IMAGING ELEMENT AND IMAGING DEVICE
    4.
    发明公开

    公开(公告)号:EP3832725A1

    公开(公告)日:2021-06-09

    申请号:EP19843344.3

    申请日:2019-07-19

    摘要: An imaging element according to an embodiment of the present disclosure includes: a semiconductor substrate having an effective pixel region in which a plurality of pixels is disposed and a peripheral region provided around the effective pixel region; an organic photoelectric converter including a first electrode, a second electrode, a charge accumulation layer, and an organic photoelectric conversion layer, the first electrode being provided on a light receiving surface of the semiconductor substrate and including a plurality of electrodes, the second electrode being opposed to the first electrode, the charge accumulation layer and the organic photoelectric conversion layer being stacked in this order between the first electrode and the second electrode and extending over the effective pixel region; and a first hydrogen-blocking layer that covers above the organic photoelectric conversion layer, a side surface of the organic photoelectric conversion layer, and a side surface of the charge accumulation layer.

    SOLID-STATE IMAGING ELEMENT, SOLID-STATE IMAGING DEVICE, AND READ-OUT METHOD FOR SOLID-STATE IMAGING ELEMENT

    公开(公告)号:EP3828934A1

    公开(公告)日:2021-06-02

    申请号:EP19840408.9

    申请日:2019-07-25

    摘要: Provided is a solid-state image capturing element including a semiconductor substrate (300) and first and second photoelectric conversion parts (500, 600) configured to convert light into electric charge. The first and the second photoelectric conversion parts (500 and 600) each have a laminated structure including an upper electrode (502, 602), a lower electrode (508, 608), a photoelectric conversion film (504, 604) sandwiched between the upper electrode and the lower electrode, and an accumulation electrode facing the upper electrode through the photoelectric conversion film and an insulating film (510, 610). The lower electrode (508, 608) of each of the first and the second photoelectric conversion parts (500, 600) is electrically connected with a common electric charge accumulation part (314) through a common penetration electrode (460) provided in common to the first and the second photoelectric conversion parts (500, 600) and penetrating through the semiconductor substrate (300), the common electric charge accumulation part (314) being provided in common to the first and the second photoelectric conversion parts (500, 600) in the semiconductor substrate (300).

    SOLID-STATE IMAGING DEVICE
    6.
    发明公开

    公开(公告)号:EP4425558A1

    公开(公告)日:2024-09-04

    申请号:EP22886454.2

    申请日:2022-09-02

    IPC分类号: H01L27/146

    CPC分类号: Y02E10/549 H01L27/146

    摘要: A solid-state imaging device includes: a pixel section that includes a transparent semiconductor formed in an effective pixel region of an insulator, an organic photoelectric conversion film formed on the transparent semiconductor on a side opposite to the insulator, and a transparent electrode formed on the organic photoelectric conversion film on a side opposite to the transparent semiconductor; a coupling section disposed in the insulator in a peripheral region around the effective pixel region, the coupling section being coupled to a circuit that supplies electricity to the transparent electrode; and a wiring line that electrically couples the transparent electrode and the coupling section to each other, and is formed by a transparent electrode material.

    IMAGING ELEMENT AND IMAGING DEVICE
    8.
    发明公开

    公开(公告)号:EP4131386A1

    公开(公告)日:2023-02-08

    申请号:EP21778942.9

    申请日:2021-03-24

    IPC分类号: H01L27/18

    摘要: An imaging element according to an embodiment of the present disclosure includes: a first electrode and a second electrode; a third electrode; a photoelectric conversion layer; and a semiconductor layer. The first electrode and the second electrode are disposed in parallel. The third electrode is disposed to be opposed to the first electrode and the second electrode. The photoelectric conversion layer is provided between the first electrode and second electrode and the third electrode. The semiconductor layer is provided between the first electrode and second electrode and the photoelectric conversion layer. The semiconductor layer has a first layer and a second layer stacked therein in order from the photoelectric conversion layer side. The second layer has an energy level at a lowest edge of a conduction band that is shallower than an energy level of the first layer at a lowest edge of a conduction band.