公开(公告)号：EP1029105B1

公开(公告)日：2004-02-04

申请号：EP98954899.5

申请日：1998-11-06

申请人： SANDVIK AKTIEBOLAG ,  Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

发明人： SCHILLER, Siegfried ,  GOEDICKE, Klaus ,  FIETZKE, Fred ,  ZYWITZKI, Olaf ,  SJÖSTRAND, Mats ,  LJUNGBERG, Björn ,  ALFREDSSON, Viveka ,  HILDING, Thomas

IPC分类号： C23C14/08 ,  C23C14/06 ,  C23C14/35

CPC分类号： C23C14/081 ,  C23C14/352 ,  Y10T407/27 ,  Y10T428/24975 ,  Y10T428/25 ,  Y10T428/252 ,  Y10T428/265

摘要： The present invention describes a coated cutting tool for metal machining. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of fine-grained, crystalline gamma -phase alumina, Al2O3, with a grain size less than 0.1 mu m. The Al2O3-layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperature in the range 450 DEG C to 700 DEG C, preferably 550 DEG C to 650 DEG C, depending on the particular material of the tool body to be coated. The alumina layer is very strongly textured in the (440)-direction. The Al2O3-layer is virtually free of cracks and halogen impurities and the Al2O3-layer gives the cutting edge of the tool an extremely smooth surface finish, which results in an improved surface finish also of the workpiece being machined. When the coated cemented carbide cutting tools are used in the machining of steel or cast iron, several important improvements compared to prior art have been observed.

公开(公告)号：EP0867036B1

公开(公告)日：2001-07-18

申请号：EP96939061.6

申请日：1996-11-15

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： GOEDICKE, Klaus ,  FIETZKE, Fred ,  RESCHKE, Jonathan ,  HEMPEL, Wolfgang ,  SCHEFFEL, Bert ,  METZNER, Christoph ,  SCHILLER, Siegfried

IPC分类号： H01J37/32 ,  C23C14/02 ,  C23C14/35

CPC分类号： H01J37/32018 ,  C23C14/022 ,  H01J37/34 ,  H01J2237/3322

摘要： Known methods and devices for pre-treatment of electrically conducting and non-conducting substrates require a relatively high level of technical outlay and are difficult to incorporate into the following coating process. Pre-treatment frequently does not ensure the adhesion required for coating. The invention proposes to maintain a low pressure glow discharge between the substrate to be cleaned and a counter-electrode. The substrate is periodically alternately switched as a cathode or anode, the frequency of the alternation being set in the range of from 1 Hz to 1000 Hz and the pulse lengths and/or the discharge voltage being independently adjustable. The method is used as a preliminary process for the coating of substrates which require an adhesive layer. Cutting tools, in particular, made of steel, hard metal or ceramic are treated before being coated.

公开(公告)号：EP0734459B1

公开(公告)日：1999-02-03

申请号：EP95901341.8

申请日：1994-11-22

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： KIRCHHOFF, Volker ,  GOEDICKE, Klaus ,  NEUMANN, Manfred ,  RESCHKE, Jonathan ,  SCHILLER, Siegfried

IPC分类号： C23C14/08 ,  C23C14/32 ,  C23C14/35 ,  H01J37/32 ,  H01J37/34

CPC分类号： C23C14/32

摘要： The object of the invention is to achieve a high and stable deposition rate over a long period of time in order to apply preferably reactive layers of electrically insulating compounds. Reactivity, energetic activation and layer composition and structure should be regulated and kept constant by acting on the plasma density. For that purpose, vapour propagates from the vaporiser (1) through a plasma produced between electrodes (1, 1') and interacts therewith. The electrodes are made of a material to be vaporised or of a component and/or doting material of the layer to be applied. The plasma is maintained in the vapour of the material to be vaporised and/or in an inert gas. This process is suitable for improving the surface of semi-finished products and assembly units, in particular for applying oxide layers with barrier effect on plastic foils in the packaging industry.

公开(公告)号：EP0725843B1

公开(公告)日：1998-03-04

申请号：EP94929464.9

申请日：1994-10-11

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： GOEDICKE, Klaus ,  SCHEFFEL, Bert ,  RESCHKE, Jonathan ,  SCHILLER, Siegfried ,  KIRCHHOFF, Volker ,  WERNER, Torsten

IPC分类号： C23C14/30 ,  C23C14/32

CPC分类号： C23C14/562 ,  C23C14/24 ,  C23C14/30 ,  H01J37/3053

摘要： A process and system for plasma-activated electron-beam vaporisation are disclosed. Known processes are not suitable to achieve very high coating rates under an intensive plasma influence. The spectrum of materials capable of being deposited should be very large, even in the case of insulating layers. The efficiency of the process should be high. According to the invention, the material to be vaporised is vaporised by means of electron beams (7 ) from at least two vaporisation crucibles (1; 1). An electric voltage is applied to the vaporisation crucibles, so that their vapour-generating areas act as electrodes of an electric discharge. The material to be vaporised acts as a cathode or anode. The vaporisation crucibles (1; 1) are connected to earth potential through ohmic resistances (R1; R2). This process and system are preferably suitable for reactive coating large surfaces, as well as for reactive coating components, tools and steel strips (substrate 3).

公开(公告)号：EP0666933B1

公开(公告)日：1996-06-12

申请号：EP93918893.4

申请日：1993-08-18

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  SCHILLER, Siegfried ,  MORGNER, Henry

IPC分类号： C23C14/32 ,  C23C14/30

CPC分类号： C23C14/10 ,  C23C14/32 ,  H01J37/3053 ,  H01J37/3266 ,  H01J2237/3137

摘要： It is known that improved coating properties can be obtained by plasma action in vacuum deposition, especially by vaporisation. Substantially higher coating rates can be attained in vapour deposition, but, with high plasma densities, they result in excessive scattering of the electron beam and reduce the power density. According to the invention, a plasma source, preferably a hollow cathode arc source, is arranged in the immediate vicinity of the substrate. Between the evaporator and the substrate there is a device for generating a magnetic field so that the region of high plasma density is separated from the evaporator and the electron beam by the magnetic field. The boundary field lines of this magnetic field run along an arc curving with respect to the substrate.

公开(公告)号：EP0666933A1

公开(公告)日：1995-08-16

申请号：EP93918893.0

申请日：1993-08-18

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： NEUMANN, Manfred ,  SCHILLER, Siegfried ,  MORGNER, Henry

IPC分类号： C23C14 ,  H01J37

CPC分类号： C23C14/10 ,  C23C14/32 ,  H01J37/3053 ,  H01J37/3266 ,  H01J2237/3137

摘要： It is known that improved coating properties can be obtained by plasma action in vacuum deposition, especially by vaporisation. Substantially higher coating rates can be attained in vapour deposition, but, with high plasma densities, they result in excessive scattering of the electron beam and reduce the power density. According to the invention, a plasma source, preferably a hollow cathode arc source, is arranged in the immediate vicinity of the substrate. Between the evaporator and the substrate there is a device for generating a magnetic field so that the region of high plasma density is separated from the evaporator and the electron beam by the magnetic field. The boundary field lines of this magnetic field run along an arc curving with respect to the substrate.

公开(公告)号：EP0867036A1

公开(公告)日：1998-09-30

申请号：EP96939061.0

申请日：1996-11-15

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： GOEDICKE, Klaus ,  FIETZKE, Fred ,  RESCHKE, Jonathan ,  HEMPEL, Wolfgang ,  SCHEFFEL, Bert ,  METZNER, Christoph ,  SCHILLER, Siegfried

IPC分类号： C23C14 ,  H01J37

CPC分类号： H01J37/32018 ,  C23C14/022 ,  H01J37/34 ,  H01J2237/3322

摘要： Known methods and devices for pre-treatment of electrically conducting and non-conducting substrates require a relatively high level of technical outlay and are difficult to incorporate into the following coating process. Pre-treatment frequently does not ensure the adhesion required for coating. The invention proposes to maintain a low pressure glow discharge between the substrate to be cleaned and a counter-electrode. The substrate is periodically alternately switched as a cathode or anode, the frequency of the alternation being set in the range of from 1 Hz to 1000 Hz and the pulse lengths and/or the discharge voltage being independently adjustable. The method is used as a preliminary process for the coating of substrates which require an adhesive layer. Cutting tools, in particular, made of steel, hard metal or ceramic are treated before being coated.

公开(公告)号：EP0631666B1

公开(公告)日：1997-06-18

申请号：EP93905160.3

申请日：1993-03-03

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： PANZER, Siegfried ,  SCHILLER, Siegfried ,  SCHILLER, Nicolas

IPC分类号： G01N23/225

CPC分类号： G01N33/206

摘要： In order to determine the concentration of elements during electron beam melting by evaluating the characteristic X-radiation of the elements contained in the melt, measurement phases are integrated into the melting process at certain predetermined time intervals. The melting regime is also modified so that no cloud of steam that could affect the measurements is generated above the melt during said time. The concentration is determined by analysis of the X-radiation during said time.

公开(公告)号：EP0734459A1

公开(公告)日：1996-10-02

申请号：EP95901341.0

申请日：1994-11-22

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： KIRCHHOFF, Volker ,  GOEDICKE, Klaus ,  NEUMANN, Manfred ,  RESCHKE, Jonathan ,  SCHILLER, Siegfried

IPC分类号： H05H1 ,  C23C14

CPC分类号： C23C14/32

摘要： The object of the invention is to achieve a high and stable deposition rate over a long period of time in order to apply preferably reactive layers of electrically insulating compounds. Reactivity, energetic activation and layer composition and structure should be regulated and kept constant by acting on the plasma density. For that purpose, vapour propagates from the vaporiser (1) through a plasma produced between electrodes (1, 1') and interacts therewith. The electrodes are made of a material to be vaporised or of a component and/or doting material of the layer to be applied. The plasma is maintained in the vapour of the material to be vaporised and/or in an inert gas. This process is suitable for improving the surface of semi-finished products and assembly units, in particular for applying oxide layers with barrier effect on plastic foils in the packaging industry.

公开(公告)号：EP0710429A1

公开(公告)日：1996-05-08

申请号：EP94920881.0

申请日：1994-07-13

申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

发明人： KIRCHHOFF, Volker ,  RESCHKE, Jonathan ,  SCHILLER, Siegfried ,  GOEDICKE, Klaus

IPC分类号： H01J37 ,  H05H1

CPC分类号： H01J37/32018 ,  H01J37/32036 ,  H05H1/46

摘要： The generator must be statically and dynamically matched to the electrodes in the high power and frequency range in order to perform dipolar low-pressure glow processes. The prior art processes either require considerable complexity or are not usable in the range. According to the invention, the operating time during the positive and/or negative half-wave is controlled in such a way that no power is fed to the glow device, at least during the time of a part of a negative and/or positive half-wave. The invention is applicable to plasma surface treatment, the separation of layers from the plasma and plasma-enhanced surface cleaning.