公开(公告)号：WO2023088565A1

公开(公告)日：2023-05-25

申请号：PCT/EP2021/082343

申请日：2021-11-19

Applicant: COMET HOLDING AG

Inventor： RIEDO, Adrian

IPC: H01J35/06 ,  H01J35/20

Abstract: The present invention concerns an X-ray tube (100) comprising a vacuum-sealed tube housing (10) evacuated to a pressure of 10-7 mbar or lower, a cathode assembly (40) inside the housing comprising an electron emitter (50) adapted to emit electrons when heated at a temperature comprised in a defined working temperature range and at least one component (42, 44, 48) containing carbon in an amount of at least 20% by weight, especially at least 30% by weight, even more especially at least 50% by weight, the at least one component being preferably designed for holding the emitter, and an anode assembly (30) inside the housing comprising a target layer (34) for receiving electrons emitted by the electron emitter (50), wherein the electron emitter preferably comprises boride, preferably lanthanum hexaboride (LaB6), and wherein the cathode assembly is designed such that if the emitter temperature is comprised in the working temperature range.

公开(公告)号：WO01095362A1

公开(公告)日：2001-12-13

申请号：PCT/US2001/018680

申请日：2001-06-07

IPC: G21K1/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/06 ,  H05H1/24 ,  H01J35/20

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber (10). The chamber (10) contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 pi steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at 2000 Hz or greater. Gas flows in the vacuum chamber are controlled to assure desired concentration of active gas in the discharge region and to minimize active gas concentration in the beam path downstream of the pinch region. In a preferred embodiment, active gas is injected downstream of the pinch region through a nozzle (2) and exhausted axially through an exhaust port (3) in the center of the anode. In another preferred embodiment a laserbeam generates metal vapor at a location close to but downstream of the pinch region and the vapor is exhausted axially through the anode.

Abstract translation: 高能光子源。 一对等离子体夹持电极位于真空室（10）中。 室（10）包含工作气体，其包括贵重缓冲气体和选择用于提供所需光谱线的活性气体。 脉冲电源以1000Hz或更大的重复频率提供电脉冲，并且在足够高的电压下在电极之间产生电放电，以在工作气体中产生非常高温度的高密度等离子体夹持，从而在源的光谱线处提供辐射 或活性气体。 描述了第四代单元，其以氙气作为活性气体以2000Hz的重复频率产生20mJ，13.5nm脉冲到2π立体声中。 该单元包括具有对充电电容器组充电的谐振充电器的脉冲电力系统和包括用于产生2000Hz或更大的高电压电脉冲的脉冲变压器的磁性压缩电路。 控制真空室中的气体流动以确保放电区域中活性气体的期望浓度，并使夹持区域下游的光束路径中的活性气体浓度最小化。 在优选实施例中，活性气体通过喷嘴（2）在夹紧区域的下游被注入，并且通过在阳极中心的排气口（3）沿轴向排出。 在另一个优选实施例中，激光束在靠近夹紧区域的下游的位置处产生金属蒸汽，并且蒸汽轴向地通过阳极排出。

公开(公告)号：WO00010643A1

公开(公告)日：2000-03-02

申请号：PCT/US1999/018166

申请日：1999-08-11

IPC: H01J9/39 ,  H01J1/304 ,  H01J7/18 ,  H01J9/02 ,  H01J29/04 ,  H01J29/94 ,  H01J31/12 ,  H01J35/06 ,  H01J35/20 ,  A61N5/10 ,  H01J1/30 ,  H01J35/32

CPC classification number: H01J35/065 ,  H01J1/304 ,  H01J7/18 ,  H01J35/20 ,  H01J2201/30457 ,  H01J2235/205

Abstract: A cathode structure comprising a getter material provided with a diamond film. The getter material may include zirconium, vanadium and iron. Cathode structures may have a substantially rounded configuration including a substantially straight portion. Other cathode structures may have a substantially flat portion, with the diamond film covering essentially the entire flat surface. Methods of manufacturing cathode structures may include conditioning the cathode structure by applying a voltage.

Abstract translation: 一种阴极结构，包括设置有金刚石膜的吸气材料。 吸气材料可以包括锆，钒和铁。 阴极结构可以具有基本上圆形的构造，其包括基本上直的部分。 其他阴极结构可以具有基本上平坦的部分，其中金刚石膜基本上覆盖整个平坦表面。 制造阴极结构的方法可以包括通过施加电压来调节阴极结构。

公开(公告)号：WO2017119717A1

公开(公告)日：2017-07-13

申请号：PCT/KR2017/000102

申请日：2017-01-04

Applicant: 주식회사바텍 ,  (주)바텍이우홀딩스

Inventor： 염경태 ,  임병직

IPC: H01J35/04 ,  H01J35/16 ,  H01J35/20

CPC classification number: H01J35/04 ,  H01J35/16 ,  H01J35/20

Abstract: 금속 전극과 절연 스페이서 사이의 접합부에서 맞대기 접합보다 상대적으로 접합력이 우수한 겹치기 접합이 이루어지고, 진공 브레이징 전에 구성 부품들을 정렬할 때 별도의 지그 없이도 구성 부품들을 정확히 정렬시킬 수 있도록 구성된 전계 방출 엑스선 소스 장치가 개시된다. 본 발명에 따른 전계 방출 엑스선 소스 장치는, 전기 절연성을 띤 튜브형 구조물로서, 그 말단에 근접한 외측면에 길이 방향으로 소정의 폭만큼 메탈라이징 된 접합 외측면을 갖는 절연 스페이서; 및, 상기 절연 스페이서의 말단에 인접하게 배치된 금속 구조물로서, 상기 접합 외측면의 적어도 일부분과 중첩되게 브레이징 접합된 접합 밴드부를 갖는 금속 전극;을 포함한다.

Abstract translation:

金属电极与电介质相对接合强度在间隔之间，并且对准之前的真空钎焊精确地对准的部件，而不需要夹具的部件的联合比所述对接接头制成优良搭接接头 提供场发射X射线源装置。 的场致发射X射线源的装置，充有电绝缘性的管状结构，具有预定外金属化接合侧作为外表面接近所述终端根据本发明的纵向方向上的宽度的绝缘衬垫; 并且金属电极设置在绝缘间隔物的一端附近，金属电极具有钎焊的接合带部分，以与接合部的外表面的至少一部分重叠。

公开(公告)号：WO2008047267A2

公开(公告)日：2008-04-24

申请号：PCT/IB2007054121

申请日：2007-10-10

Applicant: PHILIPS INTELLECTUAL PROPERTY ,  KONINKL PHILIPS ELECTRONICS NV ,  HAUTTMANN STEFAN

Inventor： HAUTTMANN STEFAN

IPC: H01J35/04 ,  H01H1/48 ,  H01J3/26 ,  H01J7/18 ,  H01J35/20

CPC classification number: H01J35/04 ,  H01J7/18 ,  H01J35/20 ,  H01J41/12 ,  H01J2235/205

Abstract: It is described an X-ray tube (100) comprising an ion manipulation arrangement (140) having at least one ion collector electrode (141). The ion collector electrode (141) is made at least partially from a getter material. The ion manipulation arrangement (140) is in particular beneficial for high-end X-ray-tubes including an electrical field-free region (131). The ion manipulation arrangement (140) produces an electrical field, which deflects ions (150). When impinging onto the getter electrode (141) the ions (150) are permanently collected and thus removed from the interior of an evacuated envelope of the X-ray tube (100). This avoids ion bombardment on an electron emitter (111) of the X-ray tube (100). Additionally the arcing rate caused by residual gas can be reduced significantly. A heating of the getter material may be realized with heating wires or by a defined bombardment of scattered electrons (322) onto the electrodes (341, 342) comprising the getter material.

Abstract translation: 描述了包括具有至少一个离子收集器电极（141）的离子操纵装置（140）的X射线管（100）。 离子收集器电极（141）至少部分由吸气材料制成。 离子操纵装置（140）对于包括无电场区域（131）的高端X射线管特别有利。 离子操作装置（140）产生偏转离子（150）的电场。 当撞击到吸气剂电极（141）上时，离子（150）被永久收集并因此从X射线管（100）的真空外壳的内部移除。 这避免了X射线管（100）的电子发射器（111）上的离子轰击。 此外，由残余气体引起的电弧放电率可以显着降低。 吸气材料的加热可以用加热丝或者通过将散射电子（322）限定在包括吸气材料的电极（341,342）上的方式来实现。

公开(公告)号：WO2006020080A3

公开(公告)日：2007-04-05

申请号：PCT/US2005025232

申请日：2005-07-15

Applicant: CYMER INC ,  ERSHOV ALEXANDER I ,  MARX WILLIAM F ,  BOWERING NORBERT R ,  HANSSON BJORN A M ,  KHODYKIN OLEH ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N

Inventor： ERSHOV ALEXANDER I ,  MARX WILLIAM F ,  BOWERING NORBERT R ,  HANSSON BJORN A M ,  KHODYKIN OLEH ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N

IPC: C25F1/00 ,  G03F7/20 ,  G21K5/10 ,  H01J35/20

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract translation: 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：WO2006093687A1

公开(公告)日：2006-09-08

申请号：PCT/US2006/005541

申请日：2006-02-17

Applicant: CYMER, INC. ,  ALGOTS, John, Martin ,  HEMBERG, Oscar ,  CHUNG, Tae, H.

Inventor： ALGOTS, John, Martin ,  HEMBERG, Oscar ,  CHUNG, Tae, H.

IPC: H01J35/20 ,  G21K5/10

CPC classification number: H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having droplet generator plasma source material reservoir (212) in fluid communication with a droplet formation capillary and maintained within a selected range of temperatures sufficient to keep the plasma source material in a liquid form; a plasma source material supply system having a supply reservoir (214) in fluid communication with the droplet generator plasma source material reservoir and holding at least a replenishing amount of plasma source material in liquid form for transfer to the droplet generator plasma source material reservoir, while the droplet generator is on line; a transfer mechanism (210) transferring liquid plasma source material from the supply reservoir to the droplet generator plasma source material reservoir, while the droplet generator is on line. The supply reservoir may comprise a solid form of the plasma source material used to periodically form from a portion of the material in solid form the material in liquid form.

Abstract translation: 公开了一种EUV光源等离子体源材料处理系统和方法，其可以包括具有与液滴形成毛细管流体连通的液滴发生器等离子体源材料储存器（212）的液滴发生器，并保持在足以保持等离子体的温度的选定范围内 液体形式的原料; 等离子体源材料供应系统，其具有与液滴发生器等离子体源材料储存器流体连通的供给储存器（214），并且至少保持液体形式的补充量的等离子体源材料以转移到液滴发生器等离子体源材料储存器，同时 液滴发生器在线; 当液滴发生器在线时，传送机构（210）将液体等离子体源材料从供应储存器传送到液滴发生器等离子体源材料储存器。 供应储存器可以包括固体形式的等离子体源材料，其用于从液体形式的固体形式的固体形式的一部分周期性地形成。

公开(公告)号：WO01099143A1

公开(公告)日：2001-12-27

申请号：PCT/US2001/018758

申请日：2001-06-07

IPC: G03F7/20 ,  H05G2/00 ,  H05H1/06 ,  H01J35/20

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

Abstract: A high energy photon source. A pair of plasma pinch electrodes forming a plasma pinch source (46) are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 pi steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system (404) having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer (406) for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.

Abstract translation: 高能光子源。 形成等离子体夹紧源（46）的一对等离子体夹持电极位于真空室中。 该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源以1000Hz或更大的重复频率提供电脉冲，并且在足够高的电压下产生电极之间的放电，以在工作气体中产生非常高温度的高密度等离子体夹持，从而在源的光谱线处提供辐射 或活性气体。 描述了第四代单元，其以氙气作为活性气体以2000Hz的重复频率产生20mJ，13.5nm脉冲到2π立体声中。 该单元包括具有对充电电容器组充电的谐振充电器的脉冲电力系统（404）和包括脉冲变压器（406）的磁性压缩电路，该脉冲变压器用于以2000Hz或更大的重复频率产生高电压电脉冲。

公开(公告)号：WO99034395A1

公开(公告)日：1999-07-08

申请号：PCT/US1998/027522

申请日：1998-12-28

IPC: H01J35/20 ,  G01J3/10 ,  G03F7/20 ,  H01J61/12 ,  H01J61/28 ,  H01J61/30 ,  H05G2/00

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G01J3/10 ,  G03F7/70016 ,  G03F7/70033 ,  G03F7/70916 ,  G03F7/70983 ,  H01J61/12 ,  H01J61/28 ,  H01J61/30 ,  H05G2/005

Abstract: A capillary discharge extreme ultraviolet lamp source apparatus and method for extreme ultraviolet microlithography. The capillary source includes a lamp body (306); a bore having electrodes (300), insulators (302) and a discharge plasma region (304).

Abstract translation: 一种用于极紫外微光刻的毛细管放电极紫外灯源装置和方法。 毛细管源包括灯体（306）; 具有电极（300），绝缘体（302）和放电等离子体区域（304）的孔。

公开(公告)号：WO2011118883A1

公开(公告)日：2011-09-29

申请号：PCT/KR2010/004174

申请日：2010-06-28

Applicant: 주식회사 엑스엘 ,  박래준

Inventor： 박래준

IPC: H01J35/20

CPC classification number: H01J35/20 ,  H01J35/10 ,  H01J35/14 ,  H01J35/18 ,  H01J2235/205

Abstract: 본 발명은 진공 유지를 위해 비확산 게터를 이용한 엑스선관에 관한 것으로서, 비확산 게터를 엑스선관 내부에 장착하여 엑스선관 작동시 정격전력을 즉시 인가하여도 필라멘트 및 음극 집속관에서 발생되는 가스와 타겟에서 발생되는 가스가 상존하는 잔류가스에 부가 되더라도 고압전원이 인가되는 순간부터 시작해서 인가되고 있는 동안 가스흡착이 충분히 발휘되어 안정적으로 성능 및 기능이 유지되는 비확산 게터가 장착된 고정양극 엑스선관 및 회전양극 엑스선관의 구조를 제공한다.

Abstract translation: 本发明涉及使用非蒸发性吸气剂以维持真空的X射线管，并提供具有不可蒸发的吸气剂的固定阳极X射线管和旋转阳极X射线管的结构。 由于不可蒸发的吸气剂包括在X射线管中，虽然在X射线管的操作上立即施加额定功率，因此尽管在灯丝和阴极聚焦管中产生的气体和由 将目标添加到现有气体中，在施加高压电源的时刻开始施加高压电源，实现足够量的气体吸附以稳定地保持其性能和功能。