公开(公告)号：WO2007011876A1

公开(公告)日：2007-01-25

申请号：PCT/US2006/027697

申请日：2006-07-17

Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE ,  STARK, Peter, Randolph, Hazard

Inventor： STARK, Peter, Randolph, Hazard

IPC: G02B5/18

CPC classification number: G02B5/008

Abstract: An apparatus configured to generate surface plasmon enhanced radiation comprises a metal film having first and second surfaces, and one or more resonance configurations formed in the metal film. An exemplary resonance configuration includes an aperture extending between the first and second surfaces of the metal film, and at least one feature that forms a non-periodic structure together with the aperture. The feature causes a variation in a dielectric function along the first surface of the metal film proximate to the aperture, and the aperture and the feature are configured so as to cooperatively facilitate a resonance condition for surface plasmon enhanced radiation generated by the apparatus, based on incident radiation that irradiates the first surface of the metal film. Exemplary features for a given resonance configuration include, but are not limited to, a single feature including one of another aperture, a protrusion that extends outwardly from the metal film, or a depression in the metal film, as well as one or more edges of the metal film.

Abstract translation: 构造成产生表面等离子体增强辐射的装置包括具有第一表面和第二表面的金属膜以及在金属膜中形成的一个或多个共振结构。 示例性的共振配置包括在金属膜的第一和第二表面之间延伸的孔以及与孔一起形成非周期性结构的至少一个特征。 该特征导致沿着靠近孔的金属膜的第一表面的介电函数的变化，并且孔和特征被配置为协同地促进由装置产生的表面等离子体增强辐射的谐振条件，基于 照射金属膜的第一表面的入射辐射。 给定谐振配置的示例性特征包括但不限于单个特征，其包括另一个孔中的一个，从金属膜向外延伸的突起或金属膜中的凹陷，以及一个或多个边缘 金属膜。

公开(公告)号：WO2003016781A2

公开(公告)日：2003-02-27

申请号：PCT/US2002/026072

申请日：2002-08-14

Applicant: THE PRESIDENT AND FELLOWS OF HARVARD COLLEGE ,  STARK, Peter, Randolph, Hazard ,  LARSON, Dale, N.

Inventor： STARK, Peter, Randolph, Hazard ,  LARSON, Dale, N.

IPC: F21S

CPC classification number: A61K31/428 ,  G01N21/554 ,  G01N21/648 ,  G01Q60/22 ,  G02B21/004 ,  G02B21/0068 ,  G02B21/0072 ,  G02B21/0076 ,  G03F7/70375 ,  G03F7/70483 ,  G21K1/00 ,  G21K5/04 ,  H01J2237/3174 ,  H05H6/00 ,  Y10T29/49 ,  Y10T29/49002 ,  Y10T436/11

Abstract: Methods and apparatus for producing small, bright nanometric light sources from apertures that are smaller than the wavelength of the emitted light. Light is directed at a surface layer of metal onto a light barrier structure that includes one or more apertures each of which directs a small spot of light onto a target. The incident light excites surface plasmons (electron density fluctuations) in the top metal surface layer and this energy couples through the apertures to the opposing surface where it is emitted as light from the apertures of from the rims of the apertures. Means are employed to prevent or severely limit the extent to which surface plasmons are induced on the surface at the aperture exit, thereby constraining the resulting emissions to small target areas. The resulting small spot illunination may be used to increase the resolution of microscopes and photolithographic processes, increase the storage capacity and performance of optical data storage systems, and analyze the properties of small objects such as protein and nucleic acid molecules and single cells.

Abstract translation: 用于从小于发射光的波长的孔产生小的，明亮的纳米光源的方法和装置。 光被引导到金属的表面层到包括一个或多个孔的光阻挡结构上，每个孔将小的光点引导到目标上。 入射光激发顶部金属表面层中的表面等离子体激元（电子密度波动），并且该能量通过孔耦合到相对表面，其中作为光从孔的边缘的光发射。 采用手段来防止或严重限制在孔口处的表面上诱导表面等离子体激元的程度，从而将所得到的排放物约束到小目标区域。 所产生的小点染色可用于增加显微镜和光刻工艺的分辨率，增加光学数据存储系统的存储容量和性能，并分析小物体如蛋白质和核酸分子和单细胞的性质。

公开(公告)号：WO03016781A3

公开(公告)日：2003-09-18

申请号：PCT/US0226072

申请日：2002-08-14

Applicant: HARVARD COLLEGE ,  STARK PETER RANDOLPH HAZARD ,  LARSON DALE N

Inventor： STARK PETER RANDOLPH HAZARD ,  LARSON DALE N

IPC: A61K31/428 ,  G01N21/55 ,  G01Q10/00 ,  G01Q30/20 ,  G01Q60/18 ,  G02B21/00 ,  G03F7/20 ,  G21K1/00 ,  G21K5/04 ,  H05H6/00 ,  C25D11/02 ,  G01N33/543 ,  H01L27/12

CPC classification number: A61K31/428 ,  G01N21/554 ,  G01N21/648 ,  G01Q60/22 ,  G02B21/004 ,  G02B21/0068 ,  G02B21/0072 ,  G02B21/0076 ,  G03F7/70375 ,  G03F7/70483 ,  G21K1/00 ,  G21K5/04 ,  H01J2237/3174 ,  H05H6/00 ,  Y10T29/49 ,  Y10T29/49002 ,  Y10T436/11

Abstract: Methods and apparatus for producing small, bright nanometric light sources from apertures that are smaller than the wavelength of the emitted light. Light 437 is directed at a surface layer 435 of metal onto a light barrier structure that includes one or more apertures each of which directs a small spot of light onto a target. The incident light excites surface plasmons 452 "electron density fluctuations" in the top metal surface layer and this energy couples through the apertures to the opposing surface where it is emitted as light from the apertures of from the rims of the apertures. Means are employed to prevent or severely limit the extent to which surface plasmons are induced on the surface at the aperture exit, thereby constraining the resulting emissions to small target areas. The resulting small spot illunination may be used to increase the resolution, photolithographic processes, and storage capacity of microscopes.

Abstract translation: 用于从小于发射光的波长的孔产生小的，明亮的纳米光源的方法和装置。 光437被引导到金属的表面层435到包括一个或多个孔的光阻挡结构，每个孔将小的光斑引导到靶上。 入射光激发顶部金属表面层中的表面等离子体激元452“电子密度波动”，并且该能量通过孔耦合到相对表面，在该相对表面处，其作为光从孔的边缘的光发射。 采用手段来防止或严重限制在孔口处的表面上诱导表面等离子体激元的程度，从而将所得到的排放物约束到小目标区域。 所产生的小点染色可用于增加显微镜的分辨率，光刻工艺和存储容量。

公开(公告)号：WO2007081913A3

公开(公告)日：2007-07-19

申请号：PCT/US2007/000458

申请日：2007-01-05

Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE ,  STARK, Peter, Randolph, Hazard

Inventor： STARK, Peter, Randolph, Hazard

IPC: G02B5/18 ,  G02B21/00 ,  G03F7/20 ,  G11B7/125 ,  G11B7/135 ,  G12B21/06

Abstract: Methods and apparatus in which a plurality of independently controllable surface emitting lasers (SELs) are controlled to generate radiation that irradiates a plurality of surface plasmon enhanced illumination (SPEI) apparatus. The irradiated SPEI apparatus in turn generate surface plasmon enhanced radiation that may be employed for a variety of applications, including maskless (i.e., "direct write") photolithography techniques in which a photoresist is exposed to individually controllable beams of surface plasmon enhanced radiation.

公开(公告)号：WO2007081913A2

公开(公告)日：2007-07-19

申请号：PCT/US2007000458

申请日：2007-01-05

Applicant: HARVARD COLLEGE ,  STARK PETER RANDOLPH HAZARD

Inventor： STARK PETER RANDOLPH HAZARD

IPC: G01Q60/22

CPC classification number: G02B5/008 ,  G01Q60/22 ,  G02B6/1226 ,  G02B21/0072 ,  G02F2203/12 ,  G03F7/70383 ,  H01S5/18305 ,  H01S5/18388 ,  H01S5/423

Abstract: Methods and apparatus in which a plurality of independently controllable surface emitting lasers (SELs) are controlled to generate radiation that irradiates a plurality of surface plasmon enhanced illumination (SPEI) apparatus. The irradiated SPEI apparatus in turn generate surface plasmon enhanced radiation that may be employed for a variety of applications, including maskless (i.e., "direct write") photolithography techniques in which a photoresist is exposed to individually controllable beams of surface plasmon enhanced radiation.

Abstract translation: 其中控制多个可独立控制的表面发射激光器（SEL）以产生照射多个表面等离子体增强照明（SPEI）设备的辐射的方法和装置。 照射的SPEI装置又产生表面等离子体增强辐射，其可用于包括无掩模（即“直接写入”）光刻技术的各种应用，其中光致抗蚀剂暴露于表面等离子体增强辐射的独立可控光束。