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    STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND IMAGE PICKUP APPARATUS INCLUDING THE STRUCTURE
    1.
    发明申请
    STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND IMAGE PICKUP APPARATUS INCLUDING THE STRUCTURE 审中-公开
    结构，制造方法及包括结构在内的图像拾取装置

    公开(公告)号：WO2013024562A1

    公开(公告)日：2013-02-21

    申请号：PCT/JP2012/004476

    申请日：2012-07-11

    申请人： CANON KABUSHIKI KAISHA ,  TESHIMA, Takayuki ,  SETOMOTO, Yutaka

    发明人： TESHIMA, Takayuki ,  SETOMOTO, Yutaka

    IPC分类号： G21K1/06

    CPC分类号： G01T1/16 ,  C23C28/32 ,  G21K1/06 ,  G21K2201/067

    摘要： The present invention relates to a method for manufacturing a structure, including the steps of forming a recessed section in a first surface of a substrate (1); filling the recessed section with metal (3) to form a metal structure; exposing the metal structure from the substrate; and applying resin (20) onto the exposed metal structure and solidifying the resin to form a resin layer.

    摘要翻译： 本发明涉及一种用于制造结构的方法，包括在衬底（1）的第一表面中形成凹陷部分的步骤; 用金属（3）填充凹部以形成金属结构; 使金属结构从衬底露出; 并将树脂（20）施加到暴露的金属结构上并固化树脂以形成树脂层。

    CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
    2.
    发明申请
    CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME 审中-公开
    充电颗粒光束和曝光装置使用它

    公开(公告)号：WO2012124324A1

    公开(公告)日：2012-09-20

    申请号：PCT/JP2012/001781

    申请日：2012-03-14

    申请人： CANON KABUSHIKI KAISHA ,  KATO, Takahisa ,  SETOMOTO, Yutaka

    发明人： KATO, Takahisa ,  SETOMOTO, Yutaka

    IPC分类号： H01J37/12 ,  H01J37/317

    CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207

    摘要： An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are each larger than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.

    摘要翻译： 静电带电粒子束透镜包括：电极，其包括平板，该平板具有沿光轴方向延伸的法线的第一表面和与该第一表面相对的第二表面，该电极具有从第一表面延伸的通孔 表面到第二表面。 当开口横截面被定义为沿着垂直于法线的平面截取的通孔的横截面，并且代表性直径被定义为通过对开口横截面进行回归分析而获得的圆的直径时，代表 在第一表面侧的第一区域中的开口横截面的直径和位于第二表面侧的第二区域中的开口横截面的代表性直径分别大于开口横截面的代表性直径 第三区域，其是设置在第一表面和第二表面之间的电极中的区域。

    STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
    3.
    发明申请
    STRUCTURE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    其制造方法及其制造方法

    公开(公告)号：WO2013035247A2

    公开(公告)日：2013-03-14

    申请号：PCT/JP2012005008

    申请日：2012-08-07

    申请人： CANON KK ,  SETOMOTO YUTAKA ,  TESHIMA TAKAYUKI

    发明人： SETOMOTO YUTAKA ,  TESHIMA TAKAYUKI

    IPC分类号： G21K1/06

    CPC分类号： G01N23/20 ,  A61B6/484 ,  B81B3/0008 ,  B81C1/00952 ,  C25D1/00 ,  G03F7/00 ,  G21K1/025 ,  G21K2207/005

    摘要： A method for manufacturing a structure by using a silicon mold, in which disturbances in arrangement due to charges are reduced, can be provided. The method for manufacturing a structure includes the steps of forming a recessed portion in a silicon substrate, cleaning, drying, or conveying the silicon substrate while charges of a plurality of portions sandwiched between the recessed portion are removed, and filling a metal into the recessed portion of the silicon substrate subjected to the cleaning, drying, or conveying.

    摘要翻译： 可以提供通过使用其中减少由于电荷导致的布置的干扰的硅模制造结构的方法。 制造结构的方法包括以下步骤：在硅衬底中形成凹陷部分，清洁，干燥或输送硅衬底，同时去除夹在凹部之间的多个部分的电荷，并将金属填充到凹陷 经过清洗，干燥或输送的硅衬底部分。

    CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
    4.
    发明申请
    CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME 审中-公开
    充电颗粒光束和曝光装置使用它

    公开(公告)号：WO2012124319A1

    公开(公告)日：2012-09-20

    申请号：PCT/JP2012/001773

    申请日：2012-03-14

    申请人： CANON KABUSHIKI KAISHA ,  KATO, Takahisa ,  SETOMOTO, Yutaka

    发明人： KATO, Takahisa ,  SETOMOTO, Yutaka

    IPC分类号： H01J37/12

    CPC分类号： H01J37/12 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207 ,  H01J2237/31774

    摘要： An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are smaller than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.

    摘要翻译： 静电带电粒子束透镜包括：电极，其包括平板，该平板具有沿光轴方向延伸的法线的第一表面和与该第一表面相对的第二表面，该电极具有从第一表面延伸的通孔 表面到第二表面。 当开口横截面被定义为沿着垂直于法线的平面截取的通孔的横截面，并且代表性直径被定义为通过对开口横截面进行回归分析而获得的圆的直径时，代表 在第一表面侧的第一区域中的开口横截面的直径和位于第二表面侧的第二区域中的开口横截面的代表性直径小于开口横截面的代表性直径 第三区域，其是设置在第一表面和第二表面之间的电极中的区域。

    METHOD FOR FILLING THROUGH HOLE OF SUBSTRATE WITH METAL AND SUBSTRATE
    5.
    发明申请
    METHOD FOR FILLING THROUGH HOLE OF SUBSTRATE WITH METAL AND SUBSTRATE 审中-公开
    用于通过金属和基材填充基板的孔的方法

    公开(公告)号：WO2012011230A1

    公开(公告)日：2012-01-26

    申请号：PCT/JP2011/003811

    申请日：2011-07-04

    申请人： CANON KABUSHIKI KAISHA ,  TESHIMA, Takayuki ,  SETOMOTO, Yutaka

    发明人： TESHIMA, Takayuki ,  SETOMOTO, Yutaka

    IPC分类号： H05K3/42 ,  H01L21/48 ,  H05K1/03

    CPC分类号： H05K3/107 ,  H01L21/486 ,  H01L21/6835 ,  H01L21/76898 ,  H01L23/49827 ,  H01L2924/0002 ,  H05K1/0306 ,  H05K1/115 ,  H05K3/424 ,  H05K2201/0959 ,  H01L2924/00

    摘要： The present invention relates to a method for filling a through hole (5) of a substrate (2) with a metal. The method includes a step of preparing a bonded substrate including a first substrate (1) having conductivity in at least a surface thereof and a second substrate (2) having a through hole (5), both substrates being bonded to each other through a nonionic surfactant (4); a step of exposing, in the bonded surface of the bonded substrate, the conductive surface of the first substrate, which is positioned at the bottom of the through hole, by removing the nonionic surfactant positioned at the bottom of the through hole of the second substrate; and a step of filling the through hole with a metal by applying an electric field to the conductive surface of the first substrate.

    摘要翻译： 本发明涉及一种用金属填充基板（2）的通孔（5）的方法。 该方法包括制备包括至少在其表面具有导电性的第一衬底（1）和具有通孔（5）的第二衬底（2）的键合衬底的步骤，两个衬底通过非离子表面 表面活性剂（4）; 通过去除位于第二基板的通孔底部的非离子型表面活性剂，在接合基板的接合表面露出位于通孔底部的第一基板的导电表面的步骤 ; 以及通过向第一基板的导电表面施加电场而用金属填充通孔的步骤。

    CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
    7.
    发明申请
    CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME 审中-公开
    充电颗粒光束和曝光装置使用它

    公开(公告)号：WO2012124322A1

    公开(公告)日：2012-09-20

    申请号：PCT/JP2012/001779

    申请日：2012-03-14

    申请人： CANON KABUSHIKI KAISHA ,  KATO, Takahisa ,  SETOMOTO, Yutaka

    发明人： KATO, Takahisa ,  SETOMOTO, Yutaka

    IPC分类号： H01J37/12

    CPC分类号： G21K1/087 ,  H01J37/12 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207 ,  H01J2237/31774

    摘要： An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. A circularity in a first region that is on the first surface side and a circularity in a second region that is on the second surface side are each better than a circularity in a third region that is a region in the electrode disposed between the first surface and the second surface.

    摘要翻译： 静电带电粒子束透镜包括：电极，其包括平板，该平板具有沿光轴方向延伸的法线的第一表面和与该第一表面相对的第二表面，该电极具有从第一表面延伸的通孔 表面到第二表面。 位于第一表面侧的第一区域中的圆形度和位于第二表面侧的第二区域中的圆形度在第三区域中优于圆形度，该第三区域是设置在第一表面和第二表面之间的电极中的区域 第二个表面。

    METHOD FOR MANUFACTURING CHARGED PARTICLE BEAM LENS
    9.
    发明申请
    METHOD FOR MANUFACTURING CHARGED PARTICLE BEAM LENS 审中-公开
    制造充电颗粒光束镜的方法

    公开(公告)号：WO2012124318A1

    公开(公告)日：2012-09-20

    申请号：PCT/JP2012/001771

    申请日：2012-03-14

    申请人： CANON KABUSHIKI KAISHA ,  SETOMOTO, Yutaka ,  KATO, Takahisa

    发明人： SETOMOTO, Yutaka ,  KATO, Takahisa

    IPC分类号： H01J37/12 ,  H01L21/00

    CPC分类号： H05K3/4679 ,  H01J37/12 ,  H01J2237/0437 ,  H01J2237/04924 ,  H01J2237/1205 ,  Y10T29/49165

    摘要： There is provided a method for manufacturing a charged particle beam lens having a bonded electrode obtained by bonding at least a first conductive substrate having a first through-hole and a second conductive substrate having a second through-hole. The above method includes: forming the first through-hole in the first conductive substrate; forming the second through-hole in the second conductive substrate; and bonding the first conductive substrate and the second conductive substrate so that the first through-hole and the second through-hole communicate with each other.

    摘要翻译： 提供了一种制造带电粒子束透镜的方法，该方法具有通过将至少具有第一通孔的第一导电基板和具有第二通孔的第二导电基板结合而获得的接合电极。 上述方法包括：在第一导电衬底中形成第一通孔; 在第二导电衬底中形成第二通孔; 并且将第一导电基板和第二导电基板接合，使得第一通孔和第二通孔彼此连通。