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    METHOD FOR DETECTING METHYLATED CYTOSINE BY USING BISULFITE REACTION
    32.
    发明公开
    METHOD FOR DETECTING METHYLATED CYTOSINE BY USING BISULFITE REACTION 有权
    VERFAHREN ZUM NACHWEIS冯甲基胞苷胞蛋白双歧杆菌

    公开(公告)号：EP2799541A4

    公开(公告)日：2015-07-29

    申请号：EP12858295

    申请日：2012-12-10

    申请人： WAKO PURE CHEM IND LTD

    发明人： HAYASHIDA YUKINOBU ,  YAMAMOTO NAOYUKI

    IPC分类号： C12Q1/68 ,  C12N15/09

    CPC分类号： C12Q1/6858 ,  C12Q1/6806 ,  C12Q1/6827 ,  C12Q2523/125 ,  C12Q2527/125

    摘要： It is an object of the present invention to provide a method for converting non-methylated cytosine in a single-stranded DNA into uracil by a novel bisulfite reaction with higher conversion efficiency from non-methylated cytosine into uracil as compared with the conventional bisulfite method, a method for amplifying the single-stranded DNA in which non-methylated cytosine has been converted into uracil, and a method for detecting methylated cytosine in the single-stranded DNA. The present invention relates to (1) a method for converting non-methylated cytosine in a single-stranded DNA into uracil, comprising subjecting the single-stranded DNA to bisulfite reaction under the presence of at least one of compounds shown by the above-described general formula [1] to [8]; (2) a method for amplifying single-stranded DNA in which non-methylated cytosine has been converted into uracil, comprising further subjecting the single-stranded DNA after bisulfite reaction of (1) to PCR reaction; and (3) a method for detecting methylated cytosine in the aforementioned single-stranded DNA, comprising subjecting the single-stranded DNA amplified in (2) to nucleotide sequence analysis,

    摘要翻译： 本发明的目的是提供一种通过与常规亚硫酸氢盐方法相比，通过新的亚硫酸氢盐反应将非甲基化胞嘧啶转化成尿嘧啶的方法，其具有较高的转化效率，从非甲基化胞嘧啶转化为尿嘧啶， 用于扩增其中非甲基化胞嘧啶已经转化成尿嘧啶的单链DNA的方法以及在单链DNA中检测甲基化胞嘧啶的方法。 本发明涉及（1）将单链DNA中的非甲基化胞嘧啶转化成尿嘧啶的方法，其包括在至少一种上述化合物存在下使单链DNA进行亚硫酸氢盐反应 通式[1]〜[8]; （2）扩增其中非甲基化胞嘧啶已经转化成尿嘧啶的单链DNA的方法，其还包括在（1）的亚硫酸氢盐反应之后对单链DNA进行PCR反应; （3）上述单链DNA中检测甲基化胞嘧啶的方法，包括使（2）中扩增的单链DNA进行核苷酸序列分析，

    CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE
    34.
    发明公开
    CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE 审中-公开
    清洁剂用于半导体基板和方法用于处理半导体衬底的表面

    公开(公告)号：EP2843689A4

    公开(公告)日：2015-05-13

    申请号：EP13780549

    申请日：2013-04-26

    申请人： WAKO PURE CHEM IND LTD

    发明人： KAWADA HIROMI ,  MIZUTA HIRONORI ,  MAESAWA TSUNEAKI

    IPC分类号： C11D7/32 ,  C11D7/36 ,  H01L21/306

    CPC分类号： C11D11/0047 ,  C11D7/3218 ,  C11D7/36 ,  H01L21/0206 ,  H01L21/02068 ,  H01L21/02074 ,  H01L21/31055 ,  H01L21/3212 ,  H01L21/7684

    摘要： The purpose of the present invention is to provide: a cleaning agent for a semiconductor substrate superior in corrosion resistance of a tungsten wiring or a tungsten alloy wiring, and superior in removal property of polishing fines (particle) such as silica or alumina, remaining at surface of the semiconductor substrate, in particular, at surface of a silicon oxide film such as a TEOS film, after a chemical mechanical polishing process; and a method for processing a semiconductor substrate surface. The present invention relates to a cleaning agent for a semiconductor substrate to be used in a post process of a chemical mechanical polishing process of the semiconductor substrate having a tungsten wiring or a tungsten alloy wiring, and a silicon oxide film, comprising (A) a phosphonic acid-based chelating agent, (B) a primary or secondary monoamine having at least one alkyl group or hydroxyalkyl group in a molecule and (C) water, wherein a pH is over 6 and below 7; and a method for processing a semiconductor substrate surface.