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    ENERGY-SENSITIVE RESIN COMPOSITION
    2.
    发明公开
    ENERGY-SENSITIVE RESIN COMPOSITION 审中-公开

    公开(公告)号：EP3275940A4

    公开(公告)日：2018-04-04

    申请号：EP16772560

    申请日：2016-03-24

    Applicant: TOKYO OHKA KOGYO CO LTD

    Inventor： NODA KUNIHIRO ,  CHISAKA HIROKI ,  SHIOTA DAI

    IPC: C08L79/08 ,  C08G12/06 ,  C08G14/073 ,  C08K5/3445 ,  C08L61/00 ,  C08L79/04 ,  G03F7/038

    CPC classification number: C08G12/06 ,  C08K5/3445 ,  C08L61/00 ,  C08L79/04 ,  C08L79/08 ,  G03F7/038 ,  C08K5/3467

    Abstract: The present invention provides an energy-sensitive resin composition with which it is possible, even if the precursor polymer is heat-treated at low temperatures, to produce a film or molded article comprising an imide ring-containing polymer having excellent heat resistance, tensile elongation and chemical resistance with a low dielectric constant, or a film or molded article comprising an oxazole ring-containing polymer having excellent heat resistance, tensile elongation and chemical resistance. Also provided are a method of manufacturing the film or molded article; a method of forming a pattern using the energy-sensitive resin composition; and a permanent film having excellent heat resistance, tensile elongation and chemical resistance. The energy-sensitive resin composition comprises an imidazole compound (A) represented by formula (1a), a resin precursor component (B), and a solvent (S), wherein the resin precursor component (B) is at least one resin precursor component selected from the group consisting of: a monomer component comprising a diamine compound represented by formula (2), a dicarbonyl compound represented by formula (3a) and/or a tetracarboxylic acid dianhydride represented by formula (3b); and a precursor polymer having a repeating unit represented by formula (4).

    CURABLE COMPOSITION
    3.
    发明公开
    CURABLE COMPOSITION 审中-公开

    公开(公告)号：EP3228641A4

    公开(公告)日：2017-12-13

    申请号：EP15867367

    申请日：2015-12-08

    Applicant: TOKYO OHKA KOGYO CO LTD

    Inventor： NODA KUNIHIRO ,  CHISAKA HIROKI ,  TADOKORO YOSHINORI ,  SHIOTA DAI

    IPC: C08G59/50 ,  C08G59/40 ,  C08G59/42 ,  C08J5/04

    CPC classification number: C08G59/42 ,  C08G59/4021 ,  C08G59/4223 ,  C08G59/50 ,  C08G59/5033 ,  C08G59/5073 ,  C08J5/04 ,  C08J2363/00

    Abstract: Provided are: a curable composition that can be cured at low temperature in a short time regardless of the type of epoxy compound that is mixed therewith, and has a long pot life; an adhesive comprising said curable composition; a method for producing a fiber-reinforced composite material that uses the curable composition; and a fiber-reinforced composite material containing a matrix comprising the curable composition. Furthermore, the present invention provides a curing agent mixture composition that can be cured at low temperature and in a short time, and provides the curable composition with a long pot life. Furthermore, provided is a curing agent mixture composition that can be cured at low temperature and in a short time, and provides the curable composition with a long pot life. An epoxy compound (A) and an imidazole compound (B) having a specific structure are blended in with the curable composition. In addition, the imidazole compound (B) having a specific structure and at least one type of crosslinking agent (C) selected from the group comprising a polyvalent amide compound and a polyvalent carboxylic acid anhydride are blended in with the curing agent mixture composition.

    SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION
    9.
    发明公开
    SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION 审中-公开
    SULFONIUMSALZ，FOTOSÄUREGENERATORUND LICHTEMPFINDLICHE ZUSAMMENSETZUNG

    公开(公告)号：EP3199520A4

    公开(公告)日：2017-09-27

    申请号：EP15843379

    申请日：2015-09-25

    Applicant: TOKYO OHKA KOGYO CO LTD

    Inventor： SHIOTA DAI ,  NODA KUNIHIRO ,  CHISAKA HIROKI

    IPC: C07C381/12 ,  C07C309/06 ,  C09K3/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

    CPC classification number: C07C381/12 ,  C07C309/06 ,  C09K3/00 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2004 ,  G03F7/322

    Abstract: Provided are a novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator comprising the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R 1 and R 2 each independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, R 1 and R 2 are bonded to each other and may form a ring with the sulfur atom within the formula, R 3 is the group represented by formula (a3) or the group represented by formula (a4), A 1 represents S or the like, X - represents a monovalent anion, and R 1 and R 2 are not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Z 1 represents an aromatic hydrocarbon ring, R 4 , R 6 , R 9 , and R 10 each represents a specific monovalent group, R 5 , R 7 , and R 8 each represents a specific divalent group, A 2 and A 3 each represents S or the like, ml represents an integer of 0 or more, and n1 and n2 each represent 0 or more.

    Abstract translation: 本发明提供对活性能量射线具有高灵敏度的新型锍盐，含有该锍盐的光酸产生剂以及含有该光酸产生剂的感光性组合物。 锍盐由式（a1）表示。 在式中，R 1和R 2各自独立地表示由式（a2）表示的基团或可以被卤素原子取代的烷基，R 1和R 2彼此键合并且可以形成环 与式中的硫原子一起，R 3为式（a3）所示的基团或式（a4）所示的基团，A 1表示S等，X - 表示一价阴离子，R 1和R 2 不都是可以被卤素原子取代的烷基。 在式（a2）〜（a4）中，环Z 1表示芳香族烃环，R 4，R 6，R 9和R 10分别表示特定的一价基团，R 5，R 7和R 8分别表示 特定的二价基团，A 2和A 3各自表示S等，ml表示0或更大的整数，并且n1和n2各自表示0或更多。

    TRANSPARENT BODY PRODUCTION METHOD, TRANSPARENT BODY, AND AMORPHOUS BODY
    10.
    发明公开
    TRANSPARENT BODY PRODUCTION METHOD, TRANSPARENT BODY, AND AMORPHOUS BODY 审中-公开
    VERFAHREN ZUR HERSTELLUNG TRANSPARENTERKÖRPER，TRANSPARENTERKÖRPERUND AMORPHERKÖRPER

    公开(公告)号：EP3199557A4

    公开(公告)日：2017-09-06

    申请号：EP15843289

    申请日：2015-09-25

    Applicant: TOKYO OHKA KOGYO CO LTD

    Inventor： SHIOTA DAI ,  NODA KUNIHIRO ,  CHISAKA HIROKI ,  KUROKO MAYUMI

    IPC: C08F16/32 ,  C07C43/215 ,  C07C43/23 ,  C08F16/26 ,  C08F20/20 ,  C08F20/30 ,  C08F216/12 ,  C08F216/14 ,  C08F220/30 ,  C08F220/32 ,  C08F222/10

    CPC classification number: C07C43/215 ,  C07C43/23 ,  C08F16/26 ,  C08F16/32 ,  C08F20/20 ,  C08F20/30 ,  C08F216/125 ,  C08F216/14 ,  C08F216/1416 ,  C08F220/30 ,  C08F220/32 ,  C08F222/1006 ,  C08F2216/1425 ,  C08F2216/1433 ,  C08F2216/1441 ,  C08F2216/145 ,  C08F2220/301 ,  C08F2220/302 ,  C08F2220/303 ,  C08F2220/306 ,  C08F2220/307 ,  C08F2220/308 ,  C08F2220/325 ,  C08F2222/102

    Abstract: Provided are: a transparent body production method that uses a novel vinyl group-containing compound; and a transparent body obtained by this production method. This transparent body production method includes subjecting a vinyl group-containing compound that is represented by formula (1) to heating at a temperature equal to or greater than the melting point of said compound. In formula (1), each of W 1 and W 2 is the group represented by formula (2) (in the formula, the ring Z is an aromatic hydrocarbon ring, X is a single bond or a group represented by -S-, R 1 is a single bond or an alkylene group having 1-4 carbon atoms, R 2 is a specific substituent such as a monovalent hydrocarbon group, and m is an integer of 0 or higher), the group represented by formula (4) (in the formula, the ring Z, X, R 1 , R 2 , and m are as indicated above), a hydroxyl group, or an (meth)acryloyloxy group, each of the ring Y 1 and the ring Y 2 is an aromatic hydrocarbon ring, R is a single bond or a specific divalent group, each of R 3a and R 3b is a cyano group, a halogen group, or a monovalent hydrocarbon group, and each of n1 and n2 is an integer of 0-4.

    Abstract translation: 提供：使用新型含乙烯基化合物的透明主体制造方法; 以及通过该制造方法得到的透明体。 该透明主体制造方法包括使式（1）表示的含乙烯基化合物在等于或大于所述化合物的熔点的温度下加热。 在式（1）中，W 1和W 2各自为由式（2）表示的基团（在该式中，环Z是芳族烃环，X是单键或由-S-表示的基团， R 1为单键或碳原子数为1〜4的亚烷基，R 2为一价烃基等特定取代基，m为0以上的整数），式（4）所示的基团（ 在式中，环Z，X，R 1，R 2和m如上所述），羟基或（甲基）丙烯酰氧基，环Y 1和环Y 2各自为芳族 烃环，R为单键或特定的2价基团，R 3a和R 3b分别为氰基，卤素基或1价烃基，n1和n2分别为0〜4的整数。

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