Abstract:
Various embodiments include apparatus, systems, and methods having multiple dice arranged in a stack in which a defective cell may be replaced by a spare cell on the same die or a different die.
Abstract:
Various embodiments include apparatus, systems, and methods having multiple dice arranged in a stack in which a defective cell may be replaced by a spare cell on the same die or a different die.
Abstract:
A method of reducing parasitic capacitance in an integrated circuit having three or more metal levels (M1, M2, M3, etc) is described. The method comprises forming a bond pad (20) at least partially exposed at the top surface of the integrated circuit, forming a metal pad (22) on the metal level (42) below the bond pad (20) and forming an underlying metal pad (26b) on each of the one or more lower metal levels. In the illustrated embodiments, the ratio of an area of at least one of the underlying metal pads (22, 26b) to the area of the bond pad (20) is less than 30%. Parasitic capacitance is thus greatly reduced and signal propagation speeds improved.
Abstract:
An apparatus and method for repairing a semiconductor memory device includes a first memory cell array, a first redundant cell array and a repair circuit configured to nonvolatilely store a first address designating at least one defective memory cell in the first memory cell array. A first volatile cache stores a first cached address corresponding to the first address designating the at least one defective memory cell. The repair circuit distributes the first address designating the at least one defective memory cell of the first memory cell array to the first volatile cache. Match circuitry substitutes at least one redundant memory cell from the first redundant cell array for the at least one defective memory cell in the first memory cell array when a first memory access corresponds to the first cached address.
Abstract:
A method of reducing parasitic capacitance in an integrated circuit having three or more metal levels (M1, M2, M3, etc) is described. The method comprises forming a bond pad (20) at least partially exposed at the top surface of the integrated circuit, forming a metal pad (22) on the metal level (42) below the bond pad (20) and forming an underlying metal pad (26b) on each of the one or more lower metal levels. In the illustrated embodiments, the ratio of an area of at least one of the underlying metal pads (22, 26b) to the area of the bond pad (20) is less than 30%. Parasitic capacitance is thus greatly reduced and signal propagation speeds improved.
Abstract:
An apparatus and method for repairing a semiconductor memory device includes a first memory cell array, a first redundant cell array and a repair circuit configured to nonvolatilely store a first address designating at least one defective memory cell in the first memory cell array. A first volatile cache stores a first cached address corresponding to the first address designating the at least one defective memory cell. The repair circuit distributes the first address designating the at least one defective memory cell of the first memory cell array to the first volatile cache. Match circuitry substitutes at least one redundant memory cell from the first redundant cell array for the at least one defective memory cell in the first memory cell array when a first memory access corresponds to the first cached address.