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    IMAGE PROCESSING METHOD
    1.
    发明公开
    IMAGE PROCESSING METHOD 审中-公开
    图像处理方法

    公开(公告)号：EP2545580A1

    公开(公告)日：2013-01-16

    申请号：EP11753507.0

    申请日：2011-03-08

    申请人： Canon Kabushiki Kaisha

    发明人： SUGA, Takeo

    IPC分类号： H01J37/256 ,  H01J37/22 ,  H01J37/252 ,  H01J49/40

    CPC分类号： H01J49/0004 ,  G06T5/003 ,  G06T2207/10056 ,  G06T2207/30024 ,  H01J2237/0432 ,  H01J2237/24585 ,  H01J2237/2527

    摘要： The present invention provides an image processing method of a secondary ion mass spectrometry (SIMS) system which combines a short-pulsed and converged primary ion beam column and a time-of-flight (TOF) mass spectrometer. A shape of the primary beam irradiated on a sample is determined by numerical calculation or practical experiment process (S108); and the blurring function derived from the shape is employed to restore a two-dimensional image of signal intensities based on a ratio of mass to an electric charge (m/e) in order to reduce the blurring of the image (S110-S111).

    摘要翻译： 本发明提供了一种二次离子质谱（SIMS）系统的图像处理方法，该系统组合了短脉冲且会聚的初级离子束柱和飞行时间（TOF）质谱仪。 照射在样品上的主光束的形状由数值计算或实际实验过程确定（S108）; 并且从形状导出的模糊函数用于基于质量与电荷的比率（m / e）来恢复信号强度的二维图像以减少图像的模糊（S110-S111）。

    Ion source, ion gun, and analysis instrument
    2.
    发明公开
    Ion source, ion gun, and analysis instrument 有权
    分析仪器Ionenquelle

    公开(公告)号：EP2899742A1

    公开(公告)日：2015-07-29

    申请号：EP15152080.6

    申请日：2015-01-22

    申请人： Ulvac-Phi, Inc.

    发明人： Sakai, Daisuke ,  Sogou, Mauo ,  Hiraoka, Kenzo

    IPC分类号： H01J37/08 ,  H01J37/252

    CPC分类号： G01N23/02 ,  G01N23/2258 ,  H01J27/26 ,  H01J37/08 ,  H01J37/252 ,  H01J49/0468 ,  H01J49/165 ,  H01J2237/0812 ,  H01J2237/2527 ,  H01J2237/3174

    摘要： Provided are an ion source, an ion gun, and an analysis instrument, which are capable of performing sputtering without damage to a surface of a sample and improving detection sensitivity in mass spectroscopy. In the ion source (102), an emission opening (135) to which ionization liquid is supplied is disposed in an electric field formed in vacuum environment by an extracting electrode (122) so that super large droplet cluster ions (145) are generated from the emission opening (135). When the sample is irradiated with a super large droplet cluster ion beam, the sample surface is subjected to sputtering without damage, so as to remove contamination substances or to expose a new surface of the sample. In mass spectroscopy, detection sensitivity is improved.

    摘要翻译： 提供离子源，离子枪和分析仪器，其能够在不损害样品表面的情况下进行溅射并提高质谱中的检测灵敏度。 在离子源（102）中，通过提取电极（122）在真空环境中形成的电场中配置有向其提供电离液体的发射开口（135），从而产生超大液滴簇离子（145） 排出口（135）。 当用超大的液滴簇离子束照射样品时，样品表面经受溅射而不损坏，以便去除污染物质或露出样品的新表面。 在质谱中，检测灵敏度得到改善。

    Secondary ion mass spectrometer with apertured mask
    9.
    发明公开
    Secondary ion mass spectrometer with apertured mask 失效
    Sekundärionen-Massenspektrometer mit Lochmaske

    公开(公告)号：EP0884759A1

    公开(公告)日：1998-12-16

    申请号：EP98110548.9

    申请日：1998-06-09

    申请人： Atomika Instruments GmbH

    发明人： Maul, Johann L., Dr.

    IPC分类号： H01J37/252 ,  G01N23/225 ,  H01J37/02

    CPC分类号： G01N23/2258 ,  H01J37/026 ,  H01J37/252 ,  H01J2237/0042 ,  H01J2237/2527

    摘要： In a secondary ion mass spectrometer an aperture mask (3), which is not part of the secondary ion optics (5) of the spectrometer, is arranged very near to the surface of a specimen (1) to be analyzed, for example a semiconductor. The primary and secondary ions pass through the aperture (3A) in the aperture mask (3). The position of the specimen relative to the aperture mask dictates the location on the specimen (1) to be analyzed. The outer dimension of the mask is larger than the field of view of the secondary ion optics (5). Due to the masked region the fringe areas of the specimen are shielded ionoptically so that they cannot result in any falsification of the electric field. An electrical dc or ac potential can be applied to the mask (3) so that the electric field between the aperture (3A) and the specimen (1) can be additionally influenced. A contact device (3B) can be applied between the mask (3) and the specimen (1) for preventing electrical charging of the specimen (1).

    摘要翻译： 在二次离子质谱仪中，不是光谱仪的二次离子光学器件（5）的一部分的孔径掩模（3）非常靠近待分析的样品（1）的表面，例如半导体 。 初级和次级离子通过孔径掩模（3）中的孔（3A）。 样本相对于孔径掩模的位置决定待分析样品（1）上的位置。 掩模的外部尺寸大于二次离子光学器件（5）的视场。 由于掩模区域，样品的边缘区域被电离屏蔽，因此它们不会导致电场的任何伪造。 可以将电直流或交流电位施加到掩模（3），使得孔（3A）和样品（1）之间的电场可能受到额外的影响。 可以在掩模（3）和样品（1）之间施加接触装置（3B），以防止试样（1）的充电。

    Ion-scattering spectrometer
    10.
    发明公开
    Ion-scattering spectrometer 失效
    离子散射光谱仪

    公开(公告)号：EP0488067A3

    公开(公告)日：1992-10-07

    申请号：EP91119921.4

    申请日：1991-11-22

    申请人： SHIMADZU CORPORATION ,  RIKAGAKU KENKYUSHO

    发明人： Hayashi, Shigeki ,  Kumashiro, Sumio ,  Aono, Masakazu ,  Katayama, Mitsuhiro

    IPC分类号： H01J49/14 ,  H01J37/252 ,  G01N23/203

    CPC分类号： H01J49/446 ,  H01J37/252 ,  H01J49/067 ,  H01J2237/2446 ,  H01J2237/2527

    摘要： There is disclosed an ion-scattering spectrometer comprising an ion source (2), a first control electrode (3) for controlling an ion beam emitted by the ion source (2), a detector (4) for detecting scattered particles, and a second control electrode (5) for controlling the ion beam, which is directed from the ion source (2) toward a sample (S), as well as the scattered particles, are arranged on the same axis (X) along with the sample (S). The ion beam directed from the ion source (2) toward the sample (S), and the scattered particles, which are scattered from the sample (S) and are directed toward the detector (4), are caused to converge. The proposed spectrometer attains improved micro-structural analysis of the sample surface and raised ion detection efficiency.