DISPOSITIF MAGNETIQUE A ECRITURE ASSISTEE THERMIQUEMENT
    35.
    发明公开
    DISPOSITIF MAGNETIQUE A ECRITURE ASSISTEE THERMIQUEMENT 审中-公开
    MAGNETVORRICHTUNG MTWÄRMEUNTERSTÜTZTEMSCHREIBVERFAHREN

    公开(公告)号:EP2836998A1

    公开(公告)日:2015-02-18

    申请号:EP13720462.4

    申请日:2013-04-09

    发明人: DIENY, Bernard

    IPC分类号: G11C11/16 G11C11/15 G11C11/56

    摘要: The invention relates to a magnetic device (1) with thermally assisted writing, comprising at least one magnetic element including: a reference layer (2) having a stable vortex magnetisation configuration; means for creating a magnetic field for reversibly moving the core of the vortex in the plane of the reference layer; a storage layer (4) having a variable magnetisation configuration; a non-magnetic spacer (3) which separates the reference layer (2) and the storage layer (4) and magnetically decouples same; an antiferromagnetic trapping layer (5) in contact with the storage layer (4), which can trap the magnetisation configuration of the storage layer, said storage layer having at least two storage levels corresponding to two trapped magnetisation configurations; and heating means for heating the antiferromagnetic trapping layer (5) such that, during heating, the temperature of the antiferromagnetic trapping layer exceeds its blocking temperature such that, when hot, the magnetisation configuration of the storage layer (4) is no longer trapped.

    A METHOD OF FABRICATING A NANOSTRUCTURE ON A PRE-ETCHED SUBSTRATE.
    38.
    发明授权
    A METHOD OF FABRICATING A NANOSTRUCTURE ON A PRE-ETCHED SUBSTRATE. 有权
    制造方法性纳米结构上的预蚀刻的衬底

    公开(公告)号:EP2047509B1

    公开(公告)日:2012-04-11

    申请号:EP07825248.3

    申请日:2007-06-26

    IPC分类号: H01L23/528

    CPC分类号: B81C99/0085

    摘要: The present invention relates to a method of fabricating a nanostructure, comprising the following steps: prestructuring a substrate (1) adapted to receive the nanostructure to form a nanorelief (2) on the substrate, the nanorelief having flanks (4) extending from a bottom (1a) of the substrate and a top face (3) extending from said flanks, and then depositing on the substrate prestructured in this way a single layer or multilayer coating intended to form the nanostructure; and further comprising: adding to the prestructured substrate or to the coating a separation layer adapted to enable separation of the coating and the substrate by external action of mechanical, thermomechanical or vibratory type; and exerting this external action on the substrate and/or the coating to recover selectively a top portion of the coating by separating it from the top face of the nanorelief so that this top portion constitutes some or all of the nanostructure.