Abstract:
Disclosed herein is an electrolytic copper foil for a current collector of a secondary battery. The electrolytic copper foil ranges in elongation per unit thickness at room temperature from 1.3 to 2.0 %/µm and in I(200)/I(111) at room temperature from 0.4 to 0.5, wherein I(200)/I(111) is a ratio of an intensity of a diffraction peak for (200) lattice plane to an intensity of a diffraction peak for (111) lattice plane on an XRD spectrum for a deposited plane.
Abstract:
There is provided a method for subjecting garment accessories to a surface electrolytic treatment, which can advantageously provide various metallic colors to metallic garment accessories in a cost effective manner. The method can provide a first metallic color on one side of outer surface of the garment accessory while at the same time providing a second metallic color on the other side of the outer surface, by placing one or more metallic garment accessories in an electrolytic solution in a non-contact state with an anode and a cathode for passing electric current through the electrolytic solution, passing electric current through the electrolytic solution and generating a bipolar phenomenon on the garment accessory. The method may further comprise the step of controlling the posture of the garment accessory such that the one side of the outer surface of the garment accessory faces the anode and the other side faces the cathode during passing electric current through the electrolytic solution. The method may further comprise the step of polishing at least a part of the outer surface of the garment accessory during passing electric current through the electrolytic solution.
Abstract:
There is provided a method for subjecting garment accessories to a surface electrolytic treatment, which can advantageously provide various metallic colors to metallic garment accessories in a cost effective manner. The method can provide a first metallic color on one side of outer surface of the garment accessory while at the same time providing a second metallic color on the other side of the outer surface, by placing one or more metallic garment accessories in an electrolytic solution in a non-contact state with an anode and a cathode for passing electric current through the electrolytic solution, passing electric current through the electrolytic solution and generating a bipolar phenomenon on the garment accessory. The method may further comprise the step of controlling the posture of the garment accessory such that the one side of the outer surface of the garment accessory faces the anode and the other side faces the cathode during passing electric current through the electrolytic solution. The method may further comprise the step of polishing at least a part of the outer surface of the garment accessory during passing electric current through the electrolytic solution.
Abstract:
There is disclosed an apparatus for use in an electroetching or electrodeposition process in which material is etched from or deposited onto the surface of an electrically conductive component. The apparatus comprises a support for supporting the component within a tank containing an electrolytic solution; and a first-polarity electrode arranged to be located within the tank and immersed in the electrolytic solution and shaped to surround at least a part of the component in a contactless manner. In use, an electric field produced by the first-polarity electrode results in an electric variance between at least a part of the component and a second-polarity electrode having a polarity opposite to that of the first-polarity electrode. An electroetching and an electrodeposition process are also disclosed.
Abstract:
A method is provided for creating a porous coating on a surface of a substrate by electrodeposition. The substrate is a part of the cathode. An anode is also provided. A coating is deposited or disposed on the surface by applying a voltage that creates a plurality of porous structures on the surface to be coated. Continuing to apply a voltage creates additional porosity and causes portions of the attached porous structures to detach. A covering layer is created by applying a voltage that creates a thin layer that covers the attached porous structures and the detached portions which binds the porous structures and detached portions together.
Abstract:
To provide a film formation apparatus and a film formation method for forming a metal film that can continuously form metal films with desired thickness on the surfaces of a plurality of substrates, and increase the film forming speed while suppressing abnormality of the metal films. A film formation apparatus includes an anode (11); a solid electrolyte membrane (13) disposed between the anode and a substrate (B) serving as a cathode such that a metal ion solution (L) is disposed on the anode (11) side thereof; and a power supply portion (14) adapted to apply a voltage across the anode (11) and the substrate (B). A voltage is applied across the anode (11) and the substrate (B) to deposit metal out of the metal ions contained in the solid electrolyte membrane (13) onto the surface of the substrate (B), thereby forming a metal film (F) made of the metal of the metal ions. The anode (11) has a base material (11a), which is insoluble in the metal ion solution (L), and a metal plating film (11c), which is made of the same metal as the metal film (F), formed over the base material (11a).
Abstract:
Process of electrodepositing a metal in a high aspect ratio via in a silicon substrate to form a through-silicon-via (TSV), utilizing an electrolytic bath including a redox mediator, in an electrolytic metal plating system including a chuck adapted to hold the silicon substrate and to heat the silicon substrate to a first temperature, a temperature control device to maintain temperature of the electrolytic bath at a second temperature, in which the first temperature is maintained in a range from about 30° C. to about 60° C. and the second temperature is maintained at a temperature (a) at least 5° C. lower than the first temperature and (b) in a range from about 15° C. to about 35° C.
Abstract:
L'invention se rapporte à un élément céramique incrusté (10) comportant un corps (11) en céramique comportant au moins un évidement (12) formant l'empreinte d'un décor (13). Selon l'invention, ledit au moins un évidement est entièrement rempli par une première et une deuxième couches (14, 15) électriquement conductrices de sensiblement 50 nm et un dépôt (16) galvanique métallique afin de former un élément céramique (10) incrusté d'au moins un décor métallique (13) à la qualité visuelle améliorée. L'invention se rapporte également au procédé de fabrication de l'élément céramique incrusté. L'invention concerne le domaine des pièces céramiques décorées.
Abstract:
Es wird eine Vorrichtung (10) zur galvanischen Beschichtung von mindestens einer Oberfläche (2, 3) mindestens eines Substrates (1), insbesondere einer Solarzelle (1a), beschrieben. Die Vorrichtung weist ein Beschichtungsbad (13) auf, das eine mit elektrolytischer Beschichtungsflüssigkeit (14) gefüllte Beschichtungswanne (2) aufweist. Ferner ist eine Transporteinrichtung (15) zum Durchführen des Substrates (1) durch das Beschichtungsbad (13), ein Lichtquellenschaltkreis (60) mit mindestens einer Lichtquelle (64) zur Bestrahlung des Substrates (1) und ein Gleichrichterschaltkreis (50) für das Substrat (1) vorgesehen. Die Vorrichtung weist Mittel zur Erzeugung von synchronen Stromimpulsen und Lichtimpulsen auf, wobei in den Impulspausen zwischen den Stromimpulsen die Bestrahlung des Substrates unterbrochen ist. Es wird auch ein Verfahren zur galvanischen Beschichtung von Oberflächen eines Substrates beschrieben.
Abstract:
Variable property deposit, at least partially of fine-grained metallic material, optionally containing solid particulates dispersed therein, is disclosed. The electrodeposition conditions in a single plating cell are suitably adjusted to once or repeatedly vary at least one property in the deposit direction. In one embodiment denoted multidimension grading, property variation along the length and/or width of the deposit is also provided. Variable property metallic material deposits containing at least in part a fine-grained microstructure and variable property in the deposit direction and optionally multidimensionally, provide superior overall mechanical properties compared to monolithic fine-grained (average grain size: >20 micron) or entirely amorphous metallic material deposits.