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    X-RAY CATHODE
    62.
    发明公开
    X-RAY CATHODE 审中-实审

    公开(公告)号：EP4365925A2

    公开(公告)日：2024-05-08

    申请号：EP24162101.0

    申请日：2022-12-12

    Applicant: GE Precision Healthcare LLC

    Inventor： KRUSE, Kevin

    IPC: H01J35/14

    CPC classification number: H01J35/066 ,  H01J35/14 ,  H01J3/027 ,  H01J9/04

    Abstract: Various methods and systems are provided for a cathode (300) of an X-ray imaging system (10). A method (600) for fabricating the cathode (300) comprises machining a plurality of focusing features (528, 530, 502, 504) on a focusing element (375) and welding the focusing element (375) to a base assembly (360).

    NON-PLANAR EXTRACTOR STRUCTURE FOR ELECTRON SOURCE
    66.
    发明公开
    NON-PLANAR EXTRACTOR STRUCTURE FOR ELECTRON SOURCE 有权
    不均匀EXTRAKTORSTRUKTUR电子源

    公开(公告)号：EP2847781A4

    公开(公告)日：2015-12-09

    申请号：EP13788136

    申请日：2013-05-07

    Applicant: KLA TENCOR CORP

    Inventor： NASSER-GHODSI MEHRAN ,  PLETTNER TOMAS ,  HAYNES ROBERT G ,  SEARS CHRISTOPHER MALCOLM STANLEY

    IPC: H01J3/02 ,  H01J37/065 ,  H01J37/28

    CPC classification number: H01J37/04 ,  H01J3/027 ,  H01J3/029 ,  H01J27/024 ,  H01J37/063 ,  H01J37/065 ,  H01J37/28 ,  H01J2237/06375

    Abstract: One embodiment disclosed relates to an electron source for generating an electron beam. The electron source includes an electron emitter having a tip from which an electron beam is extracted. The electron further includes a non-planar extractor with an extractor opening and a built-in beam-limiting aperture. The extractor opening is larger than the beam-limiting aperture, and central axes of both the extractor opening and the beam-limiting aperture are aligned with the tip along a beam axis. Another embodiment relates to a method of generating an electron beam using an electron source having a non-planar extractor. Another embodiment relates to an array of electron sources for generating an array of electron beams. The array of electron sources includes an array of electron emitters and an array of non-planar extractor structures. Other embodiments, aspects and features are also disclosed.

    Electron gun arrangement
    67.
    发明公开
    Electron gun arrangement 审中-公开
    Elektronenkanonenanordnung

    公开(公告)号：EP2779204A1

    公开(公告)日：2014-09-17

    申请号：EP13159528.2

    申请日：2013-03-15

    Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

    Inventor： Adamec, Pavel

    IPC: H01J37/063 ,  H01J37/073

    CPC classification number: H01J37/063 ,  H01J3/027 ,  H01J37/073 ,  H01J2237/022

    Abstract: A gun arrangement configured for generating a primary electron beam for a wafer imaging system is described. The arrangement includes a controller (116) configured for switching between normal operation an cleaning operation, a field emitter having an emitter tip (15) adapted for providing electrons, wherein the field emitter is selected from the group consisting of: a cold field emitter and a thermally assisted cold field emitter, and wherein the emitter is electrically connected to the controller, a suppressor electrode (9)arranged radially outside the emitter, particularly wherein the emitter tip is protruding through the suppressor electrode, an extractor electrode (8) adapted for extracting the electron beam from the emitter tip electrode, and at least one auxiliary emitter electrode (16) arranged radially outside the suppressor electrode, and provided as a thermal electron emitter for thermally emitting electrons towards the optical axis. At least one of the suppressor electrode and the extractor electrode is electrically connected to the controller such that the suppressor electrode is a first potential relative to the extractor electrode during normal operation and at a second potential relative to the extractor electrode during cleaning operation.

    Abstract translation: 描述了构造成用于产生用于晶片成像系统的一次电子束的枪装置。 该装置包括：控制器（116），被配置为在清洁操作的正常操作之间切换，具有适于提供电子的发射极尖端（15）的场发射器，其中所述场发射器选自：冷场发射器和 一个热辅助冷场发射器，并且其中该发射极电连接到该控制器，一个位于发射极径向外侧的抑制电极（9），特别是其中发射极尖端突出穿过该抑制电极;一提取电极（8） 从发射极尖端电极提取电子束，以及设置在抑制电极的径向外侧的至少一个辅助发射电极（16），并且设置为用于向光轴发射电子的热电子发射器。 抑制电极和提取器电极中的至少一个电连接到控制器，使得抑制电极在正常操作期间相对于提取器电极是第一电位，并且在清洁操作期间相对于提取器电极处于第二电势。

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