公开(公告)号：WO2012018367A3

公开(公告)日：2012-03-29

申请号：PCT/US2011001176

申请日：2011-06-30

Applicant: LAM RES CORP ,  SHAJII ALI ,  GOTTSCHO RICHARD ,  BENZERROUK SOUHEIL ,  COWE ANDREW ,  NAGARKATTI SIDDHARTH P ,  ENTLEY WILLIAM R

Inventor： SHAJII ALI ,  GOTTSCHO RICHARD ,  BENZERROUK SOUHEIL ,  COWE ANDREW ,  NAGARKATTI SIDDHARTH P ,  ENTLEY WILLIAM R

IPC: H05B31/26

CPC classification number: H05H1/46 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/3266 ,  H01J37/32669 ,  H01J37/32816 ,  H01J2237/334 ,  H05H2001/4652 ,  H05H2001/4682

Abstract: A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.

Abstract translation: 等离子体源包括环等离子体室，围绕环等离子体室的外部的初级绕组和多个铁氧体，其中环等离子体室穿过每个铁氧体。 还描述了用于产生等离子体的系统和方法。

公开(公告)号：WO2010151466A3

公开(公告)日：2011-11-17

申请号：PCT/US2010038790

申请日：2010-06-16

Applicant: MKS INSTR INC ,  NAGARKATTI SIDDHARTH ,  TIAN FENG ,  LAM DAVID ,  RASHID ABDUL ,  BENZERROUK SOUHEIL ,  BYSTRYAK ILYA ,  MENZER DAVID ,  SCHUSS JACK J ,  AMBROSINA JESSE E

Inventor： NAGARKATTI SIDDHARTH ,  TIAN FENG ,  LAM DAVID ,  RASHID ABDUL ,  BENZERROUK SOUHEIL ,  BYSTRYAK ILYA ,  MENZER DAVID ,  SCHUSS JACK J ,  AMBROSINA JESSE E

IPC: H02J17/00

CPC classification number: H03K5/01 ,  H03F3/189 ,  H03F3/217 ,  H03F2200/105 ,  H03F2200/375 ,  H03F2200/387 ,  H03G3/3047

Abstract: A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.

Abstract translation: 一种用于控制脉冲功率的方法，包括从功率放大器测量第一功率脉冲以获得数据。 该方法还包括产生第一信号以调整输出功率的第二脉冲，第一信号与数据相关，以最小化功率设定点与第二脉冲的基本稳定部分之间的功率差。 该方法还包括产生第二信号以调整传递功率的第二脉冲，第二信号与数据相关，以最小化第二脉冲的峰值与第二脉冲的基本上稳定的部分之间的幅度差异。

公开(公告)号：WO2010098779A1

公开(公告)日：2010-09-02

申请号：PCT/US2009/040358

申请日：2009-04-13

Applicant: MKS INSTRUMENTS, INC. ,  BENZERROUK, Souheil ,  NAGARKATTI, Siddharth, P. ,  COWE, Andrew ,  SHAJII, Ali ,  AMBROSINA, Jesse, E. ,  TRAN, Ken ,  CHEN, Xing

Inventor： BENZERROUK, Souheil ,  NAGARKATTI, Siddharth, P. ,  COWE, Andrew ,  SHAJII, Ali ,  AMBROSINA, Jesse, E. ,  TRAN, Ken ,  CHEN, Xing

IPC: H01J37/32

CPC classification number: H01J37/32009 ,  H01J37/321

Abstract: Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.

Abstract translation: 描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。 从点火电源向等离子体点火电路供电。 测量等离子体点火电路的预点火信号。 基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。 经过一段时间后，调节可调节点火控制信号。

公开(公告)号：WO2005094404A2

公开(公告)日：2005-10-13

申请号：PCT/US2005002783

申请日：2005-02-01

Applicant: MKS INSTR INC ,  SHAJII ALI ,  NAGARKATTI SIDDHARTH

Inventor： SHAJII ALI ,  NAGARKATTI SIDDHARTH

IPC: C23F1/00 ,  F17D3/00

CPC classification number: G05D7/0664 ,  C23C16/45561 ,  C23C16/52 ,  Y10T137/0363 ,  Y10T137/2524

Abstract: A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.

Abstract translation: 一种用于将单个流分成两个或更多个期望比例的二次流的系统，包括适于接收单个流的入口，连接到入口的至少两个二次流线，适于接收至少一个期望比例的输入装置 至少一个原位过程监视器，其提供由每个流水线产生的产品的测量值，以及连接到输入设备和原位过程监控器的控制器。 控制器被编程为接收通过输入设备的期望流量比，从原位过程监控器接收产品测量值，并且基于所需的流量比和产品测量值来计算校正的流量比。 如果产品测量值不相等，则校正后的流量比将不同于所需的流量比。

公开(公告)号：WO2013074824A1

公开(公告)日：2013-05-23

申请号：PCT/US2012/065333

申请日：2012-11-15

Applicant: LAM RESEARCH CORPORATION ,  SHAJII, Ali ,  GOTTSCHO, Richard ,  BENZERROUK, Souheil ,  COWE, Andrew ,  NAGARKATTI, Siddharth, P. ,  ENTLEY, William, R.

Inventor： SHAJII, Ali ,  GOTTSCHO, Richard ,  BENZERROUK, Souheil ,  COWE, Andrew ,  NAGARKATTI, Siddharth, P. ,  ENTLEY, William, R.

IPC: H05H1/00

CPC classification number: H05H1/46 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32422 ,  H01J37/32449 ,  H01J37/3266 ,  H01J37/32669 ,  H01J37/32816 ,  H01J2237/334 ,  H05H1/50 ,  H05H2001/4682

Abstract: The present invention fills these needs by providing a distributed multi-zone plasma source. It should be appreciated that the present invention can be implemented in numerous ways, including as a process, an apparatus, a system, computer readable media, or a device. Several inventive embodiments of the present invention are described below. One embodiment provides a processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. Multiple plasma chamber outlets can couple a plasma chamber of each one of the plasma sources to the process chamber.

Abstract translation: 本发明通过提供分布式多区域等离子体源来满足这些需求。 应当理解，本发明可以以多种方式实现，包括作为过程，装置，系统，计算机可读介质或设备。 下面描述本发明的几个发明实施例。 一个实施例提供在处理室顶部中包括多个等离子体源的处理室。 每个等离子体源是包括初级绕组和多个铁氧体的环形等离子体源。 多个等离子体室出口可以将每个等离子体源的等离子体室耦合到处理室。

公开(公告)号：WO2012078253A1

公开(公告)日：2012-06-14

申请号：PCT/US2011/057814

申请日：2011-10-26

Applicant: MKS INSTRUMENTS, INC. ,  NAGARKATTI, Siddharth, P. ,  SHAJII, Ali ,  BENZERROUK, Souheil

Inventor： NAGARKATTI, Siddharth, P. ,  SHAJII, Ali ,  BENZERROUK, Souheil

IPC: H01J37/32

CPC classification number: H01J37/32935 ,  H01J37/321 ,  H01J37/32174

Abstract: Methods, systems, and computer program products are described for measuring and controlling parameters of a plasma generator. A current in a primary winding of a transformer or inductive element that generates a plasma is measured. A voltage across a secondary winding of the transformer or inductive element is measured. Based on the current of the primary winding and the voltage across the secondary winding, a parameter of the plasma is determined. The parameter includes a resistance value associated with the plasma, a power value associated with the plasma, or both.

Abstract translation: 描述了用于测量和控制等离子体发生器参数的方法，系统和计算机程序产品。 测量产生等离子体的变压器或电感元件的初级绕组中的电流。 测量变压器或电感元件的次级绕组两端的电压。 基于初级绕组的电流和次级绕组两端的电压，确定等离子体的参数。 该参数包括与等离子体相关联的电阻值，与等离子体相关联的功率值或两者。

公开(公告)号：WO2010151466A2

公开(公告)日：2010-12-29

申请号：PCT/US2010/038790

申请日：2010-06-16

Applicant: MKS INSTRUMENTS, INC. ,  NAGARKATTI, Siddharth ,  TIAN, Feng ,  LAM, David ,  RASHID, Abdul ,  BENZERROUK, Souheil ,  BYSTRYAK, Ilya ,  MENZER, David ,  SCHUSS, Jack, J. ,  AMBROSINA, Jesse, E.

Inventor： NAGARKATTI, Siddharth ,  TIAN, Feng ,  LAM, David ,  RASHID, Abdul ,  BENZERROUK, Souheil ,  BYSTRYAK, Ilya ,  MENZER, David ,  SCHUSS, Jack, J. ,  AMBROSINA, Jesse, E.

IPC: H02J17/00

CPC classification number: H03K5/01 ,  H03F3/189 ,  H03F3/217 ,  H03F2200/105 ,  H03F2200/375 ,  H03F2200/387 ,  H03G3/3047

Abstract: A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.

Abstract translation: 一种用于控制脉冲功率的方法，包括从功率放大器测量第一功率脉冲以获得数据。 该方法还包括产生第一信号以调整输出功率的第二脉冲，第一信号与数据相关，以最小化功率设定点与第二脉冲的基本稳定部分之间的功率差。 该方法还包括产生第二信号以调整传递功率的第二脉冲，第二信号与数据相关，以最小化第二脉冲的峰值与第二脉冲的基本上稳定的部分之间的幅度差异。

公开(公告)号：WO2007053569A1

公开(公告)日：2007-05-10

申请号：PCT/US2006/042360

申请日：2006-10-31

Applicant: MKS INSTRUMENTS, INC. ,  NAGARKATTI, Siddharth, P. ,  KISHINEVSKY, Michael ,  SHAJII, Ali ,  KALVAITIS, Timothy, E. ,  MCKINNEY, William, S. ,  GOODMAN, Daniel ,  HOLBER, William, M. ,  SMITH, John, A.

Inventor： NAGARKATTI, Siddharth, P. ,  KISHINEVSKY, Michael ,  SHAJII, Ali ,  KALVAITIS, Timothy, E. ,  MCKINNEY, William, S. ,  GOODMAN, Daniel ,  HOLBER, William, M. ,  SMITH, John, A.

IPC: H03H7/40

CPC classification number: H03H7/40

Abstract: A system (200) and method are provided for delivering power to a dynamic load (260). The system includes a power supply (210) providing DC power having a substantially constant power open loop response, a power amplifier (220) for converting the DC power to RF power, a sensor (240) for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system (250, 252) to modify the impedance of the power amplifier to at least a substantially matched impedance of the dynamic load (260), and a controller (230) for controlling the electrically controllable impedance matching system (200). The system (200) further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module (252) for determining power delivered to the dynamic load, (260) and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

Abstract translation: 提供了一种用于将功率传递给动态负载（260）的系统（200）和方法。 该系统包括提供具有基本上恒定的功率开环响应的DC电力的电源（210），用于将DC功率转换成RF功率的功率放大器（220），用于测量DC功率的电压，电流和相位角的传感器（240） 与RF功率相关联的电压和电流矢量;将电力可控阻抗匹配系统（250,252）修改成至少动态负载（260）的基本上匹配的阻抗的功率放大器的阻抗;以及控制器（230） 用于控制电可控阻抗匹配系统（200）。 所述系统（200）还包括用于确定由所述功率放大器输出的功率的传感器校准测量模块，用于确定输送到所述动态负载的功率的电子匹配系统校准模块（252）和用于计算功率的功率耗散模块 消耗在电可控阻抗匹配系统中。

公开(公告)号：WO2005094404A3

公开(公告)日：2005-10-13

申请号：PCT/US2005/002783

申请日：2005-02-01

Applicant: MKS INSTRUMENTS, INC. ,  SHAJII, Ali ,  NAGARKATTI, Siddharth

Inventor： SHAJII, Ali ,  NAGARKATTI, Siddharth

IPC: G05D7/00 ,  G05D11/00

Abstract: A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.

公开(公告)号：WO2005093304A1

公开(公告)日：2005-10-06

申请号：PCT/US2005/003613

申请日：2005-02-01

Applicant: MKS INSTRUMENTS, INC. ,  SHAJII, Ali ,  NAGARKATTI, Siddharth

Inventor： SHAJII, Ali ,  NAGARKATTI, Siddharth

IPC: F16K31/12

CPC classification number: G05D16/206 ,  G05D16/2053 ,  Y10T137/0396 ,  Y10T137/7761

Abstract: A system for controlling fluid flow through i lines, wherein the i lines are connectable through tubing to i zones, respectively, and wherein i = 1, 2, ... , N . The system includes at least one valve and a pressure transducer in each of the i lines, a control device for controlling the valves, and a zone pressure estimator. The zone pressure estimator is connected to the pressure transducers and is programmed to calculate an estimated pressure in each the i zones and provide the estimated pressures to the control device.

Abstract translation: 一种用于控制通过i线的流体流动的系统，其中所述i线分别通过管道连接到i区域，并且其中i = 1,2，...，N。所述系统包括至少一个阀和压力传感器 i行中的每一个，用于控制阀的控制装置和区域压力估计器。 区域压力估计器连接到压力传感器，并被编程为计算每个i区域中的估计压力，并将估计的压力提供给控制装置。