METHOD FOR ANNEALING GRANULAR SILICON WITH AGGLOMERATION CONTROL

    公开(公告)号:WO2018140257A1

    公开(公告)日:2018-08-02

    申请号:PCT/US2018/013884

    申请日:2018-01-16

    CPC classification number: C01B33/037 C01P2006/80

    Abstract: This disclosure concerns embodiments of an annealing device and a method for annealing flowable, finely divided solids, such as annealing granular silicon to reduce a hydrogen content of the granular silicon. The annealing device comprises at least one tube through which flowable, finely divided solids are flowed downwardly. The tube includes a heating zone and (i) a residence zone below the heating zone, (ii) a cooling zone below the heating zone, or (iii) a residence zone below the heating zone and a cooling zone below the residence zone. An inert gas is flowed upwardly through the tube. The tube may be constructed from two or more tube segments. The annealing device may include a plurality of tubes arranged and housed within a shell. The annealing device and method are suitable for a continuous process.

    CORROSION AND FOULING REDUCTION IN HYDROCHLOROSILANE PRODUCTION
    2.
    发明申请
    CORROSION AND FOULING REDUCTION IN HYDROCHLOROSILANE PRODUCTION 审中-公开
    腐蚀和降解在水解生产中的应用

    公开(公告)号:WO2014172102A1

    公开(公告)日:2014-10-23

    申请号:PCT/US2014/032714

    申请日:2014-04-02

    CPC classification number: C01B33/1071 Y02E60/324

    Abstract: Methods for reducing iron silicide and/or iron phosphide fouling and/or corrosion in a hydrochlorosilane production plant are disclosed. Sufficient hydrogen is added to a silicon tetrachloride process stream to inhibit iron (II) chloride formation and reduce iron silicide and/or iron phosphide fouling, superheater corrosion, or a combination thereof. Trichlorosilane also may be added to the silicon tetrachloride process stream.

    Abstract translation: 公开了在氢氯硅烷生产设备中还原铁硅化物和/或磷化铁结垢和/或腐蚀的方法。 向四氯化硅工艺流中加入足够的氢以抑制氯化铁(II)的形成并减少铁硅化物和/或磷化铁结垢,过热器腐蚀或其组合。 也可以在四氯化硅工艺流中加入三氯硅烷。

    CONTROL OF SILICON OXIDE OFF-GAS TO PREVENT FOULING OF GRANULAR SILICON ANNEALING SYSTEM

    公开(公告)号:WO2018140259A8

    公开(公告)日:2018-08-02

    申请号:PCT/US2018/013890

    申请日:2018-01-16

    Abstract: This disclosure concerns embodiments of an annealing device and a method for annealing granular silicon to reduce a hydrogen content of the granular silicon. The annealing device comprises at least one tube through which granular silicon is flowed downwardly. The tube includes a heating zone and (i) a residence zone below the heating zone, (ii) a cooling zone below the heating zone, or (iii) a residence zone below the heating zone and a cooling zone below the residence zone. An inert gas is flowed upwardly through the tube. The tube may be constructed from two or more tube segments. The annealing device may include a plurality of tubes arranged in parallel and housed within a shell. The annealing device and method are suitable for a continuous process.

    FOULING REDUCTION IN HYDROCHLOROSILANE PRODUCTION
    4.
    发明申请
    FOULING REDUCTION IN HYDROCHLOROSILANE PRODUCTION 审中-公开
    氟氯硅烷生产中的还原

    公开(公告)号:WO2013059686A1

    公开(公告)日:2013-04-25

    申请号:PCT/US2012/061150

    申请日:2012-10-19

    CPC classification number: C01B33/1071 C01B33/10731 C01B33/10778

    Abstract: Embodiments of a method for reducing iron silicide and/or iron phosphide fouling and/or corrosion in a hydrochlorosilane production plant are disclosed. Sufficient trichlorosilane is included in a silicon tetrachloride process stream to minimize hydrogen chloride formation, thereby inhibiting iron (II) chloride formation and reducing iron silicide and/or iron phosphide fouling, superheater corrosion, or a combination thereof.

    Abstract translation: 公开了用于减少氢氯硅烷生产设备中的硅化铁和/或磷化铁结垢和/或腐蚀的方法的实施方案。 在四氯化硅工艺流中包含足够的三氯硅烷以使氯化氢形成最小化,从而抑制氯化铁(II)的形成并减少硅化铁和/或磷化铁结垢,过热器腐蚀或其组合。

    SYSTEM FOR REDUCING AGGLOMERATION DURING ANNEALING OF FLOWABLE, FINELY DIVIDED SOLIDS

    公开(公告)号:WO2018140258A1

    公开(公告)日:2018-08-02

    申请号:PCT/US2018/013888

    申请日:2018-01-16

    Abstract: This disclosure concerns embodiments of an annealing device and a method for annealing flowable, finely divided solids, such as annealing granular silicon to reduce a hydrogen content of the granular silicon. The annealing device comprises at least one tube through which flowable, finely divided solids are flowed downwardly. The tube includes a heating zone and (i) a residence zone below the heating zone, (ii) a cooling zone below the heating zone, or (iii) a residence zone below the heating zone and a cooling zone below the residence zone. An inert gas is flowed upwardly through the tube. The tube may be constructed from two or more tube segments. The annealing device may include a plurality of tubes arranged and housed within a shell. The annealing device and method are suitable for a continuous process.

    SEGMENTED TUBES USED IN ANNEALING OF HIGH PURITY SILICON GRANULES

    公开(公告)号:WO2018140260A8

    公开(公告)日:2018-08-02

    申请号:PCT/US2018/013891

    申请日:2018-01-16

    Abstract: This disclosure concerns embodiments of an annealing device and a method for annealing granular silicon to reduce a hydrogen content of the granular silicon. The annealing device comprises at least one tube through which granular silicon is flowed downwardly. The tube includes a heating zone and (i) a residence zone below the heating zone, (ii) a cooling zone below the heating zone, or (iii) a residence zone below the heating zone and a cooling zone below the residence zone. An inert gas is flowed upwardly through the tube. The tube may be constructed from two or more tube segments. The annealing device may include a plurality of tubes arranged in parallel and housed within a shell. The annealing device and method are suitable for a continuous process.

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