公开(公告)号：EP1194799A1

公开(公告)日：2002-04-10

申请号：EP00944023.1

申请日：2000-07-10

申请人： Schott Glas ,  CARL-ZEISS-STIFTUNGtrading as SCHOTT GLASWERKE

发明人： DANIELZIK, Burkhard ,  HENTSCHEL, Rüdiger ,  BRAUNECK, Ulf ,  KUHR, Markus ,  METZ, Bernd ,  BAUER, Stefan

IPC分类号： G02B5/28 ,  G02B1/11

CPC分类号： C23C16/515 ,  G02B5/281 ,  G02B5/288

摘要： The invention relates to a narrow-band optical interference filter for a wavelength (μ0) comprising a plurality of dielectric layers, whereby said dielectric layers alternately have a high (nH) and a low refractive index (nL) and a first number of dielectric layers has an optical layer thickness of μ/4 or μ/2 or an integral multiple thereof. The invention is characterized in that a second number of layers in the layer system has an optical layer thickness differing from μ/4 and μ/2 resulting in a minimized overall layer.

公开(公告)号：EP1412101A2

公开(公告)日：2004-04-28

申请号：EP02758443.2

申请日：2002-08-07

申请人： Schott Glas ,  CARL-ZEISS-STIFTUNGtrading as SCHOTT GLAS

发明人： BEHLE, Stephan ,  KUHR, Markus ,  WALTHER, Marten ,  WOLFF, Detlef ,  BICKER, Matthias

IPC分类号： B05D7/24 ,  B29C49/06 ,  B29C49/24 ,  B29C45/17 ,  B29C45/00 ,  B05D7/22 ,  C23C16/44

CPC分类号： B05D1/62 ,  B05D7/227 ,  B29C45/0053 ,  B29C45/1703 ,  B29C2045/0079

摘要： The invention relates to a method and device for the simultaneous coating and moulding of a body (11) comprising the following steps: two mould halves (1.1, 1.2) of a moulding tool (1) for moulding a moulded body are brought together and mounted on the unit, an injection material is introduced into the mould halves (1.1, 1.2), so as to produce a moulded body (11), the moulded body (11) is evacuated, a gas is introduced into the moulded body (11), the plasma in the moulded body (11) is ignited, such that a coating is deposited on the inner side of the moulded body (11). After the completion of the coating the mould halves (1.1, 1.2) are separated, whereupon the moulded body drops out.

公开(公告)号：EP0922122A1

公开(公告)日：1999-06-16

申请号：EP97940121.0

申请日：1997-08-23

申请人： Schott Glas ,  CARL-ZEISS-STIFTUNG trading as Schott Glas

发明人： WALTHER, Marten ,  MÖHL, Wolfgang ,  DANIELZIK, Burkhard ,  KUHR, Markus ,  HOCHHAUS, Roland ,  BAUCH, Hartmut ,  HEMING, Martin ,  KÜPPER, Thomas ,  BEWIG, Lars

IPC分类号： H05H1 ,  C23C16 ,  H01J37

CPC分类号： H01J37/32192 ,  C23C16/402 ,  C23C16/511 ,  C23C16/545

摘要： The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave plasma electrodes (2a, b, c, d). According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent plasma electrodes (2a, 2b; 2b, 2c; 2c, 2d) in a chronologically offset manner. To that end, micropulses (A, B) are provided within the macropulses of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes (6, 62a-c), magnetic fields or the configuration of the gas inlets (5). The surface coated in an operating cycle can thus be scaled as required.

公开(公告)号：EP1417042A2

公开(公告)日：2004-05-12

申请号：EP02748647.1

申请日：2002-03-28

申请人： Schott Glas ,  CARL-ZEISS-STIFTUNGtrading as Schott Glas

发明人： KUHR, Markus ,  WOLFF, Detlef ,  WALTHER, Marten ,  BEHLE, Stephan ,  BAUER, Stefan ,  KLIPPE, Lutz ,  MOELLE, Christoph ,  BEWIG, Lars ,  KOPPE, Frank ,  KÜPPER, Thomas ,  MARING, Wolfram ,  HEINZ, Jochen;

IPC分类号： B05D7/24

CPC分类号： G02B1/111 ,  B05D1/62 ,  B05D7/02 ,  B05D7/52 ,  C23C16/029 ,  C23C16/515 ,  G02B1/10

摘要： The invention relates to the coating of a synthetic substrate for producing a coated body, a device for carrying out such a method and the use thereof.

公开(公告)号：EP0922122B1

公开(公告)日：2003-03-12

申请号：EP97940121.3

申请日：1997-08-23

申请人： Schott Glas ,  CARL-ZEISS-STIFTUNG trading as Schott Glas

发明人： WALTHER, Marten ,  MÖHL, Wolfgang ,  DANIELZIK, Burkhard ,  KUHR, Markus ,  HOCHHAUS, Roland ,  BAUCH, Hartmut ,  HEMING, Martin ,  KÜPPER, Thomas ,  BEWIG, Lars

IPC分类号： C23C16/52

CPC分类号： H01J37/32192 ,  C23C16/402 ,  C23C16/511 ,  C23C16/545

摘要： The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave plasma electrodes (2a, b, c, d). According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent plasma electrodes (2a, 2b; 2b, 2c; 2c, 2d) in a chronologically offset manner. To that end, micropulses (A, B) are provided within the macropulses of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes (6, 62a-c), magnetic fields or the configuration of the gas inlets (5). The surface coated in an operating cycle can thus be scaled as required.

公开(公告)号：EP1264004A1

公开(公告)日：2002-12-11

申请号：EP01929385.1

申请日：2001-03-01

申请人： Schott Glas ,  Sakagami, Etsuro

发明人： DANIELZIK, Burkhard ,  KUHR, Markus ,  MÖHL, Wolfgang

IPC分类号： C23C16/511 ,  H01J37/32

CPC分类号： H01J37/32192 ,  C23C16/511

摘要： The invention provides that for each surface of a substrate (2) to be coated, a plasma is injected into a coating reactor (1) used for carrying out microwave PCVD methods, and the surface to be coated is perpendicularly orientated with regard to the direction of spreading of the corresponding plasma. Dielectric compensating elements (4a, b) are introduced into the vicinity of the microwave injection points (3) and correct for non-homogeneities resulting in the distribution of plasma thicknesses by altering the microwave field distribution.

公开(公告)号：EP1326809A1

公开(公告)日：2003-07-16

申请号：EP00990633.0

申请日：2000-12-01

申请人： Schott Glas

发明人： BAUER, Stefan ,  KUHR, Markus ,  VINGERLING, Bram ,  Lutz Klippe ,  Burkhard Danielzik

IPC分类号： C03C17/22 ,  C03C17/34 ,  G02B1/11

CPC分类号： G02B1/115 ,  C03C17/22 ,  C03C17/3447 ,  C03C17/3452 ,  C03C17/3458 ,  G02B6/132 ,  G02B2006/12109

摘要： The invention relates to an optical substrate on which at least one layer is to be arranged in such a way that the propagation of light is influenced. The aim of the invention is to reduce the production time for one such substrate and to preferably significantly reduce the surface strains thereof. To this end, the inventive substrate is produced by means of an application method which is characterised in that at least one of the layers applied comprises halogen atoms or a halogen compound.