Abstract:
A system (10) for inhibiting the transport of contaminant particles (60) with an ion beam (44) includes a pair of electrodes (14, 16) that provide opposite electric fields (26, 28, 30, 32) through which the ion beam (44) travels. A particle (60) entrained in the ion beam (44) is charged to a polarity matching the polarity of ion beam (44) when traveling through a first of the electric fields (26, 28). The downstream electrode (16) provides another electric field (30, 32) for repelling the positively charged particle (60) away from the direction of beam travel.
Abstract:
A two-dimensional substantially quadrupole field is provided. The field comprises a quadrupole harmonic of amplitude A2 and an octopole harmonic of amplitude A4, wherein A4 is greater than 0.01 % of A2, A4 is less than 5% of A2, and, for any other higher order harmonic with amplitude An present in the field, n being any integer greater than 2 except 4, A4 is greater than ten times An.
Abstract:
L'invention concerne un dispositif (2) de génération d'un faisceau d'ions (4), comprenant un support (6), une source d'ions (18), cette source d'ions comportant une extrémité inférieure (8) reliée au support (6) et une extrémité supérieure (10), à l'opposé de l'extrémité inférieure (8), et un moyen (12) d'extraction des ions émis par la source, ce moyen d'extraction (12) comprenant une paroi (14) munie d'une ouverture (16), l'ouverture (16) étant agencé à proximité de l'extrémité supérieure (10) de la source d'ions (18), afin de permettre le passage des ions extraits à travers cette ouverture. Ce dispositif (2) comprend en outre un moyen (M1, M2) de génération d'un champ magnétique (B) apte à générer un champ magnétique au niveau de l'ouverture (16) du moyen d'extraction, le champ magnétique généré (B) étant apte à dévier des particules chargées (20) attirées par la source d'ions de manière à ce que ces particules chargées n'atteignent pas la source d'ions.
Abstract:
A method for purifying particles generates charged particles from a sample, measures at least at least one of masses, charge magnitudes and mobilities of the generated charged particles, and selectively passes to a particle collection target each of the measured charged particles having at least one of (a) a measured mass equal to a selected mass or within a selected range of particle masses, (b) a measured charge magnitude equal to a selected charge magnitude or within a selected range of charge magnitudes, (c) a mass-to-charge ratio equal to a selected mass-to-charge ratio or within a selected range of mass-to-charge ratios, and (d) a measured mobility equal to a selected mobility or within a selected range of mobilities. In some embodiments, the collected particles may be harvested and amplified.
Abstract:
Systems and methods for debris mitigation in an EUV light source for semiconductor processes are disclosed. Pulsed DC electric fields are applied to the path of EUV light to reject ions from the EUV path. The pulsed DC fields are triggered to coincide with the presence of debris in the EUV optical path. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Abstract:
The invention relates to an electron gun 100 for use in a cathode ray tube. The electron gun 100 has an electron source 10, a body 20 with a transmission cavity 25 of which the wall 28 is at least partly coated with an electrical insulator for the emission of secondary electrons, and an electrode 30 for applying a first electric field between the entrance 26 and the exit 27 of the cavity. The electron gun is characterized in that it comprises means for preventing the travelling of positive ions, which are formed by collisions of electrons that have exited from the cavity 25, in reverse direction along the same path as the electrons and colliding with the module 20. Such collisions can damage the cavity exit 27 or the electrical insulator on the wall 28. This is undesirable because the current density of the electron beam 101 exiting from the cavity 25 will deteriorate.
Abstract:
A system for inhibiting the transport of contaminant particles with an ion beam includes an electric field generator (12, 14) for generating an electric field (28) relative to a path of travel (20) for the ion beam (16). A particle (66) located in the ion beam (16) and in a region of the electric field (28) is charged to a polarity according to the ion beam (16), so that the electric field (28) may urge the charged particle (66) out of the ion beam (16).
Abstract:
Various disclosed embodiments include elements for mitigating electron reflection in a vacuum electronic device, vacuum electronic devices that incorporate elements for mitigating electron reflection, and methods of fabricating elements for reducing reflection of electrons off an electrode. An illustrative electrode assembly includes an electrode. Elements are configured to reduce reflection of electrons off the electrode.
Abstract:
A device including a first surface, a second surface and a controller. The first and the second surfaces define a first ion channel therebetween. The second surface includes a first plurality of electrodes with a first electrode and a second electrode spaced apart, and configured to receive a first voltage signal and generate a pseudopotential that inhibits ions in the first ion channel from approaching the second surface. A second plurality of electrodes is located between the first electrode and the second electrode and are configured to receive a second voltage signal to generate a first travelling drive potential that is configured to guide ions along the first ion channel. The controller is configured to generate the first voltage signal and the second voltage signal.
Abstract:
Ion trap apparatus and methods for efficiently addressing the effects of charge space caused by ion trap overfilling, useful in linear ion traps of mass spectrometers.