公开(公告)号：EP2852012A1

公开(公告)日：2015-03-25

申请号：EP13791219.2

申请日：2013-03-13

申请人： Panasonic Intellectual Property Management Co., Ltd.

发明人： YAMAMOTO, Atsuki ,  NISHIMURA, Tetsuji

IPC分类号： H01S3/134 ,  H01S3/036

CPC分类号： H01S3/036 ,  H01S3/10069 ,  H01S3/104 ,  H01S3/134 ,  H01S3/2232

摘要： Upon starting the lasing device after having a stop state, gas retaining in the gas circulation path and the optical resonator is released through the gas release valve opened by the gas pressure controller. During a time calculated by the open-time calculator in response to the immediately preceding stop time of the lasing device, laser medium gas in the piping between the laser medium gas supply device and the gas supply valve is released, together with the retaining gas, through the gas supply valve opened by the gas pressure controller. The structure reduces costs by using decreased number of valves and suppresses consumption of laser medium gas.

摘要翻译： 当在具有停止状态之后启动激光切割装置时，通过由气体压力控制器打开的气体释放阀释放保留在气体循环路径和光学谐振器中的气体。 在由开放时间计算器响应于激光装置的紧接在前的停止时间计算的时间期间，激光介质气体供应装置和气体供应阀之间的管道中的激光介质气体与保留气体一起被释放， 通过由气压控制器打开的供气阀。 该结构通过使用减少的阀门数量并且抑制激光介质气体的消耗来降低成本。

公开(公告)号：EP1867014B1

公开(公告)日：2013-08-21

申请号：EP06748813.0

申请日：2006-03-27

申请人： Cymer, Inc.

发明人： BESAUCELE, Herve, A. ,  FOMENKOV, Igor, V. ,  PARTLO, William, N. ,  TRINTICHOUK, Fedor ,  TON-THAT, Hao

IPC分类号： H01S3/225 ,  H01S3/036 ,  H01S3/038 ,  H01S3/134 ,  H01S3/097

CPC分类号： H01S3/036 ,  H01S3/038 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/134

公开(公告)号：EP2388800A1

公开(公告)日：2011-11-23

申请号：EP11178106.8

申请日：2007-01-22

申请人： Cymer, Inc.

发明人： Dunstan, Wayne J. ,  Jacques, Robert N. ,  Rao, Rajasekhar M. ,  Trintchouk, Fedor B.

IPC分类号： H01L21/00 ,  G03F7/20 ,  H01S3/136 ,  H01S3/13 ,  H01S3/134

CPC分类号： H01S3/13 ,  G03F7/70575 ,  H01S3/134 ,  H01S3/136

摘要： A line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control system comprising: a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; a multi-stage actuator system comprising: a coarse bandwidth correction actuator adapted to induce a first modification of the light source that influences the bandwidth of the laser output light pulse beam and targeting large amplitude disturbances occurring at low frequency; a fine bandwidth correction actuator adapted to induce a second modification of the light source that influences the bandwidth of the laser output light pulse beam and targeting small amplitude disturbances occurring at high frequency; an active bandwidth controller providing a fine bandwidth correction actuator signal to said fine bandwidth correction actuator and a coarse bandwidth correction actuator signal to said coarse bandwidth correction actuator responsive to the bandwidth error signal.

摘要翻译： 一条窄幅高平均功率高脉冲重复激光微光刻光源带宽控制系统，包括：带宽测量模块，测量由光源产生的激光输出光脉冲光束的带宽，并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 一种多级致动器系统，包括：粗带宽校正致动器，其适于引起影响激光输出光脉冲束的带宽的光源的第一修改并且针对在低频发生的大振幅干扰; 适于诱导影响激光输出光脉冲束的带宽的光源的第二修改并针对在高频发生的小振幅干扰的精细带宽校正致动器; 主动带宽控制器，响应于带宽误差信号，向所述精细带宽校正致动器提供精细带宽校正致动器信号，并将粗略带宽校正致动器信号提供给所述粗带宽校正致动器。

公开(公告)号：EP1010040B1

公开(公告)日：2009-06-24

申请号：EP98939150.3

申请日：1998-07-31

申请人： Cymer, Inc.

发明人： SANDSTROM, Richard, L. ,  DAS, Palash, P. ,  FOMENKOV, Igor, V. ,  BESAUCELE, Herve, A. ,  OZARSKI, Robert, G.

IPC分类号： H01S3/134 ,  G03F7/20

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

摘要： A laser-illuminated wafer-exposing system such as a stepper (20) or scanner having a first light intensity detector (44) located within the exposing system near a mask (36) and second light intensity detector (46) located near the output of the laser (12). A feedback control system (14) controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage. In a preferred embodiment the algorithm uses the pulse energy measured with the light intensity detector located near the mark to provide the feedback control and uses the light intensity detector at the output of the laser to assure that the output of the laser is maintained within a predetermined range.

公开(公告)号：EP1378036B1

公开(公告)日：2009-04-01

申请号：EP02731237.0

申请日：2002-04-02

申请人： Cymer, Inc.

发明人： NESS, Richard, M. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander, I.

IPC分类号： H01S3/225 ,  H01S3/134 ,  H01S3/105

CPC分类号： H01S3/2366 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/10092 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2325 ,  H01S3/2333

摘要： A narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. Preferred embodiments include a pulse power system with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary windings of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers. Preferred embodiments include KrF, ArF and F2 systems. In these preferred embodiments, line narrowing may be accomplished within the resonant cavity of the seed laser or the output of the seed laser could be line narrowed using a pre-gain filter.

公开(公告)号：EP1485686A4

公开(公告)日：2008-09-24

申请号：EP03744588

申请日：2003-01-15

申请人： CYMER INC

发明人： SANDSTROM RICHARD L ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  SMITH SCOTT T ,  BROWN DANIEL J W

IPC分类号： G01J3/18 ,  G01J3/26 ,  G01J1/42 ,  G01J3/02 ,  G01J3/12 ,  G01J3/22 ,  G01J3/36 ,  G01J9/00 ,  G01J9/02 ,  G21K1/06 ,  H01S3/134 ,  H01S3/137

CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser (D) illuminates an etalon (ET). A portion of its light exiting the etalon (ET) is collected and directed into a slit (S1) positioned at a fringe pattern of the etalon (ET). Light passing through the slit (S1) is collimated and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon (ET) and the grating (GR1) are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array (PDA) and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array (PDA). Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer (50), and the etalon (ET) can be scanned.

公开(公告)号：EP1758215A3

公开(公告)日：2008-06-11

申请号：EP06017552.8

申请日：2006-08-23

申请人： FANUC LTD

发明人： Egawa, Akira ,  Ando, Minoru Room6-207 ,  Ikemoto, Hajime Room 10-304

IPC分类号： H01S3/036 ,  H01S3/134

CPC分类号： H01S3/097 ,  H01S3/036 ,  H01S3/073 ,  H01S3/10069 ,  H01S3/134

摘要： A high-frequency discharge excited gas laser oscillator (1) receiving power from a laser power supply (15) controlled by a pulse command, the high-frequency discharge excited gas laser oscillator provided with a power detecting section (18) for detecting supply power from the laser power supply to a discharge tube (3) and a pulse command control circuit (19) positioned at an upstream side of the laser power supply, comparing an allowable upper limit value (W) of supply power found from a relationship between a discharge tube temperature and supply power and an actual supply power detected by the power detecting section, stopping the pulse command value to the discharge tube when the supply power is higher than the allowable upper limit value, and setting a pulse command value based on the allowable upper limit value.

公开(公告)号：EP1019992B1

公开(公告)日：2006-06-14

申请号：EP98945820.3

申请日：1998-09-01

申请人： Cymer, Inc.

发明人： SANDSTROM, Richard, L. ,  BESAUCELE, Herve, A. ,  FOMENKOV, Igor V. ,  DAS, Palash, P.

IPC分类号： H01S3/134 ,  H01S3/225

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70216 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

摘要： A process for controlling pulse energy in burst of pulses produced by an excimer laser. The energy of each pulse in each burst is measured. The rate of change of pulse energy with charging voltage is determined. A pulse energy error is determined for a previous pulse of the present burst. An integrated dose error is also determined for all previous pulses in the current burst. A charging voltage for the next pulse is determined using the pulse energy error, the integrated dose error, the rate of change of energy with charging voltage and a reference voltage. In a preferred embodiment, the rate of change of energy with voltage is determined by dithering the voltage during two pulses of each burst, once lower and once higher. The reference voltage is a voltage calculated using prior voltage and energy data. In this embodiment the method of determining the reference voltage during a first portion of the pulse is different from the method used during a latter portion of the burst. During the first set of pulses, for each pulse, (40 in this embodiment) a specified voltage calculated using voltage and energy data from a corresponding pulse in a previous burst is utilized as a prediction of the voltage needed to produce a pulse energy converging on a target pulse energy. For pulses (41) and thereafter the reference voltage for each pulse is the specified voltage for the previous pulse.

公开(公告)号：EP1502335A4

公开(公告)日：2006-04-12

申请号：EP03726621

申请日：2003-05-05

申请人： CYMER INC

发明人： RULE JOHN A ,  HOFMANN THOMAS ,  MORTON RICHARD G ,  BROWN DANIEL J W ,  FLEUROV VLADIMIR B ,  TRINTCHOUK FEDOR ,  ISHIHARA TOSHIHIKO ,  ERSHOV ALEXANDER I ,  WITTAK CHRISTIAN J ,  CARMICHAEL JAMES A

IPC分类号： H01L21/027 ,  H01S3/22 ,  G03F7/20 ,  H01S20060101 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08 ,  H01S3/134 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/225 ,  G03F7/70025 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/2258 ,  H01S3/2333

摘要： An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor (604) for monitoring the F2 consumption rates through the operating life of the laser system (4). These consumption rates are used by a processor (604) programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system (5).

公开(公告)号：EP1323216A4

公开(公告)日：2006-03-22

申请号：EP01977198

申请日：2001-09-25

申请人： CYMER INC

发明人： MYERS DAVID W ,  BESAUCELE HERVE A ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  DAS PALASH P ,  ANDERSON STUART L ,  FOMENKOV IGOR V ,  UJAZDOWSKI RICHARD C ,  PAN XIAOJIANG J ,  ONKELS ECKEHARD D ,  NESS RICHARD M ,  BROWN DANIEL J W

IPC分类号： H01S3/225 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/23

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers (10A, 12A) are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam which is amplified in the second discharge chamber (12). The chambers (10A, 12A) can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator (10) and optimization of pulse energy parameters in the amplifying chamber (12A). A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber (10A, 12A) comprises a single tangential fan (10A, 10) providing sufficient gas flow (11) to permit operation at pulse rates of 4,000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator (10) is equipped with a line narrowing package (16, 16A) having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4,000 Hz or greater to a precision of less than 0.2 pm.