摘要:
Eine Silizium-Mehrfachsolarzelle weist wenigstens zwei Teilzellen (1, 2) mit jeweils einer p-leitenden Schicht (p1, p2), einer intrinsischen Schicht (il, i2) und einer mit Phosphor dotierten n-leitenden Schicht (n1, n2) auf. Die p-leitende Schicht (p2), die mit der n-leitenden Schicht (n1) der davor angeordneten Teilzelle (1) in Kontakt steht, ist zumindest teilweise nano- oder mikrokristallin ausgebildet.
摘要:
The invention relates to a structure adapted for the formation of solar cells, comprising the following successive elements, namely: a sheet (1) of textured metal with crystal grains having an average size greater than 50 µm, said sheet being adapted to form a rear face electrode of the cells; a diffusion barrier layer (2) having a thickness of between 0.2 and 2 µm, made from an electrically conductive material with crystal grains having an average size greater than 50 µm; and a doped multicrystalline silicon layer (3) having a thickness of between 30 and 100 µm, with crystal grains having an average size greater than 50 to 100 µm, in which the average diffusion length of the carriers is greater than 50 µm.
摘要:
The invention relates to a solar cell comprising a first electrical contact layer on a substrate and also a p-i-n structure on the first electrical contact layer, wherein the p-layer is arranged on the first electrical contact layer, and a second electrical contact layer on the n-layer of the p-i-n structure, wherein the i-layer of the p-i-n structure is microcrystalline, characterized by an n-doped layer having a total oxygen content of 10 to 25% and comprising two phases, a microcrystalline Si:H phase and an amorphous SiO x :H Phase. A method for producing the solar cell and the use of the solar cell are disclosed.
摘要:
The present invention provides a semiconductor element comprising a semiconductor junction composed of silicon-based films, the element being characterized in that at least one of the silicon-based films contains a microcrystal, and microcrystal located in at least one interface region of the silicon-based films containing the microcrystal has no orientation property. Further, the present invention provides a semiconductor element comprising a semiconductor junction composed of silicon-based films, wherein at least one of the silicon-based films contains a microcrystal, and the orientation property of the microcrystal in the silicon-based film containing the microcrystal changes in a film thickness direction of the silicon-based film containing the microcrystal. In order to provide an inexpensive silicon-based film showing excellent performance, the present invention provides a silicon-based film having a shortened tact time, an increased film forming rate, and excellent characteristics, and a semiconductor element including this silicon-based film, and a semiconductor element using this silicon-based film and having excellent adhesion and environmental resistance.
摘要:
A multijunction photovoltaic structure includes a first subcell including a p-n or p-i-n junction with elongated structures; and a second subcell, arranged in tandem with the first subcell, and including a planar p-n or p-i-n junction. The elongated structure is a structure that has a height being larger than at least one of its other two dimensions. This ensures a thicker first subcell, which improves the uniformity of the structure and provides a structure that is quicker and easier to fabricate.
摘要:
A thin-film photovoltaic cell 10, wherein a serially connected structure is formed by plural unit photovoltaic cells, wherein a first electrode layer 1b, a semiconductor layer 1f, and a third electrode layer 1g are formed on a main surface of an insulating substrate 1a, a second electrode layer 1c and a fourth electrode layer 1i are formed on another surface of the substrate 1a, and the third electrode layer 1g is connected to the second electrode layer 1c and fourth electrode layer 1i, by a conductor isolated from the first electrode layer 1b, via second through holes h2 that penetrate the substrate 1a, first electrode layer 1b, second electrode layer 1c, and semiconductor layer 1f, being formed with the substrate 1a in common, adjacent unit photovoltaic cells being electrically isolated by a main surface side processed portion in which the first electrode layer 1b, semiconductor layer 1f, and third electrode layer 1g are removed, and by an other surface side processed portion in which the second electrode layer 1c and fourth electrode layer 1i are removed, and an extension portion of the first electrode layer 1b of one unit photovoltaic cell being connected to an extension portion of the second electrode layer 1c of an adjacent unit photovoltaic cell, by a conductor isolated from the third electrode layer 1g of the unit photovoltaic cell, via one or more first through holes h1 that penetrate the substrate 1a, wherein acceleration and deceleration regions for forming a crooked structure of the other surface side processed portion, or intersection portions of processing lines P3 configuring the crooked structure, are disposed in locally electrically isolated regions in the first electrode layer 1b before the formation of the semiconductor layer 1f.
摘要:
Disclosed is a thin-film solar cell that has a structure in which a plurality of unit solar cells is connected in series and is capable of preventing the formation position of collector holes from being limited and reducing power loss, as compared to the related art. A thin-film solar cell 10 includes a plurality of unit solar cells (UCs) formed by linearly removing and dividing each layer (a first electrode layer 12, a photoelectric conversion layer 13, a second electrode layer 14, a third electrode layer 16, and a fourth electrode layer 17) formed on the front surface and the rear surface of an insulating substrate 11. The unit solar cells are connected in series to each other through a plurality of collector holes 19 and connection holes 20. At least one of a first linearly removed portion 21 formed in each layer on the front surface of the insulating substrate 11 and a second linearly removed portion 22 formed in each layer on the rear surface of the insulating substrate includes a bent portion, and the plurality of collector holes 19 is arranged so as to be dispersed in the entire second electrode layer 14 of each unit solar cell (UC).
摘要:
A thin film solar cell (1) comprises: a back contact layer (2); an absorber layer (3) adjacent to the back contact layer and comprising an absorber material and a dopant; a buffer layer (4); a dopant barrier layer (5) between the absorber layer and the buffer layer; and a window layer (6) adjacent to the buffer layer.
摘要:
Provided is a photovoltaic cell with superior cell characteristics, and a method of manufacturing the photovoltaic cell. A method of manufacturing a photovoltaic cell having at least one or more layers of a photoelectric conversion element in which an i-type silicon layer formed of a microcrystalline silicon film is provided between an n-type silicon layer and a p-type silicon layer, and the n-type silicon layer or p-type silicon layer positioned on a substrate side is configured of an amorphous silicon film, is such that the photovoltaic cell is manufactured by the photoelectric conversion element being formed using a plasma CVD method whereby a mixture of a silane containing gas and hydrogen gas is introduced into a chamber, and a seed layer formed of a microcrystalline silicon film being formed between the n-type silicon layer or p-type silicon layer positioned on the substrate side and the i-type silicon layer, with the crystallization rate of a portion in contact with the n-type silicon layer or p-type silicon layer positioned on the substrate side being lower than that of the i-type silicon layer, and the crystallization rate increasing continuously, or gradually in two or more stages, toward the i-type silicon layer side, continuing to the i-type silicon layer.
摘要:
To provide a vacuum processing apparatus that is capable of increasing the quality of a deposited film, increasing the area thereof, and increasing deposition speed. A discharge chamber (2) formed of a ridge waveguide having ridge electrodes that are disposed facing each other and that generate plasma therebetween; a gas supplying portion (10) that is disposed adjacent to the discharge chamber (2) and that supplies source gas, which is used to form the plasma, toward the ridge electrodes; a substrate (S) that is disposed at a position such that the gas supplying portion (10) is flanked by the substrate (S) and the discharge chamber (2) and that is subjected to the processing by the plasma; a low-pressure vessel (7) that accommodates thereinside at least the discharge chamber (2), the gas supplying portion (10), and the substrate (S); and an exhaust portion (9) that is communicated at a position in the low-pressure vessel (7) such that this position and the gas supplying portion (10) are disposed on either side of the discharge chamber (2), and that reduces the pressure inside the low-pressure vessel (7) are provided.