公开(公告)号：WO2008019362A2

公开(公告)日：2008-02-14

申请号：PCT/US2007/075344

申请日：2007-08-07

Applicant: SOKUDO CO., LTD. ,  MICHAELSON, Tim ,  BEKIARIS, Nikolaos

Inventor： MICHAELSON, Tim ,  BEKIARIS, Nikolaos

IPC: B05C11/00 ,  H01L21/66

CPC classification number: H01L22/20 ,  H01L22/12

Abstract: A method of controlling wafer critical dimension (CD) uniformity on a track lithography tool includes obtaining a CD map for a wafer. The CD map includes a plurality of CD data points correlated with a multi-zone heater geometry map. The multi-zone heater includes a plurality of heater zones. The method also includes determining a CD value for a first heater zone of the plurality of heater zones based on one or more of the CD data points and computing a difference between the determined CD value for the first heater zone and a target CD value for the first heater zone. The method further includes determining a temperature variation for the first heater zone based, in part, on the computed difference and a temperature sensitivity of a photoresist deposited on the wafer and modifying a temperature of the first heater zone based, in part, on the temperature variation.

Abstract translation: 控制轨道光刻工具上的晶片临界尺寸（CD）均匀性的方法包括获得晶片的CD图。 CD映射包括与多区加热器几何图相关的多个CD数据点。 多区加热器包括多个加热区。 该方法还包括基于CD数据点中的一个或多个来确定多个加热器区域中的第一加热器区域的CD值，并且计算所确定的第一加热器区域的CD值与用于第一加热器区域的目标CD值之间的差值 第一加热区。 该方法还包括：部分地基于计算出的差异和沉积在晶片上的光致抗蚀剂的温度敏感度来确定第一加热器区域的温度变化，并且部分地基于温度改变第一加热器区域的温度 变异。

公开(公告)号：WO2007127871A2

公开(公告)日：2007-11-08

申请号：PCT/US2007067549

申请日：2007-04-26

Applicant: SOKUDO CO LTD ,  LIN Y SEAN

Inventor： LIN Y SEAN

IPC: B05C11/00 ,  B05C5/00

CPC classification number: H01L21/6715 ,  H01L21/67253

Abstract: A device for detection of a semiconductor process liquid is provided. The device includes a light source adapted to generate a light beam and a digital optical sensor to detect the light beam. A nozzle is adapted to support the semiconductor process liquid and transmit the light beam. The nozzle and the source are arranged to refract the beam in a first direction while the beam passes through a gas disposed in the nozzle. The nozzle and source are arranged to refract the beam in a second direction while the beam passes through the liquid.

Abstract translation: 提供了一种用于检测半导体工艺液体的装置。 该装置包括适于产生光束的光源和用于检测光束的数字光学传感器。 喷嘴适于支撑半导体工艺液体并透射光束。 喷嘴和源被布置成当光束通过设置在喷嘴中的气体时沿第一方向折射光束。 喷嘴和源被设置成在光束通过液体时沿第二方向折射光束。

公开(公告)号：WO2007127866A2

公开(公告)日：2007-11-08

申请号：PCT/US2007067544

申请日：2007-04-26

Applicant: SOKUDO CO LTD ,  SALINAS MARTIN JEFF ,  NATARAJAN RAMANAN ,  VOLFOVSKI LEON

Inventor： SALINAS MARTIN JEFF ,  NATARAJAN RAMANAN ,  VOLFOVSKI LEON

IPC: G03B27/52 ,  H01L21/00

CPC classification number: H01L21/67098 ,  H01L21/67178 ,  H01L21/67207

Abstract: An integrated thermal unit comprising a housing; a bake station positioned within the housing, the bake station comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill station positioned within the housing, the chill station comprising a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate receiving station positioned within the housing, the substrate receiving station configured to hold a substrate; wherein the bake station, chill station and substrate receiving station are arranged in a vertical stack within the housing. In some embodiments the integrated thermal unit further comprises a substrate transfer shuttle positioned within the housing and adapted to transfer substrates between the substrate receiving station, bake station and chill stations.

Abstract translation: 一种集成热单元，包括壳体; 位于所述壳体内的烘烤站，所述烘焙站包括被配置为加热支撑在所述烤盘表面上的基底的烘烤板; 位于所述壳体内的冷却站，所述冷却站包括构造成冷却支撑在所述冷却板的表面上的基板的冷却板; 以及位于所述壳体内的基板接收台，所述基板接收台被配置为保持基板; 其中烘烤站，冷却站和衬底接收站被布置在壳体内的垂直堆叠中。 在一些实施例中，集成热单元还包括位于壳体内并适于在衬底接收站，烘烤站和冷却站之间传送衬底的衬底传送梭。

公开(公告)号：WO2007127872A3

公开(公告)日：2008-09-04

申请号：PCT/US2007067550

申请日：2007-04-26

Applicant: SOKUDO CO LTD ,  HERCHEN HARALD ,  PORRAS ERICA ,  ISHIKAWA TETSUYA

Inventor： HERCHEN HARALD ,  PORRAS ERICA ,  ISHIKAWA TETSUYA

IPC: H01L21/00 ,  H01L21/302

CPC classification number: G01F1/7086 ,  B05B12/082 ,  H01L21/6715 ,  H01L21/67225

Abstract: Systems, devices and methods of measuring a flow of a liquid stream for a semiconductor process are provided. The liquid stream is delivered through a liquid delivery nozzle. The nozzle is adapted to deliver the liquid stream for the semiconductor process. The free stream extends from an upstream location near the nozzle to a downstream location. The stream is marked at the upstream location and measured at the downstream location to determine the flow.

Abstract translation: 提供了测量用于半导体工艺的液体流的流量的系统，装置和方法。 液体流通过液体输送喷嘴输送。 喷嘴适于输送用于半导体工艺的液体流。 自由流从喷嘴附近的上游位置延伸到下游位置。 流在上游位置标记并在下游位置测量以确定流量。

公开(公告)号：WO2008088950A1

公开(公告)日：2008-07-24

申请号：PCT/US2008/050284

申请日：2008-01-04

Applicant: SOKUDO CO., LTD. ,  HERCHEN, Harald ,  PANG, Lily ,  PORRAS, Erica

Inventor： HERCHEN, Harald ,  PANG, Lily ,  PORRAS, Erica

IPC: H01L21/00

CPC classification number: G01D5/342

Abstract: A system for measuring substrate concentricity includes a substrate support member adapted to rotate a substrate around a substantially vertical axis. The substrate includes a mounting surface and a process surface. The system also includes a spin cup positioned below the substrate and a translatable arm mounted a predetermined distance above the process surface of the substrate. The translatable arm is adapted to translate along a radius of the substrate. The system further includes an optical emitter mounted on the translatable arm and an optical detector mounted on the translatable arm.

Abstract translation: 用于测量衬底同心度的系统包括适于围绕基本垂直轴线旋转衬底的衬底支撑构件。 衬底包括安装表面和工艺表面。 该系统还包括位于基底下方的旋转杯，以及安装在衬底的工艺表面上方预定距离的可平移臂。 可平移臂适于沿着基底的半径平移。 该系统还包括安装在可平移臂上的光发射器和安装在可平移臂上的光学探测器。

公开(公告)号：WO2008005871A2

公开(公告)日：2008-01-10

申请号：PCT/US2007072543

申请日：2007-06-29

Applicant: SOKUDO CO LTD ,  SALINAS MARTIN JEFF ,  QUACH DAVID H

Inventor： SALINAS MARTIN JEFF ,  QUACH DAVID H

IPC: H05B3/68

CPC classification number: H05B3/143 ,  H01L21/67103 ,  H01L21/67248

Abstract: A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.

Abstract translation: 一种基板加热器，包括具有上表面，下表面和在上表面和下表面之间延伸的周边表面的烘烤板，所述烘烤板包括至少一个加热元件，至少一个温度传感器和多个包括在 耦合到所述加热元件的至少一个线和耦合到所述温度传感器的至少一个线; 与烘烤板的下部和外周侧表面间隔开并且通常围绕烘烤板的下部和外周侧表面的护罩，所述护罩具有面向烘烤板的下表面的内部上表面，面向烘烤板的周边侧表面的内侧表面和 下表面与内部上表面相对; 形成在所述屏蔽的下表面上的图案化信号层，其中所述多个导线电耦合到形成在所述图案化信号层中的对应的多个信号迹线; 以及电连接到所述图案化信号层中的所述多个信号迹线的连接器，适于促进与所述多根电线的电连接。

公开(公告)号：WO2008019362A3

公开(公告)日：2008-10-16

申请号：PCT/US2007075344

申请日：2007-08-07

Applicant: SOKUDO CO LTD ,  MICHAELSON TIM ,  BEKIARIS NIKOLAOS

Inventor： MICHAELSON TIM ,  BEKIARIS NIKOLAOS

IPC: H01L21/00 ,  G01R31/26 ,  G06F19/00 ,  H01L21/66 ,  H05B3/68

CPC classification number: H01L22/20 ,  H01L22/12

Abstract: A method of controlling wafer critical dimension (CD) uniformity on a track lithography tool includes obtaining a CD map for a wafer (432) The CD map includes a plurality of CD data points correlated with a multi-zone heater geometry map (434) The multi-zone heater includes a plurality of heater zones The method also includes determining a CD value for a first heater zone of the plurality of heater zones based on one or more of the CD data points and computing a difference between the determined CD value for the first heater zone and a target CD value for the first heater zone (438) The method further includes determining a temperature variation for the first heater zone based, in part, on the computed difference and a temperature sensitivity of a photoresist deposited on the wafer an modifying a temperature of the first heater zone based, in part, on the temperature variation (440)

Abstract translation: 控制轨道光刻工具上的晶片临界尺寸（CD）均匀性的方法包括获得晶片的CD映射（432）.CD图包括与多区加热器几何图相关的多个CD数据点。 多区加热器包括多个加热器区域。该方法还包括基于一个或多个CD数据点确定多个加热器区域中的第一加热器区域的CD值，并计算所确定的CD值 第一加热器区域和用于第一加热器区域（438）的目标CD值。该方法还包括部分地基于计算出的差异和沉积在晶片上的光致抗蚀剂的温度敏感度来确定第一加热器区域的温度变化 部分地基于温度变化（440）改变第一加热器区域的温度，

公开(公告)号：WO2007127871A3

公开(公告)日：2007-11-08

申请号：PCT/US2007/067549

申请日：2007-04-26

Applicant: SOKUDO CO., LTD. ,  LIN, Y. Sean

Inventor： LIN, Y. Sean

IPC: B05C11/10

Abstract: A device for detection of a semiconductor process liquid is provided. The device includes a light source adapted to generate a light beam and a digital optical sensor to detect the light beam. A nozzle is adapted to support the semiconductor process liquid and transmit the light beam. The nozzle and the source are arranged to refract the beam in a first direction while the beam passes through a gas disposed in the nozzle. The nozzle and source are arranged to refract the beam in a second direction while the beam passes through the liquid.

公开(公告)号：WO2007127866A3

公开(公告)日：2007-11-08

申请号：PCT/US2007/067544

申请日：2007-04-26

Applicant: SOKUDO CO., LTD. ,  SALINAS, Martin, Jeff ,  NATARAJAN, Ramanan ,  VOLFOVSKI, Leon

Inventor： SALINAS, Martin, Jeff ,  NATARAJAN, Ramanan ,  VOLFOVSKI, Leon

IPC: H01L21/00

Abstract: An integrated thermal unit comprising a housing; a bake station positioned within the housing, the bake station comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill station positioned within the housing, the chill station comprising a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate receiving station positioned within the housing, the substrate receiving station configured to hold a substrate; wherein the bake station, chill station and substrate receiving station are arranged in a vertical stack within the housing. In some embodiments the integrated thermal unit further comprises a substrate transfer shuttle positioned within the housing and adapted to transfer substrates between the substrate receiving station, bake station and chill stations.

公开(公告)号：WO2008021894A3

公开(公告)日：2008-07-31

申请号：PCT/US2007075498

申请日：2007-08-08

Applicant: SOKUDO CO LTD ,  PORRAS ERICA R ,  RAMANAN NATARAJAN

Inventor： PORRAS ERICA R ,  RAMANAN NATARAJAN

IPC: B67D7/08 ,  G03F7/16 ,  B05C11/10

CPC classification number: H01L21/6715 ,  H01L21/67253

Abstract: An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.

Abstract translation: 用于监测分配喷嘴中的半导体工艺流体界面的位置的装置包括适于提供沿光路传播的光束的扩展光源。 光束的特征在于沿与分配方向对齐的第一方向测量的路径宽度。 该装置还包括耦合到光路并适于检测光束的至少一部分的光学检测器以及沿着光路布置在扩展光源和光学检测器之间的位置处的分配喷嘴。 该装置还包括联接到分配喷嘴并适于沿着第一方向平移分配喷嘴的喷嘴定位构件。