公开(公告)号：EP1226635A1

公开(公告)日：2002-07-31

申请号：EP00928786.3

申请日：2000-05-02

申请人： Cymer, Inc.

发明人： UJAZDOWSKI, Richard, C. ,  SHANNON, Robert, A. ,  BERGER, Dmitri ,  PARTLO, William, N. ,  WATSON, Tom, A. ,  AZZOLA, James, H. ,  OLIVER, I., Roger ,  DUFFEY, Thomas, P. ,  FOMENKOV, Igor, V. ,  THOMPSON, Paul, S. ,  TEDESCO, Carl, E., II ,  HARRINGTON, Steven, M. ,  ISHIHARA, Toshihiko ,  LARSON, Donald, G. ,  MORTON, Richard, G.

IPC分类号： H01S3/04

CPC分类号： G03F7/70025 ,  H01S3/036 ,  H01S3/134

摘要： A gas discharge laser (90) with fast response gas temperature control to maintain laser gas temperature within desired limits during burst mode operation. Preferred embodiments include a passive temperature stabilizer having fans with surface areas exposed to flowing laser gas at least equal to the surface area of the cooling fins of a laser gas heat exchanger (66). Preferred embodiments utilize heating elements and coolant flow control to regulate laser gas temperatures using processors programmed to anticipate idle periods.

公开(公告)号：EP1649565A2

公开(公告)日：2006-04-26

申请号：EP04778954.0

申请日：2004-07-21

申请人： Cymer, Inc.

发明人： STEIGER, Thomas, D. ,  BROWN, Joshua, C. ,  DUFFEY, Thomas, P. ,  GILLESPIE, Walter, D. ,  MORTON, Richard, G. ,  DYER, Timothy, S.

IPC分类号： H01S3/097 ,  H01R43/00 ,  H01S3/00

CPC分类号： H01S3/038 ,  H01S3/036 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/0385 ,  H01S3/0388 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

摘要： A fluorine gas discharge laser electrode (70) for a gas discharge laser having a laser gas containing fluorine is disclosed which may comprise a copper and copper alloy cathode body having an upper curved region containing the discharge footprint (74) for the cathode comprising copper and a lower portion comprising a copper alloy.

摘要翻译： 公开了一种用于具有含氟激光气体的气体放电激光器的氟气放电激光电极（70），其可以包括铜和铜合金阴极体，该铜阴极体具有包含用于包含铜的阴极的放电覆盖区（74）的上弯曲区域和 下部包含铜合金。

公开(公告)号：EP1080522A1

公开(公告)日：2001-03-07

申请号：EP99937141.2

申请日：1999-05-18

申请人： Cymer, Inc.

发明人： HOFMANN, Thomas ,  HUEBER, Jean-Marc ,  DAS, Palash, P. ,  ISHIHARA, Toshihiko ,  DUFFEY, Thomas, P. ,  MELCHIOR, John, T. ,  BESAUCELE, Hervé, A. ,  MORTON, Richard, G. ,  NESS, Richard, M. ,  NEWMAN, Peter, C. ,  PARTLO, William, N. ,  ROTHWEIL, Daniel, A. ,  SANDSTROM, Richard, L.

IPC分类号： H01S3/10

CPC分类号： G03F7/70025 ,  C23C14/0694 ,  C23C14/16 ,  C23C14/225 ,  C23C14/24 ,  G01J9/00 ,  G02B1/105 ,  G02B5/1852 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/09713 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H03K3/57 ,  H03K17/80

摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber, a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module.Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

公开(公告)号：EP2351167A1

公开(公告)日：2011-08-03

申请号：EP09822306.8

申请日：2009-10-20

申请人： Cymer, Inc. (A Nevada Corporation)

发明人： YE, Hong ,  ROKITSKI, Rostislava ,  BERGSTEDT, Robert, A. ,  ERSHOV, Alexander, I. ,  LIU, Lauren ,  VIATELLA, John, W. ,  RAO, Rajasekhar, H. ,  CYBULSKI, Raymond, F. ,  DUFFEY, Thomas, P. ,  BROWN, Daniel, J. W. ,  FERRELL, James, J.

IPC分类号： H01S3/08

CPC分类号： G02B5/04 ,  G02B5/12 ,  H01S3/0057 ,  H01S3/0346 ,  H01S3/081 ,  H01S3/225

摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.

公开(公告)号：EP1649558A2

公开(公告)日：2006-04-26

申请号：EP04816785.2

申请日：2004-07-27

申请人： Cymer, Inc.

发明人： STEIGER, Thomas, D. ,  UJAZDOWSKI, Richard, C. ,  DYER, Timothy, S. ,  DUFFEY, Thomas, P. ,  GILLESPIE, Walter, D ,  MOOSMAN, Bryan, G ,  MORTON, Richard, G. ,  STRATE, Brian, D

IPC分类号： H01S1/00

CPC分类号： H01S3/225 ,  H01S3/0381 ,  H01S3/0385 ,  H01S3/0388 ,  H01S3/0971 ,  H01S3/09713

摘要： A method and apparatus for operating a gas discharge laser is disclosed which may comprise a laser chamber containing a laser gas, the laser gas comprising a halogen, two elongated electrode elements defining a cathode and an anode, each of the cathode and anode having an elongated discharge receiving region having a discharge receiving region width defining a width of an electric discharge between the electrode elements in the laser gas, the discharge receiving region defining two longitudinal edges, and the anode comprising: a first elongated anode portion comprising a first anode material defining a first anode material erosion rate, located entirely within the discharge receiving region of the anode, a pair of second elongated anode portions comprising a second anode material defining a second anode material erosion rate, respectively located on each side of the first anode portion and at least partially within the discharge receiving region; an elongated electrode center base portion integral with the first elongated anode portion; and wherein each of the respective pair of second elongated anode portions is mechanically bonded to the center base portion. The electrode element may comprise a cathode. The first and second materials may be different materials such as different brass alloys with different erosion rates in the halogen gas. The first elongated cathode portion may comprising a first cathode material, located entirely within the discharge receiving region comprising a first portion of an ellipse intersecting elongated side walls, with a bottom wall opposite the portion of the ellipse; and a pair of second elongated cathode side portions comprising a second cathode material with the intersection of each respective second cathode portion and the portion of the ellipse forming the discharge receiving region of the first cathode portion, forming respective ellipsoidal extensions of the first portion. The members may be mechanically bonded to the center base portion. Some may be diffusion bonded to the center base portion and/or each other. The electrode assembly may have a hooded discharge receiving region extension at respective ends of the electrode and the electrode portion may be formed with or bonded to the center base portion and may have slanted side walls.

公开(公告)号：EP1339519A2

公开(公告)日：2003-09-03

申请号：EP01975156.9

申请日：2001-05-23

申请人： Cymer, Inc.

发明人： NEWMAN, Peter, C. ,  DUFFEY, Thomas, P. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  MECHER, Paul, C. ,  JOHNS, David, M. ,  SAETHRE, Robert, B. ,  FLEUROV, Vladimir, B. ,  NESS, Richard, M. ,  RETTIG, Curtis, L. ,  SHANNON, Robert, A. ,  UJAZDOWSKI, Richard, C. ,  ROKNI, Shahryar ,  PAN, Xiaojiang, J. ,  KULGEYKO, Vladimir ,  SMITH, Scott, T. ,  ANDERSON, Stuart, L. ,  ALGOTS, John, M. ,  SPANGLER, Ronald, L. ,  Fomenkov, Igor V.

IPC分类号： B23H1/00

CPC分类号： H01S3/225 ,  G01J1/4257 ,  G01J3/027 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

公开(公告)号：EP1303892A1

公开(公告)日：2003-04-23

申请号：EP00991859.0

申请日：2000-11-28

申请人： Cymer, Inc.

发明人： ONKELS, Eckehard, D. ,  DAS, Palash, P. ,  DUFFEY, Thomas, P. ,  SANDSTROM, Richard, L. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N.

IPC分类号： H01S3/00 ,  H01S3/22 ,  H01S3/03

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2333 ,  H01S3/2366

摘要： The claimed invention is a tunable injection seeded very narrow band F2 lithography laser. The laser combines modular design features of prior art long life releasable lithography lasers with special F2 line narrowing and tuning techniques. This techniques are applied to a seed beam which is operated in a first gain medium. This seed beam is then used to stimulate narrow band lasing in a second gain medium. The resulting very narrow band laser beam is useful for integrated circuit lithography. One preferred embodiment of the invention comprises a laser chamber (211), a gas module (202), a control module (205), a line narrowing module (206), and a pulse power supply module (208).