, Atul

IPC: H01L31/0224 ,  H01L31/0236 ,  H01L31/0352 ,  H01L31/18

CPC classification number: H01L31/022425 ,  H01L31/02363 ,  H01L31/035281 ,  H01L31/068 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: A first facet of each of a plurality of pyramids on a surface of a workpiece is doped to a first dose while a second facet and a third facet of each of the plurality of pyramids is simultaneously doped to a second dose different than the first dose. The first facets may enable low resistance contacts and the second and third facets may enable higher current generation and an improved blue response. Ion implantation may be used to perform the doping.

Abstract translation: 将工件表面上的多个金字塔中的每一个的第一小面掺杂到第一剂量，同时将多个金字塔中的每一个的第二面和第三面同时掺杂到与第一剂量不同的第二剂量。 第一面可以实现低电阻触点，并且第二和第三面可以实现更高的电流产生和改善的蓝色响应。 离子注入可用于进行掺杂。

公开(公告)号：WO2010088503A2

公开(公告)日：2010-08-05

申请号：PCT/US2010/022564

申请日：2010-01-29

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES ,  LOW, Russell, J. ,  WEAVER, William, T. ,  BATEMAN, Nicholas, P.T. ,  GUPTA, Atul

Inventor： LOW, Russell, J. ,  WEAVER, William, T. ,  BATEMAN, Nicholas, P.T. ,  GUPTA, Atul

IPC: H01L21/265 ,  H01L21/266

CPC classification number: H01L21/266 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0458 ,  H01J2237/31711 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: An improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate. The method may comprise ion implanting a substrate disposed downstream of the ion source with ions generated in an ion source; and disposing a first portion of a mask in front of the substrate to expose the first portion of the mask to the ions, the mask being supported by the first and second mask holders, the mask further comprising a second portion wound in the first mask holder.

Abstract translation: 公开了一种用于处理衬底的改进技术。 在一个特定的示例性实施例中，该技术可以被实现为用于处理衬底的方法。 该方法可以包括利用离子源中产生的离子离子注入设置在离子源下游的衬底; 和在所述衬底的正面上设置掩模的第一部分以暴露所述掩模的离子的第一部分，所述掩模由所述第一和第二荫罩支持件支持，所述掩模还包括卷绕在所述第一掩模保持器的第二部分

公开(公告)号：WO2009111668A3

公开(公告)日：2009-11-12

申请号：PCT/US2009036238

申请日：2009-03-05

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ,  BATEMAN NICHOLAS P T ,  GUPTA ATUL ,  HATEM CHRISTOPHER R ,  RAMAPPA DEEPAK

Inventor： BATEMAN NICHOLAS P T ,  GUPTA ATUL ,  HATEM CHRISTOPHER R ,  RAMAPPA DEEPAK

IPC: H01L31/042 ,  H01L21/265

CPC classification number: H01L33/025 ,  H01L21/26513 ,  H01L31/022441 ,  H01L31/0236 ,  H01L31/03529 ,  H01L31/0682 ,  H01L31/1864 ,  Y02E10/547 ,  Y02P70/521

Abstract: A method of tailoring the dopant profile of a substrate by utilizing two different dopants, each having a different diffusivity is disclosed. The substrate may be, for example, a solar cell. By introducing two different dopants, such as by ion implantation, furnace diffusion, or paste, it is possible to create the desired dopant profile. In addition, the dopants may be introduced simultaneously, partially simultaneously, or sequentially. Dopant pairs preferably consist of one lighter species and one heavier species, where the lighter species has a greater diffusivity. For example, dopant pairs such as boron and gallium, boron and indium, phosphorus and arsenic, and phosphorus and antimony, can be utilized.

Abstract translation: 公开了通过利用两种不同掺杂剂来调整衬底的掺杂剂分布的方法，每种掺杂剂具有不同的扩散率。 衬底可以是例如太阳能电池。 通过引入两种不同的掺杂剂，例如通过离子注入，炉扩散或糊状物，可以产生所需的掺杂剂分布。 此外，掺杂剂可以同时，部分同时或顺序地引入。 掺杂剂对优选由一种较轻的物质和一种较重的物质组成，其中较轻的物质具有较大的扩散系数。 例如，可以使用诸如硼和镓，硼和铟，磷和砷的掺杂物对，以及磷和锑。

公开(公告)号：WO2009102875A3

公开(公告)日：2009-11-05

申请号：PCT/US2009033933

申请日：2009-02-12

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ,  OLSON JOSEPH C ,  GUPTA ATUL

Inventor： OLSON JOSEPH C ,  GUPTA ATUL

IPC: H01L21/265 ,  H01L21/66

CPC classification number: H01J37/3171 ,  H01J37/304 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24542

Abstract: An apparatus and a method for detecting particle beam characteristics are disclosed. In one embodiment, the apparatus may have a body including a first end and second end and at least one detector between the first and second ends. The apparatus may have a transparent state where a portion of the particles entering the apparatus may pass through the apparatus. The apparatus may also have a minimum transparency state where substantially all of the particles entering the apparatus may be prevented from passing through the apparatus and detected. Different transparency state may be achieved by rotating the apparatus or the detector contained therein. With the apparatus, it is possible to detect the beam properties such as the beam intensity, angle, parallelism, and a distribution of the particles in a particle beam.

Abstract translation: 公开了一种用于检测粒子束特性的装置和方法。 在一个实施例中，设备可以具有包括第一端和第二端的主体以及在第一端和第二端之间的至少一个检测器。 该设备可以具有透明状态，其中进入设备的一部分颗粒可以通过设备。 该装置还可以具有最小的透明度状态，其中可以防止进入装置的基本上所有的颗粒通过装置并被检测。 可以通过旋转装置或其中包含的检测器来实现不同的透明度状态。 利用该装置，可以检测诸如光束强度，角度，平行度以及颗粒束中颗粒分布的光束特性。

公开(公告)号：WO2009111667A2

公开(公告)日：2009-09-11

申请号：PCT/US2009/036236

申请日：2009-03-05

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES ,  BATEMAN, Nicholas, P.T. ,  GUPTA, Atul ,  HATEM, Christopher, R. ,  PAPASOULIOTIS, George, D. ,  MAYNARD, Helen, L.

Inventor： BATEMAN, Nicholas, P.T. ,  GUPTA, Atul ,  HATEM, Christopher, R. ,  PAPASOULIOTIS, George, D. ,  MAYNARD, Helen, L.

IPC: H01L31/18

CPC classification number: H01L31/1804 ,  H01L31/02168 ,  H01L31/022433 ,  Y02E10/547 ,  Y02P70/521

Abstract: Methods of controlling the diffusion of a dopant in a solar cell are disclosed. A second species is used in conjunction with the dopant to modify the diffusion region. For example, phosphorus and boron both diffuse by pairing with interstitial silicon atoms. Thus, by controlling the creation and location of these interstitials, the diffusion rate of the dopant can be controlled. In one embodiment, a heavier element, such as germanium, argon or silicon, is used to create interstitials. Because of the presence of these heavier elements, the dopant diffuses deeper into the substrate. In another embodiment, carbon is implanted. Carbon reduces the number of interstitials, and thus can be used to limit the diffusion of the dopant. In another embodiment, a lighter element, such as helium is used to amorphize the substrate. The crystalline-amorphous interface created limits diffusion of the dopant into the substrate.

Abstract translation: 公开了控制太阳能电池中掺杂剂扩散的方法。 第二种物质与掺杂剂一起使用以改变扩散区域。 例如，磷和硼都通过与间质硅原子配对而扩散。 因此，通过控制这些间隙的产生和位置，可以控制掺杂剂的扩散速率。 在一个实施例中，使用诸如锗，氩或硅的较重元件来形成填隙。 由于这些较重元素的存在，掺杂剂更深地扩散到衬底中。 在另一个实施例中，植入碳。 碳减少填隙物的数量，因此可以用来限制掺杂物的扩散。 在另一个实施例中，使用诸如氦的较轻的元件来非晶化衬底。 产生的晶体 - 无定形界面限制了掺杂剂扩散到衬底中。

公开(公告)号：WO2008124418A1

公开(公告)日：2008-10-16

申请号：PCT/US2008/059086

申请日：2008-04-02

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES. INC. ,  GUPTA, Atul ,  SCHEUER, Jay, T. ,  DISTASO, Daniel ,  CUCCHETTI, Antonella ,  CALLAHAN, William, G.

Inventor： GUPTA, Atul ,  SCHEUER, Jay, T. ,  DISTASO, Daniel ,  CUCCHETTI, Antonella ,  CALLAHAN, William, G.

IPC: H01J37/317 ,  H01J37/302 ,  H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J37/304 ,  H01J2237/30433

Abstract: An approach (300) that tunes an ion implanter (100) for optimal performance is described. In one embodiment, there is a system (104) for tuning an ion implanter having multiple beamline elements to generate an ion beam having desired beam properties. In this embodiment, the system comprises a beamline element settings controller (200) configured to provide beamline element settings for generating the desired beam properties. A tuning model (204) correlates the beamline element settings with beam properties. A calibration component (208) is configured to calibrate the tuning model in response to a determination (205,206) that beam properties measured from using the tuned beamline element settings differs from the determined tuned beamline element settings.

Abstract translation: 描述了调整离子注入机（100）以获得最佳性能的方法（300）。 在一个实施例中，存在用于调谐具有多个束线元件的离子注入机的系统（104），以产生具有期望的束特性的离子束。 在该实施例中，该系统包括被配置为提供用于产生期望的波束特性的波束线元件设置的波束线路元件设置控制器（200）。 调谐模型（204）将光束元素设置与光束属性相关联。 校准组件（208）被配置为响应于使用调谐束线元件设置测量的波束特性与所确定的调谐束线元件设置不同的确定（205,206）来校准调谐模型。

公开(公告)号：WO2006002138A3

公开(公告)日：2006-04-06

申请号：PCT/US2005021883

申请日：2005-06-21

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ,  SINGH VIKRAM ,  PERSING HAROLD ,  MILLER TIMOTHY ,  GUPTA ATUL ,  FANG ZIWEI

Inventor： SINGH VIKRAM ,  PERSING HAROLD ,  MILLER TIMOTHY ,  GUPTA ATUL ,  FANG ZIWEI

IPC: H01L21/223 ,  C03C15/00 ,  C23C14/00

CPC classification number: H01L21/2236 ,  H01J37/32412

Abstract: A method for ion implantation of a substrate includes forming a plasma from at least one implant material comprising at least one implant species, implanting the at least one implant species into a surface of the substrate, and directing at least one surface­modifying species at the surface to reduce a surface damage associated with the plasma. An apparatus for ion implantation is configured to implement this method.

Abstract translation: 用于离子植入衬底的方法包括从包括至少一种植入物种的至少一种植入材料形成等离子体，将所述至少一种植入物种植入到所述基底的表面中，以及将所述表面的至少一种表面改性物质引导至 减少与等离子体相关的表面损伤。 用于离子注入的装置被配置为实现该方法。

公开(公告)号：WO2005033980A1

公开(公告)日：2005-04-14

申请号：PCT/US2004/032188

申请日：2004-10-01

Applicant: SCHLUMBERGER HOLDINGS LIMITED ,  SCHLUMBERGER CANADA LIMITED ,  SERVICES PETROLIERS SCHLUMBERGER ,  SCHLUMBERGER TECHNOLOGY CORPORATION ,  GUPTA, Atul ,  SINGH, Amar

Inventor： GUPTA, Atul ,  SINGH, Amar

IPC: G06F17/30

CPC classification number: G06F17/30289

Abstract: The present invention includes an apparatus, method and system for loading data into a database. The invention includes a spreadsheet dataset, having data in the form of one or more records, a control file containing a set of rules, each rule having a condition and a spreadsheet loader. The spreadsheet dataset and the control file are inputs to the spreadsheet loader. Each rule in the control file is evaluated for each record to determine if the condition is true for the record, and the records are parsed if the condition is true. The spreadsheet loader sends the parsed data to the database. The invention includes a user interface to facilitate creation of the control file.

Abstract translation: 本发明包括用于将数据加载到数据库中的装置，方法和系统。 本发明包括具有一个或多个记录形式的数据的电子数据表数据集，包含一组规则的控制文件，每个规则具有条件和电子表格加载器。 电子数据表数据集和控制文件是电子表格加载程序的输入。 为每个记录评估控制文件中的每个规则，以确定该条件是否为该记录，如果条件为真，记录将被解析。 电子表格加载器将解析的数据发送到数据库。 本发明包括用于简化控制文件的创建的用户界面。