METHOD OF STRESS INDUCED CLEAVING OF SEMICONDUCTOR DEVICES
    2.
    发明申请
    METHOD OF STRESS INDUCED CLEAVING OF SEMICONDUCTOR DEVICES 审中-公开
    应力诱导半导体器件的清除方法

    公开(公告)号:WO2015077612A1

    公开(公告)日:2015-05-28

    申请号:PCT/US2014/066899

    申请日:2014-11-21

    Abstract: A method of dicing semiconductor devices includes depositing a continuous first layer over the substrate, such that the first layer imparts a compressive stress to the substrate, and etching grooves in the first layer to increase local stress at the grooves compared to stress at the remainder of the first layer located over the substrate. The method also includes generating a pattern of defects in the substrate with a laser beam, such that a location of the defects in the pattern of defects substantially corresponds to a location of at least some of the grooves in the in the first layer, and applying pressure to the substrate to dice the substrate along the grooves.

    Abstract translation: 一种切割半导体器件的方法包括在衬底上沉积连续的第一层,使得第一层向衬底施加压缩应力,并且在第一层中蚀刻凹槽以增加沟槽处的局部应力,与其余部分的应力相比 第一层位于衬底上。 该方法还包括用激光束产生衬底中的缺陷图案,使得缺陷图案中的缺陷位置基本上对应于第一层中的至少一些凹槽的位置,以及施加 对基板的压力沿着凹槽切割基板。

    MONOLITHIC IMAGE CHIP FOR NEAR-TO-EYE DISPLAY
    3.
    发明申请
    MONOLITHIC IMAGE CHIP FOR NEAR-TO-EYE DISPLAY 审中-公开
    用于近视眼显示的单片图像芯片

    公开(公告)号:WO2016049507A1

    公开(公告)日:2016-03-31

    申请号:PCT/US2015/052318

    申请日:2015-09-25

    Abstract: A set of light emitting devices can be formed on a substrate. A growth mask having a first aperture in a first area and a second aperture in a second area is formed on a substrate. A first nanowire and a second nanowire are formed in the first and second apertures, respectively. The first nanowire includes a first active region having a first band gap and a second active region having a second band gap. The first band gap is greater than the second band gap. The second nanowire includes an active region having the first band gap and does not include, or is adjoined to, any material having the second band gap.

    Abstract translation: 可以在基板上形成一组发光器件。 在衬底上形成具有第一区域中的第一孔和第二区域中的第二孔的生长掩模。 分别在第一和第二孔中形成第一纳米线和第二纳米线。 第一纳米线包括具有第一带隙的第一有源区和具有第二带隙的第二有源区。 第一带隙大于第二带隙。 第二纳米线包括具有第一带隙的有源区,并且不包括或邻接具有第二带隙的任何材料。

    LASER LIFT-OFF ON ISOLATED III-NITRIDE LIGHT ISLANDS FOR INTER-SUBSTRATE LED TRANSFER
    6.
    发明申请
    LASER LIFT-OFF ON ISOLATED III-NITRIDE LIGHT ISLANDS FOR INTER-SUBSTRATE LED TRANSFER 审中-公开
    在隔离的III-氮化物灯岛上激光提升以实现基板间的LED传输

    公开(公告)号:WO2017099905A1

    公开(公告)日:2017-06-15

    申请号:PCT/US2016/059736

    申请日:2016-10-31

    Applicant: GLO AB

    Abstract: A laser liftoff process is provided. A device layer can be provided on a transfer substrate. Channels can be formed through the device layer such that devices comprising remaining portions of the device layer are laterally isolated from one another by the channels. The transfer substrate can be bonded to a target substrate through an adhesion layer. Surface portions of the devices can be removed from an interface region between the transfer substrate and the devices by irradiating a laser beam through the transfer substrate onto the devices. The laser irradiation decomposes the III-V compound semiconductor material. The channels provide escape paths for the gaseous products (such as nitrogen gas) that are generated by the laser irradiation. The transfer substrate is separated from a bonded assembly including the target substrate and remaining portions of the devices. The devices can include a III-V compound semiconductor material.

    Abstract translation: 提供激光剥离工艺。 器件层可以设置在转印基板上。 可以穿过器件层形成沟道,使得包括器件层的剩余部分的器件通过沟道彼此横向隔离。 转印基板可以通过粘合层粘合到目标基板。 通过将激光束通过转移衬底照射到器件上,器件的表面部分可以从转移衬底与器件之间的界面区域被去除。 激光照射分解III-V族化合物半导体材料。 通道为激光照射产生的气体产物(如氮气)提供逸出通道。 转印基板与包括目标基板和设备的其余部分的粘合组件分离。 这些器件可以包含III-V族化合物半导体材料。

    USE OF DIELECTRIC FILM TO REDUCE RESISTIVITY OF TRANSPARENT CONDUCTIVE OXIDE IN NANOWIRE LEDS
    8.
    发明申请
    USE OF DIELECTRIC FILM TO REDUCE RESISTIVITY OF TRANSPARENT CONDUCTIVE OXIDE IN NANOWIRE LEDS 审中-公开
    使用电介质膜降低纳米级LED中透明导电氧化物的电阻率

    公开(公告)号:WO2015089123A1

    公开(公告)日:2015-06-18

    申请号:PCT/US2014/069429

    申请日:2014-12-10

    Abstract: Various embodiments include methods of fabricating light emitting diode (LED) devices, such as nanowire LED devices, that include forming a layer of a transparent, electrically conductive material over at least a portion of a non-planar surface of an LED device, and depositing a layer of a dielectric material over at least a portion of the layer of transparent conductive material, wherein depositing the layer of dielectric material comprises at least one of: (a) depositing the layer using a chemical vapor deposition (CVD) process, (b) depositing the layer at a temperature of 200°C or more, and (c) depositing the layer using one or more chemically active precursors for the dielectric material.

    Abstract translation: 各种实施例包括制造诸如纳米线LED器件的发光二极管(LED)器件的方法,其包括在LED器件的非平面表面的至少一部分上形成透明导电材料层,以及沉积 在所述透明导电材料层的至少一部分上的介电材料层,其中沉积所述电介质材料层包括以下至少一个:(a)使用化学气相沉积(CVD)工艺沉积所述层,(b )在200℃或更高的温度下沉积该层,以及(c)使用一种或多种用于电介质材料的化学活性前体沉积该层。

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